Prosecution Insights
Last updated: October 26, 2026

Moin M Rahman, USPTO Patent Examiner

Listed by the USPTO as RAHMAN, MOIN M

Tech Center 2800 • Art Units: 2699 2800 2898

This examiner grants 87% of resolved cases

Performance Statistics

87.1%
Allow Rate
+19.1% vs TC avg
824
Total Applications
+14.0%
Interview Lift
883
Avg Prosecution Days
Based on 762 resolved cases, 2023–2026

Rejection Statute Breakdown

0.2%
§101 Eligibility
27.0%
§102 Novelty
56.0%
§103 Obviousness
16.1%
§112 Clarity

Currently Pending Office Actions

App #TitleStatusAssignee
18896219 SEMICONDUCTOR DEVICE INCLUDING BIT LINES Non-Final OA SAMSUNG ELECTRONICS CO., LTD.
18613324 MULTI-STACK SEMICONDUCTOR DEVICE Non-Final OA Samsung Electronics Co., Ltd.
18514715 SUBSTRATE AND SEMICONDUCTOR DEVICE INCLUDING THE SAME Non-Final OA SAMSUNG ELECTRONICS CO., LTD.
18382166 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME Non-Final OA Samsung Electronics Co., Ltd.
18489028 SEMICONDUCTOR MODULE Final Rejection FUJI ELECTRIC CO., LTD.
17934388 WHITE ORGANIC LIGHT EMITTING DEVICE WITH STABLE SPECTRUM EMPLOYING TRANSPORT BARRIER LAYERS Final Rejection The Regents of the University of Michigan
18522409 DISPLAY DEVICE Final Rejection LG Display Co., Ltd.
17755897 SOLID-STATE IMAGING DEVICE AND ELECTRONIC EQUIPMENT Final Rejection SONY SEMICONDUCTOR SOLUTIONS CORPORATION
18560169 DISPLAY SUBSTRATE AND DISPLAY DEVICE Non-Final OA BOE TECHNOLOGY GROUP CO., LTD.
18486970 INTERPOSER CONNECTION STRUCTURES BASED ON WIRE BONDING Final Rejection QUALCOMM Incorporated
17990794 ORGANIC SEMICONDUCTOR ELEMENT, ORGANIC EL ELEMENT, AND PHOTODIODE Final Rejection SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
18840285 DISPLAY PANEL, DISPLAY DEVICE AND DRIVING METHOD Non-Final OA BEIJING BOE TECHNOLOGY DEVELOPMENT CO., LTD.
18631597 Reduction of the Floating Body Effect in N-Type MOSFET Devices Non-Final OA Murata Manufacturing Co., Ltd.
15429403 ENHANCED LATERAL CAVITY ETCH Final Rejection Texas Instruments Incorporated
18704093 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD Non-Final OA Tokyo Electron Limited
18531276 LAYER BY LAYER ETCH PROCESS Non-Final OA Tokyo Electron Limited
18536918 PITCH CONFIGURATION FOR BACK-END-OF-LINE WIRING Non-Final OA International Business Machines Corporation
18632033 IMAGE SENSING DEVICE Non-Final OA SK hynix Inc.
18514991 SEMICONDUCTOR MEMORY DEVICE Non-Final OA SK hynix Inc.
18182657 LEAKAGE CURRENT REDUCTION FOR CONTINUOUS ACTIVE REGIONS Final Rejection Taiwan Semiconductor Manufacturing Company, Ltd.
18424960 SEMICONDUCTOR-ON-INSULATOR (SOI) STRUCTURE WITH VARIABLE RESISTIVITY EPITAXIAL SEMICONDUCTOR LAYERS AND METHODS OF MAKING THE SAME Non-Final OA Taiwan Semiconductor Manufacturing Company Limited
18522150 SUPERLATTICE COMPOSITE STRUCTURE AND SEMICONDUCTOR LAMINATE STRUCTURE Final Rejection Wafer Works Corporation

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Frequently Asked Questions

What is examiner Moin M Rahman's allowance rate?

87.1% of resolved applications examined by Moin M Rahman were allowed (762 resolved cases), compared with 73.0% across Art Unit 2699 over the last five years.

Does an interview help with examiner Moin M Rahman?

This examiner's interview lift is +14.0 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.

How long does examiner Moin M Rahman take to allow a patent?

Applications allowed by Moin M Rahman took 883 days on average from filing to allowance.

Which art unit does examiner Moin M Rahman work in?

Moin M Rahman examines applications in Art Unit 2699 in Tech Center 2800 (Semiconductors, Circuits & Optics).

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