Tech Center 2800 • Art Units: 2189 2825 2851
This examiner grants 87% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18442152 | MULTI-CELL BATTERY FAULT INDICATOR | Non-Final OA | TEXAS INSTRUMENTS INCORPORATED |
| 18512792 | SYSTEMS AND METHODS TO DETECT CELL-INTERNAL DEFECTS | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18089546 | SCAN CHAIN DIAGNOSTIC ACCURACY USING HIGH VOLUME MANUFACTURING FUNCTIONAL TESTING | Non-Final OA | Intel Corporation |
| 18301289 | Storage Medium, Quantum Chemical Computing Method, and Quantum Chemical Computing Device | Non-Final OA | FUJITSU LIMITED |
| 18315904 | Learning-Based Macro Placement with Quality of Human Experts | Non-Final OA | MediaTek Inc. |
| 18087443 | DIGITAL ULTRAVIOLET LITHOGRAPHY METHOD AND APPARATUS | Final Rejection | The Hong Kong Polytechnic University |
| 18065053 | SYNTHETIC DATA FOR 2D PATHFINDING | Final Rejection | THE BOARD OF TRUSTEES OF THE UNIVERSITY OF ILLINOIS |
| 18814428 | MASK OPTIMIZATION FOR LAYER ACCOUNTING FOR OVERLAP WITH OTHER LAYERS | Non-Final OA | D2S, Inc. |
| 18028413 | HOLDING DEVICE FOR ARRANGEMENT ON A BATTERY PACK OF A MACHINE TOOL | Non-Final OA | Festool GmbH |
| 18203662 | LAYOUT METHOD AND APPLICATION OF SCALABLE MULTI-DIE NETWORK-ON-CHIP FPGA ARCHITECTURE | Non-Final OA | SHANGHAITECH UNIVERSITY |
| 18305350 | METHOD FOR FULL-CHIP QUICK SIMULATION OF NEGATIVE TONE DEVELOPMENT PHOTOLITHOGRAPHY PROCESS, NEGATIVE TONE DEVELOPMENT PHOTORESIST MODEL, OPC MODEL, AND ELECTRONIC DEVICE | Non-Final OA | DONGFANG JINGYUAN ELECTRON CO., LTD. |
| 17863500 | QUANTUM CIRCUIT FOR SIMULATING BOUNDARY OPERATOR | Non-Final OA | University of the Witwatersrand |
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