Listed by the USPTO as XU, ZHIJUN
Tech Center 2800 • Art Units: 2818 2894
This examiner grants 77% of resolved cases
XU, ZHIJUN works in tech center 2800 and art unit 2818. Across 75 resolved cases, the allowance rate is 77.3%. The median time to allowance is 1342 days, so applicants should pair the outcome record with planning for a prolonged prosecution timeline.
The interview lift is 11.4%, indicating a limited measured association with allowance. The leading companies are Samsung Electronics Co., Ltd., Taiwan Semiconductor Manufacturing Company, Ltd., and Samsung Display Co., Ltd. The leading firms are Syncoda LLC, CROWE & DUNLEVY - ST, and Essential Patents Group, LLP.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18609885 | SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME | Final Rejection | SAMSUNG ELECTRONICS CO., LTD. |
| 18502903 | IMAGE SENSORS HAVING IMPROVED OPTICAL CHARACTERISTICS USING ENHANCED ELECTRICAL CONNECTION OF SPACED-APART FLOATING DIFFUSION REGIONS | Final Rejection | Samsung Electronics Co., Ltd. |
| 18163573 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME | Final Rejection | SAMSUNG ELECTRONICS CO., LTD. |
| 18760036 | DISPLAY DEVICE | Non-Final OA | Samsung Display Co., Ltd. |
| 18441335 | DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME | Non-Final OA | Samsung Display Co., Ltd. |
| 17388727 | DISPLAY DEVICE WITH LIGHT BLOCKING LAYER THAT OVERLAPS AN EMISSION LAYER | Final Rejection | Samsung Display Co., LTD. |
| 18764405 | DISPLAY SUBSTRATE AND DISPLAY DEVICE | Non-Final OA | BOE Technology Group Co., Ltd. |
| 18554635 | Display Substrate and Display Device | Final Rejection | BOE Technology Group Co., Ltd. |
| 17891666 | DIE CRACK MITIGATION IN MULTI-CHIP COMPOSITE IC STRUCTURES | Final Rejection | Intel Corporation |
| 16912136 | GATE-ALL-AROUND INTEGRATED CIRCUIT STRUCTURES HAVING STRAINED SOURCE OR DRAIN STRUCTURES ON GATE DIELECTRIC LAYER | Final Rejection | Intel Corporation |
| 17920479 | Semiconductor Device and Method of Manufacturing the Same | Final Rejection | NTT, Inc. |
| 17352139 | N-POLAR III-N SEMICONDUCTOR DEVICE STRUCTURES WITH WET ETCHING | Non-Final OA | The Regents of the University of California |
| 18554701 | RADIATION-EMITTING SEMICONDUCTOR CHIP AND METHOD FOR MANUFACTURING A RADIATION-EMITTING SEMICONDUCTOR CHIP | Final Rejection | ams-OSRAM International GmbH |
| 18613918 | GRADIENT METAL LINER FOR INTERCONNECT STRUCTURES | Non-Final OA | Applied Materials, Inc. |
| 17809099 | HIGH-VOLTAGE SEMICONDUCTOR DEVICES AND METHODS OF FORMATION | Final Rejection | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 17825698 | SEMICONDUCTOR DEVICES WITH REDUCED EFFECT OF CAPACITIVE COUPLING | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18779489 | SEMICONDUCTOR DEVICES WITH ENHANCED CARRIER MOBILITY | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18152390 | METHOD OF SACRIFICIAL NANOSTRUCTURE REPLACEMENT IN SEMICONDUCTOR DEVICES | Final Rejection | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 17865355 | SYSTEMS AND METHODS FOR EMBEDDING ELECTRONIC COMPONENTS IN SUBSTRATES | Non-Final OA | Advanced Micro Devices, Inc. |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy77.3% of resolved applications examined by Zhijun Xu were allowed (75 resolved cases), compared with 85.2% across Art Unit 2818 over the last five years.
This examiner's interview lift is +11.4 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Zhijun Xu took 1,342 days on average from filing to allowance.
Zhijun Xu examines applications in Art Unit 2818 in Tech Center 2800 (Semiconductors, Circuits & Optics).
