Listed by the USPTO as LEE, ERIC D
Tech Center 2800 • Art Units: 2825 2851
This examiner grants 82% of resolved cases
LEE, ERIC D has 659 resolved cases and an 81.5% allowance rate. The interview lift is 19.3%, and the median time to allowance is 905 days. The record is associated with Tech Center 2800 and Art Unit 2825. The positive interview lift indicates that interviews have been linked to improved measured outcomes, while the allowance rate provides a favorable overall outcome profile. The 905-day median remains relevant to prosecution scheduling and continuation decisions.
The recurring companies are Amd, Siemens Aktiengesellschaft, and International Business Machines Corporation. The leading firms are Harrity & Harrity, LLP, KLARQUIST SPARKMAN, LLP, and Law Offices of James Zhou. Practitioners can use this technology and counsel mix to tailor claim presentations and focus interviews on concrete distinctions.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18556207 | ELECTRO-MECHANICAL MULTI-BOARD ASSEMBLY AND PLACEMENT COLLABORATION | Non-Final OA | Siemens Industry Software Inc. |
| 18460908 | LAYOUT AND SCHEMATIC INCONSISTENCY CHECKING ACROSS HIERARCHICAL BOUNDARIES AND PREVENTATIVE DESIGN CONVENTIONS | Non-Final OA | International Business Machines Corporation |
| 18031865 | METHOD FOR GENERATING MASK PATTERN | Final Rejection | ASML NETHERLANDS B.V. |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy81.5% of resolved applications examined by Eric D Lee were allowed (659 resolved cases), compared with 81.3% across Art Unit 2825 over the last five years.
This examiner's interview lift is +19.3 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Eric D Lee took 905 days on average from filing to allowance.
Eric D Lee examines applications in Art Unit 2825 in Tech Center 2800 (Semiconductors, Circuits & Optics).
