Prosecution Insights
Prosecution Insights
Tech Center 3700 • Art Units: 1715 1718 1731 1788 1792 2893 3752
This examiner grants 48% of resolved cases
Mandy C. Louie works in Tech Center 3700 and Art Unit 1715. With 545 resolved cases, the examiner has an allowance rate of 47.9 percent. This 47.9 percent rate indicates a prosecution environment where slightly less than half of applications are granted. The 545 resolved cases provide a solid foundation for these metrics.
The interview lift is 29.0 percent. This 29.0 percent lift shows that interviews are a valuable tactic for increasing the probability of an allowance. The 29.0 percent increase over the 47.9 percent baseline is a significant factor for applicants to consider. Practitioners should evaluate this 29.0 percent figure when planning their strategy.
The median days to allowance is 1397. This 1397-day timeline reflects the duration of the prosecution process. The data from 545 resolved cases shows that the 47.9 percent allowance rate and 1397-day pendency are the primary metrics for Art Unit 1715. These figures provide a clear view of the examiner's history in Tech Center 3700.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 17591688 | TOOLS AND METHODS FOR THEIR FORMATION AND USE | Final Rejection | GENERAL ELECTRIC COMPANY |
| 18755620 | MATERIAL LAYER DEPOSITION METHODS, SEMICONDUCTOR PROCESSING SYSTEMS, AND COMPUTER PROGRAM PRODUCTS FOR CONTROLLING THICKNESS OF PRECOAT MATERIAL LAYERS IN SEMICONDUCTOR PROCESSING SYSTEMS | Final Rejection | ASM IP Holding B.V. |
| 18222012 | SUBSTRATE PROCESSING METHOD | Non-Final OA | ASM IP Holding B.V. |
| 18116662 | ALTERNATING MULTI-SOURCE VAPOR TRANSPORT DEPOSITION | Non-Final OA | Massachusetts Institute of Technology |
| 18678769 | DAMAGE RESISTANT CERAMIC MATRIX COMPOSITES | Non-Final OA | RTX Corporation |
| 18495330 | DEPOSITION OF CARBON GAPFILL MATERIALS | Non-Final OA | Applied Materials, Inc. |
| 17903892 | CONTROLLED DELIVERY OF LOW-VAPOR-PRESSURE PRECURSOR INTO A CHAMBER | Non-Final OA | Applied Materials, Inc. |
| 17891753 | CONFORMAL MOLYBDENUM DEPOSITION | Final Rejection | Applied Materials, Inc. |
| 18263920 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS | Final Rejection | Tokyo Electron Limited |
| 18794561 | ION IMPLANTATION METHOD AND RELATED SYSTEMS | Non-Final OA | ENTEGRIS, INC. |
| 17050906 | METHOD FOR PREPARING SILVER NANOPARTICLES STABILIZED WITH TETRAOCTYLAMMONIUM, AND METHOD FOR PRODUCING ELECTRICALLY CONDUCTIVE THIN FILM BY USING SILVER NANOPARTICLES PREPARED BY SAME | Final Rejection | KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION |
| 18721192 | VAPOR DEPOSITION SYSTEMS AND METHODS, AND NANOMATERIALS FORMED BY VAPOR DEPOSITION | Non-Final OA | UNIVERSITY OF MARYLAND, COLLEGE PARK |
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