Prosecution Insights
Last updated: October 27, 2026

KLA Corporation

Technology area: Semiconductors, Circuits & Optics

65 pending office actions • 32 art units • 58 examiners • 0 of 65 (0%) have an AI response strategy ready • 108 patents granted in the last 365 days

Analysis

KLA Corporation has 67 pending office actions in Semiconductors, Circuits & Optics. The portfolio spans 57 examiners and 32 art units, creating a wide prosecution network across both technical groupings and individual examination assignments.

SCHNASE, PAUL DANIEL is the busiest examiner, with 3 pending matters. That concentration is modest relative to the overall portfolio, so a single-examiner strategy would not address the broader docket. Counsel should organize work by art unit and track examiner-specific treatment within each group. The number of examiners also supports maintaining a centralized record of claim amendments, cited references, and recurring objections, while preserving flexibility for responses tailored to individual examiners.

Written from this page's own data; every figure is computed from USPTO records and verified before publication.

Portfolio Summary

65
Total Pending OAs
43
Non-Final OAs
20
Final Rejections
2
Advisory / Quayle

Response Deadline Pressure

Based on the USPTO statutory response window for each pending office action. 24 of the docket's apps have a known mailing date; the rest are excluded from the tile counts.

19
Overdue
0
Due this week
2
Due this month
3
Due in next 60 days
0
Due later

Deadline Fire Line

Every pending office action with a known statutory deadline, placed on a days-until-due axis. Dots left of Today are overdue; the further right, the more runway. Cases that share a deadline window stack vertically. 24 of the docket's apps have a known mailing date.

-30dToday30d60d90d120d
Overdue (19)Due ≤ 30 days (2)Due ≤ 60 days (3)

Case Difficulty Mix

Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.

29
Hard (45%)
34
Medium (52%)
2
Easy (3%)
0
Unknown (0%)

Rejection Statute Mix

BucketCases
§101 only2 (3%)
§101 + other4 (6%)
§103 only30 (46%)
§102 only3 (5%)
§112 only2 (3%)
Double-patenting + other1 (2%)
Multi-statute (no §101)23 (35%)

Industry Mix

How the docket's pending cases split across USPTO tech-center bands.

4
Life Sciences
6% of docket
9
Information Tech
14% of docket
10
Communications
15% of docket
40
Semiconductors
62% of docket
2
Mechanical / Eng
3% of docket
0
Business / Other
0% of docket

Time-on-OA Estimate

Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.

650 h
Manual time on pending OAs
130 h
Time saved (low, 20%)
227 h
Time saved (mid, 35%)
5.7 wks
FTE-weeks freed (mid)

Top Examiners on this docket

ExaminerApps on this docketAllow rateInterview lift
SCHNASE, PAUL DANIEL 3 67.7% +7.7%
STOCK JR, GORDON J 3 81.6% +17.4%
GUNBERG, EDWIN C 2 78.2% +6.9%
KALISZEWSKI, ALINA ROSE 2 84.6% +23.3%
FABIAN JR, ROBERTO 2 71.0% +28.5%
RAHMAN, MOHAMMAD J 1 80.0% +9.1%
NAH, JONGBONG 1 76.0% +17.5%
YAZBACK, MAHER 1 77.8% +21.2%
LYONS, MICHAEL A 1 86.5% +9.9%
TRAN, JUDY DAO 1 80.0% +16.5%

Quick Wins (2)

Cases in front of an examiner with an allow rate of 80%+ where the difficulty is Easy or Medium. The top 2 ordered by deadline are shown.

App #TitleExaminerDue in
19064208 OVERLAY METROLOGY TARGET RAHMAN, MOHAMMAD J —
18612383 SYSTEM AND METHOD FOR DEVICE-LIKE OVERLAY TARGETS MEASUREMENT STOCK JR, GORDON J —

Hard Cases (29)

Multi-statute / §101-driven matters, or cases in front of an examiner with an allow rate under 30%. The top 8 ordered by deadline are shown.

App #TitleExaminerDue in
18401569 CALIBRATION FOR IN-PLANE DISTORTION TOOL-TO-TOOL MATCHING SCHNASE, PAUL DANIEL 154d overdue
17762030 CALIBRATED MEASUREMENT OF OVERLAY ERROR USING SMALL TARGETS SCHNASE, PAUL DANIEL 97d overdue
18467371 ANGLE RESOLVED REFLECTOMETRY FOR THICK FILMS AND HIGH ASPECT RATIO STRUCTURES STOCK JR, GORDON J 72d overdue
18375512 IMAGING THOUSANDS OF ELECTRON BEAMS DURING WORKPIECE INSPECTION KALISZEWSKI, ALINA ROSE 70d overdue
18587703 SIDE-BY-SIDE OFF-CENTER DIE OVERLAY TARGET LAPAGE, MICHAEL P 58d overdue
16935432 Systems and Methods for MOKE Metrology with Consistent MRAM Die Orientation SCHINDLER, DAVID M 24d overdue
18128125 MULTI-MODE OPTICAL INSPECTION DULANEY, KATHLEEN YUAN 10d overdue
17887078 SYSTEM AND METHOD FOR FEATURE SIGNAL ENHANCEMENT USING A SELECTIVELY BONDED PHOTOLUMINESCENT MATERIAL PHILLIPS, RUFUS L 4d overdue

Interview Candidates (10)

Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 8 ordered by deadline are shown.

