Prosecution Insights
Prosecution Insights
Tech Center 2800 • Art Units: 2892
This examiner grants 100% of resolved cases
Michael Brennan Sun serves as a patent examiner in Tech Center 2800, working within Art Unit 2892. The examiner has reached a resolution in 1 case. The allowance rate for this case is 100.0 percent. This 100.0 percent rate provides a measure of how often applications are granted. Practitioners can use this data to evaluate the probability of a favorable outcome when an application is assigned to this examiner.
The record shows an interview lift of 0.0 percent. This 0.0 percent lift indicates that applications involving an interview have the same allowance rate as those that are not. This suggests that direct discussion with the examiner has not yet changed the statistical likelihood of resolving issues. Practitioners should consider the 0.0 percent lift when deciding whether to request an interview during prosecution in Tech Center 2800.
The median days to allowance for this examiner is 930. This 930 figure represents the middle point of the time required to move from filing to a patent grant. With 1 resolved case, this median offers a benchmark for the duration of the prosecution process. These figures assist in managing expectations for both the timing and the results of applications in Art Unit 2892.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18634187 | SEMICONDUCTOR DEVICE | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18598506 | DISPLAY DEVICE | Final Rejection | Samsung Display Co., LTD. |
| 18542034 | SELF-ALIGNED BACKSIDE DIFFUSION BREAK AND S/D CONTACT | Non-Final OA | INTERNATIONAL BUSINESS MACHINES CORPORATION |
| 18625292 | RESISTIVE MEMORY CELL TOP ELECTRODE CONTACT WITH REDUCED CORNER EROSION AND METHOD OF FORMING THE SAME | Non-Final OA | Taiwan Semiconductor Manufacturing Company Limited |
| 18664941 | SEMICONDUCTOR FRAME AND SEMICONDUCTOR PACKAGE INCLUDING THE SAME | Non-Final OA | SAMSUNG ELECTRO-MECHANICS CO., LTD. |
| 18632863 | METHOD OF LOW-TEMPERATURE N-TYPE SELECTIVE SILICON EPITAXY | Non-Final OA | Applied Materials, Inc. |
| 18391541 | LOW ENERGY TREATMENT TO PASSIVATE SiC SUBSTRATE DEFECTS | Non-Final OA | Applied Materials, Inc. |
| 18633991 | IMAGE SENSOR | Non-Final OA | VisEra Technologies Company Limited |
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