Tech Center 2800 • Art Units: 2897
This examiner grants 75% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18005849 | SEMICONDUCTOR MANUFACTURING APPARATUS AND SUBSTRATE TREATMENT METHOD USING THE SAME | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 17879107 | SEMICONDUCTOR DEVICE AND SEMICONDUCTOR MEMORY DEVICE INCLUDING THE SAME | Non-Final OA | Samsung Electronics Co., Ltd. |
| 17044845 | DISPLAY SUBSTRATE, PREPARATION METHOD THEREOF AND DISPLAY DEVICE | Final Rejection | BOE TECHNOLOGY GROUP CO., LTD. |
| 18342932 | MANUFACTURING METHOD OF DISPLAY DEVICE | Non-Final OA | Samsung Display Co., LTD. |
| 17736790 | NITRIDE SEMICONDUCTOR ELEMENT | Non-Final OA | Nichia Corporation |
| 17133080 | METAL LINE AND VIA BARRIER LAYERS, AND VIA PROFILES, FOR ADVANCED INTEGRATED CIRCUIT STRUCTURE FABRICATION | Final Rejection | Intel Corporation |
| 17785795 | MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE | Final Rejection | HITACHI ASTEMO, LTD. |
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