App #TitleExaminerDue in
18467371 ANGLE RESOLVED REFLECTOMETRY FOR THICK FILMS AND HIGH ASPECT RATIO STRUCTURES STOCK JR, GORDON J 72d overdue
18375512 IMAGING THOUSANDS OF ELECTRON BEAMS DURING WORKPIECE INSPECTION KALISZEWSKI, ALINA ROSE 70d overdue
18387015 Methods And Systems For Measurement Of Semiconductor Structures With Active Tilt Correction FABIAN JR, ROBERTO 1d overdue
18343390 EUV In-Situ Linearity Calibration for TDI Image Sensors Using Test Photomasks FABIAN JR, ROBERTO 57d
19051999 VISION FOUNDATION MODEL FOR MULTIMODE IMAGING NAH, JONGBONG —
19018943 SYSTEM AND METHOD FOR DETERMINING POST BONDING OVERLAY STOCK JR, GORDON J —
19012641 DYNAMIC RANGE EXTENSION OF OPTICAL SYSTEMS WITH MULTIPLE LOW INTENSITY BEAMS YAZBACK, MAHER —
18977795 Methods And Systems For Reflectometry Based Measurements Of Deep, Large Pitch Semiconductor Structures TRAN, JUDY DAO —

Top Art Units

Art UnitApps
2877 19
2881 6
2884 5
2663 3
2878 2
2669 2
2665 2
2857 2
2487 1
2674 1

