Prosecution Insights
Prosecution Insights
Tech Center 4100 • Art Units: 2811 2875 4100
This examiner grants 71% of resolved cases
Peter M. Albrecht has 500 resolved cases in Tech Center 4100. The allowance rate is 71.2% and the interview lift is 3.5%. The median days to allowance is 1002. In Art Unit 2811, the 71.2% allowance rate is based on 500 cases. The 3.5% interview lift indicates a minor benefit from interviews. The 1002-day median is a standard timeline for this examiner. The 500 resolved cases provide a solid statistical basis.
The 71.2% allowance rate is a key metric for applicants in Art Unit 2811. The 3.5% interview lift is a small but positive data point. The 1002-day median provides a clear expectation for prosecution duration. Practitioners can use these figures to plan their approach in Tech Center 4100. The data reflects a consistent performance across 500 resolved cases. The 71.2% allowance rate is a reliable indicator.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18741416 | INTEGRATED CIRCUIT DEVICE | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18026465 | ARRAY BASEPLATE AND PREPARATION METHOD THEREOF, AND DISPLAY DEVICE | Non-Final OA | BOE TECHNOLOGY GROUP CO., LTD. |
| 18815812 | DISPLAY DEVICE AND TILED DISPLAY DEVICE INCLUDING THE SAME | Final Rejection | SAMSUNG DISPLAY CO., LTD. |
| 18428984 | VARIABLE STACK NANOSHEET DEVICES AND METHODS FOR MAKING THE SAME | Non-Final OA | QUALCOMM Incorporated |
| 18609282 | PHOTOLITHOGRAPHIC MASKS AND DEVICES FABRICATED THEREFROM | Non-Final OA | TEXAS INSTRUMENTS INCORPORATED |
| 18619000 | METHODS OF FORMING MICROELECTRONIC DEVICES, AND RELATED MICROELECTRONIC DEVICES, MEMORY DEVICES, AND ELECTRONIC SYSTEMS | Non-Final OA | Micron Technology, Inc. |
| 18526447 | ELECTRONIC DEVICE HAVING A BRASABLE METAL PAD COVER AND ASSOCIATED METHOD | Final Rejection | STMicroelectronics International N.V. |
| 18950227 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. |
| 18443158 | FIELD EFFECT TRANSISTOR WITH ISOLATED SOURCE/DRAINS AND METHODS | Non-Final OA | Taiwan Semiconductor Manufacturing Company Ltd. |
| 18661470 | MIXED-SPECIES BUFFER FILM FOR STRUCTURAL INTEGRITY OF METALLIZATION | Non-Final OA | Tokyo Electron Limited |
| 18766956 | SEMICONDUCTOR DEVICE WITH AIR GAP AND METHOD FOR FABRICATING THE SAME | Non-Final OA | NANYA TECHNOLOGY CORPORATION |
| 18491808 | SILICON CARBIDE SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING SILICON CARBIDE SEMICONDUCTOR DEVICE | Final Rejection | FUJI ELECTRIC CO., LTD. |
| 18755706 | SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME | Non-Final OA | UNITED MICROELECTRONICS CORP. |
| 18266788 | DISPLAY PANELS AND DISPLAY DEVICES | Non-Final OA | GUANGZHOU CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO., LTD. |
| 18672306 | LIGHT EMITTING DEVICE AND APPARATUS USING THE SAME | Non-Final OA | SEOUL VIOSYS CO., LTD. |
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