Prosecution Insights
Prosecution Insights
Technology area: Chemistry & Materials
6 pending office actions • 3 clients • 5 examiners • 3 art units • 0 of 6 (0%) have an AI response strategy ready • 8 patents granted in the last 365 days
Cantor Colburn LLP - DuPont operates in the Chemistry & Materials technology area, utilizing the firm's broad experience of 74190 career applications. This specific designation currently manages 5 pending office actions, representing a focused set of active matters. The firm's extensive history across a wide range of technical fields provides a strong context for its work in chemical and material science patents.
The firm reports a resolved allowance rate pct of 88.07, indicating success in securing patent rights. This success is achieved with an avg_office_actions_per_allowance of 3.16, suggesting that the firm typically navigates the examination process in a specific number of office actions. The 88.07 resolved allowance rate pct is a key indicator of the firm's effectiveness in the Chemistry & Materials sector. With 74190 career applications, the 3.16 avg_office_actions_per_allowance provides a reliable benchmark for the expected duration of the prosecution cycle. These data points offer a comprehensive view of the firm's performance and capacity.
Based on the USPTO statutory response window for each pending office action. 4 of the docket's apps have a known mailing date; the rest are excluded from the tile counts.
Every pending office action with a known statutory deadline, placed on a days-until-due axis. Dots left of Today are overdue; the further right, the more runway. Cases that share a deadline window stack vertically. 4 of the docket's apps have a known mailing date.
Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.
| Bucket | Cases |
|---|---|
| §103 only | 5 (83%) |
| Multi-statute (no §101) | 1 (17%) |
How the docket's pending cases split across USPTO tech-center bands.
Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.
| Examiner | Apps on this docket | Allow rate | Interview lift |
|---|---|---|---|
| CHAMPION, RICHARD DAVID | 2 | 45.7% | +11.9% |
| MCCULLOUGH, ERIC J. | 1 | 31.8% | +43.4% |
| KARST, DAVID THOMAS | 1 | 64.7% | +9.8% |
| CHU, JOHN S Y | 1 | 76.8% | +5.4% |
| MALLOY, ANNA E | 1 | 46.5% | -3.9% |
Multi-statute / §101-driven matters, or cases in front of an examiner with an allow rate under 30%. The top 1 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18758631 | FILTRATION MEMBRANES AND METHOD OF MANUFACTURE THEREOF | MCCULLOUGH, ERIC J. | — |
Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 3 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 17462216 | PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS | CHAMPION, RICHARD DAVID | 42d |
| 16731666 | POLYMERS AND PHOTORESIST COMPOSITIONS | CHAMPION, RICHARD DAVID | 42d |
| 18758631 | FILTRATION MEMBRANES AND METHOD OF MANUFACTURE THEREOF | MCCULLOUGH, ERIC J. | — |
| Client (Assignee) | Pending OAs |
|---|---|
| ROHM AND HAAS ELECTRONIC MATERIALS LLC | 4 |
| DuPont | 1 |
| ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. | 1 |
| Art Unit | Apps |
|---|---|
| 1737 | 4 |
| 1773 | 1 |
| 1767 | 1 |
| App # | Title | Client | Examiner | Art Unit | Statutes | Status | Due in | AI | Filed |
|---|---|---|---|---|---|---|---|---|---|
| 18758631 | FILTRATION MEMBRANES AND METHOD OF MANUFACTURE THEREOF | Dupont Electronic Materials International, LLC | MCCULLOUGH, ERIC J. | 1773 | §103§112 | Non-Final OA | — | Pending | Jun 28, 2024 |
| 18521544 | POLYMERS USEFUL AS SURFACE LEVELING AGENTS | Rohm And Haas Electronic Materials LLC | KARST, DAVID THOMAS | 1767 | §103 | Final Rejection | — | Pending | Nov 28, 2023 |
| 18085082 | PHOTORESIST UNDERLAYER COMPOSITION | Rohm And Haas Electronic Materials Korea Ltd. | CHU, JOHN S Y | 1737 | §103 | Final Rejection | 21d | Pending | Dec 20, 2022 |
| 17490923 | IODINE-CONTAINING ACID CLEAVABLE COMPOUNDS, POLYMERS DERIVED THEREFROM, AND PHOTORESIST COMPOSITIONS | Rohm And Haas Electronic Materials LLC | MALLOY, ANNA E | 1737 | §103 | Final Rejection | 35d | Pending | Sep 30, 2021 |
| 17462216 | PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS | Rohm And Haas Electronic Materials LLC | CHAMPION, RICHARD DAVID | 1737 | §103 | Final Rejection | 42d | Pending | Aug 31, 2021 |
| 16731666 | POLYMERS AND PHOTORESIST COMPOSITIONS | Rohm And Haas Electronic Materials LLC | CHAMPION, RICHARD DAVID | 1737 | §103 | Final Rejection | 42d | Pending | Dec 31, 2019 |
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