Pending Office Actions

App #TitleExaminerArt UnitStatutesStatusDue inAIFiled
19064208 OVERLAY METROLOGY TARGET RAHMAN, MOHAMMAD J 2487 §103 Non-Final OA — Pending Feb 26, 2025
19062979 SYSTEM AND METHOD FOR ENHANCING PHOTOLUMINESCENCE GUNBERG, EDWIN C 2884 §103 Non-Final OA — Pending Feb 25, 2025
19062941 OPTICAL METHOD TO ENHANCE DETECTION VISIBILITY USING BRIGHT EMISSIVE PROBE GUNBERG, EDWIN C 2884 §103 Non-Final OA — Pending Feb 25, 2025
19051999 VISION FOUNDATION MODEL FOR MULTIMODE IMAGING NAH, JONGBONG 2674 §103 Final Rejection — Pending Feb 12, 2025
19040176 CALIBRATED MEASUREMENT OF OVERLAY ERROR USING SMALL TARGETS SCHNASE, PAUL DANIEL 2877 §103 Non-Final OA — Pending Jan 29, 2025
19018943 SYSTEM AND METHOD FOR DETERMINING POST BONDING OVERLAY STOCK JR, GORDON J 2877 §101§112Other Non-Final OA — Pending Jan 13, 2025
19012641 DYNAMIC RANGE EXTENSION OF OPTICAL SYSTEMS WITH MULTIPLE LOW INTENSITY BEAMS YAZBACK, MAHER 2877 §102§103§112 Non-Final OA — Pending Jan 07, 2025
18999512 ULTRA-HIGH SENSITIVITY HYBRID INSPECTION WITH FULL WAFER COVERAGE CAPABILITY WITH STEP AND SETTLE STAGE LYONS, MICHAEL A 2877 §103§112 Non-Final OA — Pending Dec 23, 2024
18977795 Methods And Systems For Reflectometry Based Measurements Of Deep, Large Pitch Semiconductor Structures TRAN, JUDY DAO 2877 §103§112 Non-Final OA — Pending Dec 11, 2024
18974372 SYSTEM AND METHOD FOR MITIGATING OVERLAY DISTORTION PATTERNS CAUSED BY A WAFER BONDING TOOL HARTMAN JR, RONALD D 2119 §103 Non-Final OA — Pending Dec 09, 2024
18972428 Measurements Of Complex Semiconductor Structures Based On Component Measurement Signals HANSEN, JONATHAN M 2877 §102 Non-Final OA — Pending Dec 06, 2024
18970542 REDUCED FLUCTUATIONS AND INCREASED BRIGHTNESS UNIFORMITY OF LASER SUSTAINED PLASMA SOURCES LUU, THANH X 2878 §103 Non-Final OA — Pending Dec 05, 2024
18959278 ENCODING DESIGN INFORMATION FOR A SPECIMEN FOR RUNTIME USE IN INSPECTION AND OTHER PROCESSES ISLAM, PROMOTTO TAJRIAN 2669 §102§112 Non-Final OA — Pending Nov 25, 2024
18936993 TRANSISTOR CHANNEL STRESS AND MOBILITY METROLOGY USING MULTIPASS SPECTROSCOPIC ELLIPSOMETRY AND RAMAN JOINT MEASUREMENT HUANG, DAVID Z 2855 §103 Non-Final OA — Pending Nov 04, 2024
18909820 ULTRA-HIGH SENSITIVITY HYBRID INSPECTION WITH FULL WAFER COVERAGE CAPABILITY KALISZEWSKI, ALINA ROSE 2881 §102§103§112 Non-Final OA — Pending Oct 08, 2024
18907563 SEGMENTATION-BASED CARE AREA SETUP FOR INSPECTION OF A SPECIMEN USING EDGE DETECTION SILVA-AVINA, EMMANUEL 2673 §103§112 Non-Final OA — Pending Oct 06, 2024
18896205 FEATURE PLACEMENT ERROR (FPE) METROLOGY AND CORRECTION TRAN, VINCENT HUY 2115 §103 Non-Final OA — Pending Sep 25, 2024
18887461 Electrical Performance Prediction Based On Structural Measurements Of Partially Fabricated Semiconductor Devices MENDOZA, ALEXANDRIA ARELLANO 2877 §102§103 Non-Final OA — Pending Sep 17, 2024
18827828 CONCENTRICITY OFFSET MEASUREMENT FOR HYBRID BONDING LEE, BENEDICT E 2665 §103 Non-Final OA — Pending Sep 08, 2024
18796860 METROLOGY MEASUREMENTS ON SMALL TARGETS WITH CONTROL OF ZERO-ORDER SIDE LOBES CHILTON, CLARA GRACE 3645 §103§112 Non-Final OA — Pending Aug 07, 2024
18756439 METROLOGY METHOD OF CALIBRATING AND MONITORING RADIATION IN EUV LITHOGRAPHIC SYSTEMS MALEVIC, DJURA 2884 §103 Non-Final OA — Pending Jun 27, 2024
18755644 WAVEPLATE COMPENSATOR DESIGN UNDERWOOD, JARREAS C 2877 §103 Final Rejection 60d overdue Pending Jun 26, 2024
18752650 GROWTH OF STRONTIUM TETRABORATE CRYSTALS KUNEMUND, ROBERT M 1714 §103 Final Rejection — Pending Jun 24, 2024
18743048 Measurements Of Semiconductor Structures Based On Data Collected At Prior Process Steps QUIGLEY, KYLE ROBERT 2857 §101§102§103§112 Non-Final OA — Pending Jun 13, 2024
18738393 SYSTEMS AND METHODS OF SEM INSPECTION USING SELECTIVE SCAN APPROACH NGUYEN, KIET TUAN 2881 §102 Non-Final OA — Pending Jun 10, 2024
18671172 Back-Illuminated Sensor With Boron Layer Deposited Using Plasma Atomic Layer Deposition AMER, MOUNIR S 2818 §102Other Non-Final OA — Pending May 22, 2024
18652438 DYNAMIC FREEFORM OPTICS FOR LITHOGRAPHY ILLUMINATION BEAM SHAPING KIM, PETER B 2882 §103§112 Non-Final OA — Pending May 01, 2024
