Listed by the USPTO as SWEELY, KURT D
Tech Center 1700 • Art Units: 1713 1718
This examiner grants 52% of resolved cases
SWEELY, KURT D handles cases in Tech Center 1700 and art unit 1713. The record includes 238 resolved cases, a 52.5% allowance rate, and a 34.2% interview lift. The median time to allowance is 1362 days. Interviews therefore stand out as a prosecution consideration, while the median indicates that applicants should anticipate a substantial period before allowance.
The companies most represented are ASM IP Holding B.V., Samsung Electronics Co., Ltd., and Lam Research Corporation. The listed firms are Snell & Wilmer (ASM IP Holding B.V.), Muir Patent Law, PLLC, and PNJ IP Law, P.C. Practitioners can use these entities to evaluate the examiner’s recorded semiconductor-related and industrial technology exposure.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18825121 | COOLING SYSTEM FOR SEMICONDUCTOR EQUIPMENT | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18443517 | DLC FILM DEPOSITION APPARATUS, SEMICONDUCTOR MANUFACTURING SYSTEM INCLUDING THE DLC FILM DEPOSITION APPARATUS, AND SEMICONDUCOR MANUFACTURING METHOD USING THE DLC FILM DEPOSITION APPARATUS | Final Rejection | Samsung Electronics Co., Ltd. |
| 18383207 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USING THE SAME | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18787053 | PROTECTED METALLIC COMPONENTS, REACTION CHAMBERS INCLUDING PROTECTED METALLIC COMPONENTS, AND METHODS FOR FORMING AND UTILIZING PROTECTED METALLIC COMPONENTS | Non-Final OA | ASM IP Holding B.V. |
| 18678219 | SEMICONDUCTOR PROCESSING APPARATUS AND METHODS FOR CALIBRATING A SEMICONDUCTOR PROCESSING APPARATUS | Final Rejection | ASM IP Holding B.V. |
| 18585313 | WAFER PROCESSING APPARATUS WITH FILM UNIFORMITY IMPROVEMENT CAPABILITIES | Non-Final OA | ASM IP Holding B.V. |
| 18195456 | FILM FORMING APPARATUS WITH ANNULAR EXHAUST DUCT | Final Rejection | ASM IP Holding B.V. |
| 18105275 | REACTOR COOLING SYSTEM | Non-Final OA | ASM IP Holding B.V. |
| 17847470 | SUBSTRATE PROCESSING APPRATUS INCLUDING A SUBSTRATE LIFT MECHANISM | Non-Final OA | ASM IP Holding B.V. |
| 18835982 | WAFER EDGE TILT AND ETCH RATE UNIFORMITY | Non-Final OA | Lam Research Corporation |
| 18550664 | ADJUSTABLE DIELECTRIC CONSTANT CERAMIC WINDOW | Final Rejection | Lam Research Corporation |
| 18042198 | C-shroud Modification For Plasma Uniformity Without Impacting Mechanical Strength Or Lifetime Of The C-shroud | Final Rejection | Lam Research Corporation |
| 18648828 | SUBSTRATE PROCESSING APPARATUS | Final Rejection | Tokyo Electron Limited |
| 18616526 | PLASMA ETCHING APPARATUS AND PLASMA ETCHING METHOD | Final Rejection | Tokyo Electron Limited |
| 18108391 | PLASMA PROCESSING APPARATUS | Final Rejection | TOKYO ELECTRON LIMITED |
| 18690918 | PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD | Non-Final OA | Hitachi High-Tech Corporation |
| 18617280 | ARC REDUCTION USING UNREFERENCED FLOATING POWER SUPPLIES | Non-Final OA | Applied Materials, Inc. |
| 18590478 | GAS INJECTOR ASSEMBLY WITH IMPROVED GAS MIXING | Final Rejection | Applied Materials, Inc. |
| 18222607 | METHOD AND TOOL FOR FILM DEPOSITION | Final Rejection | NANYA TECHNOLOGY CORPORATION |
| 17880880 | SUBSTRATE PROCESSING APPARATUS | Final Rejection | SCREEN Holdings Co., Ltd. |
| 18083555 | ANTENNA ASSEMBLY AND PLASMA PROCESSING EQUIPMENT INCLUDING SAME | Non-Final OA | SEMES CO., LTD. |
| 17944190 | APPARATUS FOR PROCESSING SUBSTRATE | Final Rejection | SEMES CO., LTD. |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy52.5% of resolved applications examined by Kurt D Sweely were allowed (238 resolved cases), compared with 62.4% across Art Unit 1713 over the last five years.
This examiner's interview lift is +34.2 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Kurt D Sweely took 1,362 days on average from filing to allowance.
Kurt D Sweely examines applications in Art Unit 1713 in Tech Center 1700 (Chemistry & Materials).
