Tech Center 4100 • Art Units: 2811 2875 4100
This examiner grants 71% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18944685 | OXIDE SEMICONDUCTOR TRANSISTOR, METHOD OF MANUFACTURING THE SAME, AND MEMORY DEVICE INCLUDING OXIDE SEMICONDUCTOR TRANSISTOR | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18741416 | INTEGRATED CIRCUIT DEVICE | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18661891 | SUBSTRATE STAGE INSPECTION METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD INCLUDING THE SAME | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18626520 | INTEGRATED CIRCUIT DEVICE INCLUDING A PFET WITH A SILICON GERMANIUM CLADDED CHANNEL AND METHODS OF FORMING THE SAME | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18421113 | SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18026465 | ARRAY BASEPLATE AND PREPARATION METHOD THEREOF, AND DISPLAY DEVICE | Non-Final OA | BOE TECHNOLOGY GROUP CO., LTD. |
| 18475040 | DISPLAY DEVICE AND METHOD OF FABRICATING THE SAME | Non-Final OA | Samsung Display Co., Ltd. |
| 18428984 | VARIABLE STACK NANOSHEET DEVICES AND METHODS FOR MAKING THE SAME | Non-Final OA | QUALCOMM Incorporated |
| 18950227 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. |
| 18443158 | FIELD EFFECT TRANSISTOR WITH ISOLATED SOURCE/DRAINS AND METHODS | Non-Final OA | Taiwan Semiconductor Manufacturing Company Ltd. |
| 18643100 | SELF-LIMITED ETCHING OF LOW-K MATERIALS | Non-Final OA | Applied Materials, Inc. |
| 18661470 | MIXED-SPECIES BUFFER FILM FOR STRUCTURAL INTEGRITY OF METALLIZATION | Non-Final OA | Tokyo Electron Limited |
| 18437637 | ELECTRICAL DEVICE COMPRISING A MONOLITHIC DIAMOND REGION COMPRISING A CAPACITOR | Non-Final OA | Murata Manufacturing Co., Ltd. |
| 18598389 | SELF-ALIGNED BACKSIDE VIA FOR BACKSIDE POWER SCHEME | Non-Final OA | International Business Machines Corporation |
| 18641408 | SEMICONDUCTOR DEVICE | Non-Final OA | FUJI ELECTRIC CO., LTD. |
| 18491808 | SILICON CARBIDE SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING SILICON CARBIDE SEMICONDUCTOR DEVICE | Final Rejection | FUJI ELECTRIC CO., LTD. |
| 18755706 | SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME | Non-Final OA | UNITED MICROELECTRONICS CORP. |
| 18672306 | LIGHT EMITTING DEVICE AND APPARATUS USING THE SAME | Non-Final OA | SEOUL VIOSYS CO., LTD. |
| 18741411 | SEMICONDUCTOR STRUCTURE AND PREPARATION METHOD THEREOF | Non-Final OA | Enkris Semiconductor, Inc. |
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