Prosecution Insights
Prosecution Insights
Tech Center 4100 • Art Units: 1713 1718 1784 1794 4161
This examiner grants 56% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 17864541 | PLASMA CONTROL APPARATUS AND PLASMA PROCESSING SYSTEM | Non-Final OA | Samsung Electronics Co., Ltd. |
| 17837364 | MANUFACTURING APPARATUS FOR GROUP-III COMPOUND SEMICONDUCTOR CRYSTAL | Final Rejection | Panasonic Holdings Corporation |
| 18616526 | PLASMA ETCHING APPARATUS AND PLASMA ETCHING METHOD | Non-Final OA | Tokyo Electron Limited |
| 17943702 | METHOD OF DETECTING DEVIATION AMOUNT OF SUBSTRATE TRANSPORT POSITION AND SUBSTRATE PROCESSING APPARATUS | Non-Final OA | Tokyo Electron Limited |
| 17896904 | APPARATUS FOR FORMING FILM ON SUBSTRATE AND METHOD FOR FORMING FILM ON SUBSTRATE | Final Rejection | TOKYO ELECTRON LIMITED |
| 17809384 | PLASMA PROCESSING APPARATUS | Final Rejection | Tokyo Electron Limited |
| 17850250 | SUBSTRATE SUPPORT, SUBSTRATE SUPPORT ASSEMBLY, AND PLASMA PROCESSING APPARATUS | Final Rejection | Tokyo Electron Limited |
| 17661124 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD | Final Rejection | Tokyo Electron Limited |
| 17907857 | PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD | Final Rejection | Hitachi High-Tech Corporation |
| 17853569 | EXHAUST PIPE APPARATUS | Final Rejection | Kioxia Corporation |
| 18106635 | SUBSTRATE TREATMENT APPARATUS | Non-Final OA | ASM IP Holding B.V. |
| 18046302 | METHODS AND APPARATUSES FOR PREVENTION OF TEMPERATURE INTERACTION IN SEMICONDUCTOR PROCESSING SYSTEMS | Non-Final OA | ASM IP HOLDING B.V. |
| 18185638 | TECHNIQUES AND APPARATUS FOR UNIDIRECTIONAL HOLE ELONGATION USING ANGLED ION BEAMS | Final Rejection | APPLIED Materials, Inc. |
| 18074385 | Heated Pedestal With Impedance Matching Radio Frequency (RF) Rod | Final Rejection | Applied Materials, Inc. |
| 17561085 | BASE PLATE FOR HEATER PEDESTAL | Final Rejection | Applied Materials, Inc. |
| 18612809 | PECVD DEPOSITION SYSTEM FOR DEPOSITION ON SELECTIVE SIDE OF THE SUBSTRATE | Non-Final OA | Lam Research Corporation |
| 17944190 | APPARATUS FOR PROCESSING SUBSTRATE | Non-Final OA | SEMES CO., LTD. |
| 17879780 | SUBSTRATE TREATING APPARATUS AND SEMICONDUCTOR MANUFACTURING EQUIPMENT INCLUDING THE SAME | Final Rejection | SEMES CO., LTD. |
| 17834154 | SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD | Final Rejection | SEMES CO., LTD. |
| 17901252 | SUBSTRATE PROCESSING APPARATUS | Final Rejection | WONIK IPS CO., LTD. |
| 18023934 | FILM FORMATION DEVICE | Final Rejection | Shincron Co., Ltd. |
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