Listed by the USPTO as TAN, DAVE
Tech Center 2800 • Art Units: 2811 2897
This examiner grants 81% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18519652 | SEMICONDUCTOR MODULE AND WIRING MEMBER | Final Rejection | FUJI ELECTRIC CO., LTD. |
| 18883898 | DISPLAY DEVICE | Non-Final OA | LG Display Co., Ltd. |
| 18396314 | THIN FILM TRANSISTOR ARRAY SUBSTRATE INCLUDING OXIDE SEMICONDUCTOR PATTERN AND DISPLAY DEVICE INCLUDING SAME | Non-Final OA | LG Display Co., Ltd. |
| 17982159 | DISPLAY DEVICE | Final Rejection | LG Display Co., Ltd. |
| 18403379 | DISPLAY DEVICE | Non-Final OA | Samsung Display Co., LTD. |
| 18493733 | DISPLAY DEVICE | Final Rejection | Samsung Display Co., LTD. |
| 18239903 | DISPLAY APPARATUS | Non-Final OA | Samsung Display Co., LTD. |
| 18569266 | DISPLAY PANEL, DISPLAY APPARATUS AND METHOD FOR MANUFACTURING DISPLAY PANEL | Final Rejection | BOE Technology Group Co., Ltd. |
| 18680628 | INDUCTOR MODULE WITH PACKAGED SEMICONDUCTOR DIE | Non-Final OA | TEXAS INSTRUMENTS INCORPORATED |
| 18727934 | METHOD OF PROCESSING AN OPTOELECTRONIC DEVICE AND OPTOELECTRONIC DEVICE | Non-Final OA | ams-OSRAM International GmbH |
| 18661607 | SEMICONDUCTOR DEVICE WITH GATE STRAP IN STI REGION | Non-Final OA | INTERNATIONAL BUSINESS MACHINES CORPORATION |
| 18346125 | EXTREMELY HIGH DENSITY SILICON CAPACITOR | Non-Final OA | INTERNATIONAL BUSINESS MACHINES CORPORATION |
| 18215350 | EVALUATION METHOD, SEARCH METHOD, AND SEARCH SYSTEM | Final Rejection | HITACHI HIGH-TECH CORPORATION |
| 18464268 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | Final Rejection | SK hynix Inc. |
| 18634109 | DUAL GATE STRUCTURE FOR MEMORY DEVICE | Non-Final OA | APPLIED MATERIALS, INC. |
| 19243074 | THERMAL BARRIER STRUCTURE IN PHASE CHANGE MATERIAL DEVICE | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 17862372 | SEMICONDUCTOR DEVICE AND METHOD OF FORMING THE SAME | Final Rejection | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18790277 | Ferroelectric Device and Methods of Fabrication Thereof | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy81.3% of resolved applications examined by Dave Tan were allowed (16 resolved cases), compared with 72.2% across Art Unit 2811 over the last five years.
This examiner's interview lift is -8.3 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Dave Tan took 1,240 days on average from filing to allowance.
Dave Tan examines applications in Art Unit 2811 in Tech Center 2800 (Semiconductors, Circuits & Optics).
