Listed by the USPTO as MCCALL SHEPARD, SONYA D
Tech Center 2800 • Art Units: 2813 2847 2898
This examiner grants 93% of resolved cases
MCCALL SHEPARD, SONYA D is assigned to Tech Center 2800 and Art Unit 2813. The profile contains 1200 resolved cases, with a 92.8% allowance rate and a median of 758 days to allowance. The combination of a large record and high allowance rate identifies a strongly allowance-oriented outcome pattern in the available data.
The interview lift is 3.5%, indicating only a small positive association between interviews and allowance outcomes. The listed companies are Samsung Display Co., Ltd., International Business Machines Corporation, and Fuji Electric Co., Ltd. The principal firms are CANTOR COLBURN LLP, Harrity & Harrity, LLP, and Womble Bond Dickinson US LLP. Practitioners may find the applicant and firm history useful when evaluating prosecution approaches in this docket, while the interview measure offers limited additional differentiation.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18746736 | SEMICONDUCTOR MEMORY DEVICE, METHOD FOR FABRICATING THE SAME AND ELECTRONIC SYSTEM INCLUDING THE SAME | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18646103 | SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE | Non-Final OA | FUJI ELECTRIC CO., LTD. |
| 18811420 | DISPLAY DEVICE | Non-Final OA | Samsung Display Co., LTD. |
| 18736316 | LIGHT-EMITTING DIODE, DISPLAY DEVICE, AND DEPOSITION APPARATUS | Non-Final OA | Samsung Display Co., Ltd. |
| 18733852 | DISPLAY APPARATUS | Non-Final OA | Samsung Display Co., Ltd. |
| 18674243 | DISPLAY DEVICE | Non-Final OA | Samsung Display Co., LTD. |
| 18604391 | DISPLAY DEVICE AND METHOD FOR FABRICATING THE SAME | Non-Final OA | Samsung Display Co., LTD. |
| 18398289 | DISPLAY DEVICE | Final Rejection | SAMSUNG DISPLAY CO., LTD. |
| 18664060 | PACKAGE COMPRISING A SUBSTRATE, AN INTEGRATED DEVICE AND AN INTERCONNECT OVER THE INTEGRATED DEVICE | Final Rejection | QUALCOMM Incorporated |
| 18891242 | JUNCTION BARRIER SCHOTTKY DIODE | Non-Final OA | TDK CORPORATION |
| 18646698 | SEMICONDUCTOR DEVICE | Non-Final OA | Mitsubishi Electric Corporation |
| 18777208 | MULTI-LAYER CAPACITORS FOR THREE-DIMENSIONAL MEMORY SYSTEMS | Non-Final OA | Micron Technology, Inc. |
| 18573678 | LIGHT-EMITTING ELEMENT, LIGHT-EMITTING APPARATUS, AND DISPLAY APPARATUS | Final Rejection | SHARP KABUSHIKI KAISHA |
| 18698989 | OPTOELECTRONIC DEVICE AND METHOD | Final Rejection | ams-OSRAM International GmbH |
| 18651396 | Integrated Circuit with MIMCAP Having Reduced Contact Area | Non-Final OA | Texas Instruments Incorporated |
| 18660328 | NON-VOLATILE MEMORY UNIT CELL HAVING EDGE-CONTACTED MEMRISTIVE DEVICE | Non-Final OA | International Business Machines Corporation |
| 18481271 | TRENCH MOAT DECOUPLING CAPACITOR | Non-Final OA | INTERNATIONAL BUSINESS MACHINES CORPORATION |
| 18657027 | SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING A SEMICONDUCTOR DEVICE | Non-Final OA | Infineon Technologies Austria AG |
| 18419445 | MECHANICAL STIFFENER FOR INTEGRATED CIRCUIT PACKAGE WITH VARYING HEAT DISSIPATION MODES | Non-Final OA | Marvell Asia Pte Ltd |
| 18747444 | SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME | Non-Final OA | SK hynix Inc. |
| 18899816 | SEMICONDUCTOR ELEMENT AND SEMICONDUCTOR DEVICE | Non-Final OA | ROHM CO., LTD. |
| 18582977 | METHODS FOR FORMING LOW RESISTIVITY CONTACTS | Final Rejection | Applied Materials, Inc. |
| 18765097 | METHOD FOR PREPARING SEMICONDUCTOR DEVICE STRUCTURE HAVING FEATURES OF DIFFERENT DEPTHS | Non-Final OA | NANYA TECHNOLOGY CORPORATION |
| 18714464 | FLEXIBLE AND MINIATURIZED COMPACT VERTICAL COLOR SENSOR | Non-Final OA | Georgia State University Research Foundation, Inc. |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy92.8% of resolved applications examined by Sonya D Mccall Shepard were allowed (1,200 resolved cases), compared with 80.3% across Art Unit 2813 over the last five years.
This examiner's interview lift is +3.5 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Sonya D Mccall Shepard took 758 days on average from filing to allowance.
Sonya D Mccall Shepard examines applications in Art Unit 2813 in Tech Center 2800 (Semiconductors, Circuits & Optics).