18630417 FOCUS POSITION MEASUREMENT WHILE SCANNING HANEY, NOAH JAMES 2877 §102§103 Non-Final OA — Pending Apr 09, 2024
18612383 SYSTEM AND METHOD FOR DEVICE-LIKE OVERLAY TARGETS MEASUREMENT STOCK JR, GORDON J 2877 §112 Final Rejection — Pending Mar 21, 2024
18611299 FLUORESCENCE MODE FOR WORKPIECE INSPECTION COOK, JONATHON 2877 §103 Final Rejection 44d overdue Pending Mar 20, 2024
18597581 METHOD AND SYSTEM FOR AUTOMATIC RETRAINING OF MACHINE LEARNING MODELS FOR METROLOGY METRIC ESTIMATION MOORE, URIAH VENDELL 2142 §103§112 Non-Final OA — Pending Mar 06, 2024
18594991 METHOD AND SYSTEM FOR BONDING HIGH FLUENCE OPTICS TO OPTOMECHANICAL ASSEMBLIES STONER, KILEY SHAWN 1735 §103 Final Rejection 16d overdue Pending Mar 04, 2024
18587703 SIDE-BY-SIDE OFF-CENTER DIE OVERLAY TARGET LAPAGE, MICHAEL P 2877 §102§103 Final Rejection 58d overdue Pending Feb 26, 2024
18438165 VUV LASER-SUSTAINED PLASMA LIGHT SOURCE WITH LONG-PASS FILTERING EINHORN, MICA JILLIAN 2881 §102§103§112DP Non-Final OA — Pending Feb 09, 2024
18438122 METROLOGY WITH PARALLEL SUBSYSTEMS AND MUELLER SIGNALS TRAINING BYCER, ERIC J 2141 §103 Non-Final OA — Pending Feb 09, 2024
18421454 OVERLAY METROLOGY TARGET FOR DIE-TO-WAFER OVERLAY METROLOGY WHITESELL, STEVEN H 1759 §102§103 Non-Final OA 13d Pending Jan 24, 2024
18416113 X-Ray Scatterometry Based Measurements Of Memory Array Structures Stacked With Complex Logic Structures LU, ZHIYU 2665 §103 Non-Final OA — Pending Jan 18, 2024
18404530 IMAGE SENSORS WITH A TUNABLE FLOATING DIFFUSION STRUCTURE TRICE III, WILLIAM CLARENCE 2893 §102§103 Final Rejection — Pending Jan 04, 2024
18401569 CALIBRATION FOR IN-PLANE DISTORTION TOOL-TO-TOOL MATCHING SCHNASE, PAUL DANIEL 2877 §101§102§103 Final Rejection 154d overdue Pending Dec 31, 2023
18535159 SYSTEM AND METHOD OF FINDING PIXEL-TO-DESIGN TARGET FOR DRAM INSPECTION CONNER, SEAN M 2663 §103 Final Rejection 49d overdue Pending Dec 11, 2023
18387015 Methods And Systems For Measurement Of Semiconductor Structures With Active Tilt Correction FABIAN JR, ROBERTO 2877 §101 Non-Final OA 1d overdue Pending Nov 04, 2023
18375512 IMAGING THOUSANDS OF ELECTRON BEAMS DURING WORKPIECE INSPECTION KALISZEWSKI, ALINA ROSE 2881 §103§112 Final Rejection 70d overdue Pending Sep 30, 2023
18374106 INSPECTION OF ADAPTIVE PATTERNED WORKPIECES WITH DYNAMIC DESIGN AND DEEP LEARNING-BASED RENDERING MORSE, GREGORY ALLAN 2663 §103§112 Non-Final OA — Pending Sep 28, 2023
18368242 FRICTIONLESS DESIGN OF HIGH-PRESSURE RECIRCULATION THERMO-PUMP BRANDT, DAVID NELSON 3783 §112 Non-Final OA — Pending Sep 14, 2023
18467371 ANGLE RESOLVED REFLECTOMETRY FOR THICK FILMS AND HIGH ASPECT RATIO STRUCTURES STOCK JR, GORDON J 2877 §102§103 Non-Final OA 72d overdue Pending Sep 14, 2023
18234773 MULTI-PITCH GRID OVERLAY TARGET FOR SCANNING OVERLAY METROLOGY XING, CHRISTINA ILONA 2877 §103 Non-Final OA 10d overdue Pending Aug 16, 2023
18229606 Methods And Systems For Systematic Error Compensation Across A Fleet Of Metrology Systems Based On A Trained Error Evaluation Model GAVIA, NYLA EMANI ANN 2857 §101 Non-Final OA 35d Pending Aug 02, 2023
18228643 PUPIL FILTER WITH SPATIALLY-VARYING TRANSMISSION ARTMAN, THOMAS R 2884 §103 Non-Final OA 34d Pending Jul 31, 2023
18358841 PHOTOLUMINESCENCE FOR SEMICONDUCTOR YIELD RELATED APPLICATIONS TANINGCO, MARCUS H 2884 §103 Non-Final OA — Pending Jul 25, 2023
18343390 EUV In-Situ Linearity Calibration for TDI Image Sensors Using Test Photomasks FABIAN JR, ROBERTO 2877 §102§103 Final Rejection 57d Pending Jun 28, 2023

View all 65 →

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Frequently Asked Questions

How many pending USPTO office actions does KLA Corporation have?

KLA Corporation has 65 pending office actions as of October 2026, spread across 32 art units and 58 examiners.

Which USPTO examiner handles the most KLA Corporation applications?

Paul Daniel Schnase has the most, with 3 of KLA Corporation's pending office actions.

What technology area are KLA Corporation's patent applications in?

Mostly Semiconductors, Circuits & Optics (USPTO Tech Center 2800), based on where its pending office actions are examined.

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