Listed by the USPTO as ZHU, SHENG-BAI
Tech Center 2800 • Art Units: 2800 2823 2892 2897
This examiner grants 62% of resolved cases
ZHU, SHENG-BAI is assigned to Tech Center 2800 and Art Unit 2800. The record includes 721 resolved cases and an allowance rate of 62.3%. The median time to allowance is 1030 days, giving applicants a substantial reference point for prosecution scheduling and portfolio decisions.
The interview lift is 5.7%, indicating a limited association with allowance outcomes. Practitioners may therefore emphasize claim clarity, prior-art analysis, and a complete written response, using interviews to address specific unresolved questions rather than as the central strategy. The represented companies are Samsung Display Co., Ltd., Texas Instruments Incorporated, and Taiwan Semiconductor Manufacturing Company, Ltd. The listed firms are Womble Bond Dickinson US LLP, JCIPRNET, and CANTOR COLBURN LLP.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18508605 | ELECTROLUMINESCENT DEVICE AND DISPLAY DEVICE INCLUDING THE SAME | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18815355 | SEMICONDUCTOR MODULE | Non-Final OA | FUJI ELECTRIC CO., LTD. |
| 18805614 | SEMICONDUCTOR DEVICE HAVING A WIRE BONDING PAD STRUCTURE CONNECTED THROUGH VIAS TO LOWER WIRING | Non-Final OA | FUJI ELECTRIC CO., LTD. |
| 17975207 | SEMICONDUCTOR DEVICE | Final Rejection | FUJI ELECTRIC CO., LTD. |
| 18750963 | LIGHT EMITTING ELEMENT, INK COMPOSITION AND DISPLAY DEVICE INCLUDING THE LIGHT EMITTING ELEMENT | Non-Final OA | Samsung Display Co., LTD. |
| 18750878 | DISPLAY APPARATUS AND METHOD OF MANUFACTURING THE SAME | Final Rejection | Samsung Display Co., Ltd. |
| 18590202 | METHOD OF MANUFACTURING DISPLAY APPARATUS | Final Rejection | Samsung Display Co., Ltd. |
| 18368710 | DISPLAY DEVICE AND METHOD OF FABRICATING THE SAME | Final Rejection | Samsung Display Co., LTD. |
| 17871169 | DISPLAY DEVICE CAPABLE OF PREVENTING DEFECTS ON A SIGNAL LINE AND METHOD OF FABRICATING THE SAME | Non-Final OA | Samsung Display Co., Ltd. |
| 17423453 | DISPLAY DEVICE AND MANUFACTURING METHOD THEREFOR | Non-Final OA | SAMSUNG DISPLAY CO., LTD. |
| 17915755 | OLED DISPLAY SUBSTRATE, METHOD FOR MANUFACTURING THE SAME, AND DISPLAY DEVICE | Non-Final OA | BOE Technology Group Co., Ltd. |
| 18680740 | PACKAGE COMPRISING AN INTEGRATED DEVICE, A SUBSTRATE AND A HEAT SINK | Final Rejection | QUALCOMM Incorporated |
| 17561670 | POWER DELIVERY USING BACKSIDE POWER FOR STITCHED DIES | Non-Final OA | Intel Corporation |
| 18880361 | POWER SEMICONDUCTOR DEVICE INCLUDING HEAT DISSIPATING STRUCTURE AND METHOD OF MANUFACTURING POWER SEMICONDUCTOR DEVICE | Final Rejection | Mitsubishi Electric Corporation |
| 18751033 | INLET AND OUTLET LOCATIONS AND STANDARDIZATION | Non-Final OA | Adeia Semiconductor Bonding Technologies Inc. |
| 17898233 | MICROELECTRONIC DEVICES WITH LOW AND HIGH GLOBAL DIGIT LINES, RELATED MEMORY DEVICES, ELECTRONIC SYSTEMS, AND METHODS | Non-Final OA | Micron Technology, Inc. |
| 18588565 | SEMICONDUCTOR MEMORY DEVICE | Final Rejection | Kioxia Corporation |
| 18346977 | METHOD OF REDUCING VOIDS AND SEAMS IN TRENCH STRUCTURES BY FORMING SEMI-AMORPHOUS POLYSILICON | Final Rejection | Texas Instruments Incorporated |
| 18149099 | DIELECTRIC FILMS OVER ELECTRODE FOR HIGH VOLTAGE PERFORMANCE | Final Rejection | Texas Instruments Incorporated |
| 17514856 | MULTI-ROW HEIGHT COMPOSITE CELL WITH MULTIPLE LOGIC FUNCTIONS | Non-Final OA | Texas Instruments Incorporated |
| 17223792 | QUALITY FACTOR OF A PARASITIC CAPACITANCE | Final Rejection | TEXAS INSTRUMENTS INCORPORATED |
| 17786745 | FILM FORMING METHOD AND FILM FORMING SYSTEM | Final Rejection | Tokyo Electron Limited |
| 18751130 | SEMICONDUCTOR DEVICE WITH EMBEDDED COOLING | Final Rejection | INTERNATIONAL BUSINESS MACHINES CORPORATION |
| 18598668 | FORK SHEET TRANSISTOR WITH VIA-TO-BACKSIDE POWER RAIL STRUCTURE | Non-Final OA | International Business Machines Corporation |
| 17940623 | FERROELECTRIC MEMORY DEVICE ERASURE | Non-Final OA | International Business Machines Corporation |
| 18751247 | HETEROJUNCTION STRUCTURE DEVICE, METHOD FOR MANUFACTURING THE SAME, FIELD EFFECT TRANSISTOR USING THE SAME, ARTIFICIAL VISUAL SYSTEM USING THE SAME, SOLAR CELL USING THE SAME, GAS SENSOR USING THE SAME, AND PIEZOELECTRIC DEVICE USING THE SAME | Non-Final OA | Research & Business Foundation Sungkyunkwan University |
| 18629346 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE | Final Rejection | SK hynix Inc. |
| 18611660 | METHODS AND APPARATUSES FOR CONNECTING AN INTEGRATED CIRCUIT AND A HEAT SINK | Non-Final OA | HL MANDO CORPORATION |
| 18403162 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | Final Rejection | ROHM CO., LTD. |
| 18750916 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF | Non-Final OA | YANGTZE MEMORY TECHNOLOGIES CO., LTD. |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy62.3% of resolved applications examined by Sheng-Bai Zhu were allowed (721 resolved cases), compared with 69.7% across Art Unit 2800 over the last five years.
This examiner's interview lift is +5.7 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Sheng-Bai Zhu took 1,030 days on average from filing to allowance.
Sheng-Bai Zhu examines applications in Art Unit 2800 in Tech Center 2800 (Semiconductors, Circuits & Optics).
