Prosecution Insights
Last updated: October 02, 2026

Examiner: SMYTH, ANDREW P

Tech Center 2800 • Art Units: 1713 1737 2878 2881

This examiner grants 72% of resolved cases

Analysis

Andrew P. Smyth works in Tech Center 2800 and Art Unit 1713, where they have resolved 867 cases. The examiner has an allowance rate of 71.7 percent, which establishes the baseline probability of success for applications. The median days to allowance is 1037, providing a timeline for the 867 cases that have reached issuance. This 1037-day period is a factor for applicants to consider when planning their prosecution strategy.

The interview lift is 14.5 percent, indicating that interviews are an effective tool for increasing the likelihood of a grant. This 14.5 percent lift is an increase over the 71.7 percent baseline allowance rate. Practitioners should consider the 1037-day median pendency and the positive impact of interviews when planning their prosecution strategy. The data suggests that direct engagement can enhance the 71.7 percent probability of success.

With 867 cases resolved, the 71.7 percent allowance rate and 14.5 percent interview lift are reliable metrics. The 1037-day median timeline to allowance is a key factor for managing expectations. These figures suggest that direct engagement through interviews can improve the 71.7 percent chance of success in Art Unit 1713 and help in refining the approach to the prosecution process.

Written from this page's own data; every figure is computed from USPTO records and verified before publication.

Performance Statistics

71.7%
Allow Rate
+3.7% vs TC avg
883
Total Applications
+14.5%
Interview Lift
1037
Avg Prosecution Days
Based on 867 resolved cases, 2023–2026

Rejection Statute Breakdown

1.0%
§101 Eligibility
23.7%
§102 Novelty
61.7%
§103 Obviousness
11.6%
§112 Clarity

Currently Pending Office Actions

App #TitleStatusAssignee
18825349 REFLECTANCE CONFOCAL SCANNING ELECTRON MICROSCOPE AND OPERATING METHOD THEREOF Non-Final OA Samsung Electronics Co., Ltd.
18113121 METHOD OF INSPECTING SEMICONDUCTOR DEVICE Final Rejection Samsung Electronics Co., Ltd.
18787676 Optical Apparatus and Charged Particle Beam Apparatus Non-Final OA Hitachi High-Tech Corporation
18607593 LASER DEVICE, COMPUTER-READABLE STORAGE MEDIUM, SYSTEM, AND METHOD Final Rejection KAWASAKI JUKOGYO KABUSHIKI KAISHA
18646154 SUPERCONDUCTING MAGNETIC SHIELD FOR ION TRAP Non-Final OA Infineon Technologies Austria AG
18220163 PLASMA SYSTEM HAVING RESIDENCE TIME TUNING ASSEMBLY Non-Final OA Applied Materials, Inc.
18815206 PARTICLE BEAM THERAPY FACILITY AND PARTICLE BEAM THERAPY DEVICE Non-Final OA SUMITOMO HEAVY INDUSTRIES, LTD.
18659571 ENTANGLED PHOTON LIGHT SOURCE SYSTEMS AND METHODS Non-Final OA Purdue Research Foundation
18776534 LIGHT IRRADIATING APPARATUS Non-Final OA HOYA CORPORATION
18631733 HIGH RESOLUTION, LOW ENERGY ELECTRON MICROSCOPE FOR PROVIDING TOPOGRAPHY INFORMATION AND METHOD OF MASK INSPECTION Non-Final OA Carl Zeiss SMT GmbH
18985754 IMPLANT PACKAGING CONTAINER Non-Final OA Seoul Viosys Co. Ltd.
18174422 ULTRAVIOLET LIGHT IRRADIATION DEVICE Non-Final OA Ushio Denki Kabushiki Kaisha
18698671 METHOD AND APPARATUS FOR SCANNING A SAMPLE WITH A PROBE Non-Final OA INFINITESIMA LIMITED
18970586 ION GUIDE GEOMETRY IMPROVEMENTS Non-Final OA Thermo Finnigan LLC
18813381 TEM GRIDS WITH LIQUID SPREADING LANES Non-Final OA FEI Company
18731712 Method and System for Sample Preparation Non-Final OA FEI Company

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