Listed by the USPTO as TRAN, TONY
Tech Center 2800 • Art Units: 2811 2821 2893 2894
This examiner grants 70% of resolved cases
TRAN, TONY is assigned to Tech Center 2800 and Art Unit 2811. The profile includes 884 resolved cases, a 70.2% allowance rate, and a 33.3% interview lift. The median time to allowance is 1018 days. The substantial docket shows an allowance outcome above half of resolved cases, while the interview figure indicates that direct examiner engagement may be a significant component of prosecution strategy.
Micron Technology Inc., Taiwan Semiconductor Manufacturing Company, Ltd., and Samsung Electronics Co., Ltd. are the leading companies. The listed firms are IntelliFluence Patent Firm, OBLON, MCCLELLAND, MAIER & NEUSTADT, L.L.P., and Anova Law Group, PLLC. Counsel may prepare focused interviews around semiconductor claim distinctions and preserve those distinctions through a clear written record.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18014012 | DISPLAY DEVICE USING MICRO LED | Final Rejection | LG ELECTRONICS INC. |
| 18674610 | SEMICONDUCTOR DEVICE | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18372885 | THREE-DIMENSIONAL SEMICONDUCTOR MEMORY DEVICE AND METHOD OF FABRICATING THE SAME | Final Rejection | Samsung Electronics Co., Ltd. |
| 17646977 | SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 17985672 | DISPLAY DEVICE | Final Rejection | LG Display Co., Ltd. |
| 18675459 | DISPLAY DEVICE AND METHOD OF PROVIDING THE SAME | Non-Final OA | Samsung Display Co., Ltd. |
| 18633422 | DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME | Non-Final OA | Samsung Display Co., LTD. |
| 18183819 | PIXEL AND DISPLAY DEVICE INCLUDING THE SAME | Non-Final OA | Samsung Display Co., LTD. |
| 17849188 | EPITAXIAL SOURCE OR DRAIN STRUCTURES FOR ADVANCED INTEGRATED CIRCUIT STRUCTURE FABRICATION | Non-Final OA | Intel Corporation |
| 18187995 | ELECTRONIC DEVICE AND METHOD FOR MANUFACTURING THE SAME | Non-Final OA | InnoLux Corporation |
| 18258973 | MOLYBDENUM DEPOSITION IN FEATURES | Final Rejection | Lam Research Corporation |
| 17999255 | LOW RESISTIVITY CONTACTS AND INTERCONNECTS | Final Rejection | Lam Research Corporation |
| 18648232 | METHODS OF FORMING MICROELECTRONIC DEVICES, AND RELATED ELECTRONIC SYSTEMS | Non-Final OA | Micron Technology, Inc. |
| 18397967 | METHODS OF FORMING MICROELECTRONIC DEVICES, AND RELATED MEMORY DEVICES AND ELECTRONIC SYSTEMS | Final Rejection | Micron Technology, Inc. |
| 17898107 | METHODS OF FORMING MICROELECTRONIC DEVICES, AND RELATED MICROELECTRONIC DEVICES, MEMORY DEVICES, AND ELECTRONIC SYSTEMS | Non-Final OA | Micron Technology, Inc. |
| 17893718 | FOLDED STAIRCASE VIA ROUTING FOR MEMORY | Final Rejection | Micron Technology, Inc. |
| 18530418 | SEMICONDUCTOR MEMORY DEVICE | Final Rejection | KIOXIA CORPORATION |
| 18027722 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND DEVICE FOR MANUFACTURING SEMICONDUCTOR DEVICE | Non-Final OA | Tokyo Electron Limited |
| 18746954 | SEMICONDUCTOR MEMORY DEVICE AND METHOD OF MANUFACTURING THE SEMICONDUCTOR MEMORY DEVICE | Non-Final OA | SK hynix Inc. |
| 18300280 | METHODS FOR FORMING MULTI-TIER TUNGSTEN FEATURES | Final Rejection | Applied Materials, Inc. |
| 17898796 | LANTHANUM NITRIDE AS A DRAM MOLYBDENUM LINER | Non-Final OA | Applied Materials, Inc. |
| 18397398 | REDUCTION OF METAL LOSS DURING GATE PATTERNING | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18150617 | SEMICONDUCTOR DEVICE HAVING LOW DIELECTRIC CAPACITANCE AND GOOD ELECTRICAL BREAKDOWN PERFORMANCE, AND METHOD FOR MANUFACTURING THE SAME | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 18784190 | PERFORMING ANNEALING PROCESS TO IMPROVE FIN QUALITY OF A FINFET SEMICONDUCTOR | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18093472 | LOW RESISTANCE BOTTOM ELECTRODE VIA | Non-Final OA | Taiwan Semiconductor Manufacturing Company |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy70.2% of resolved applications examined by Tony Tran were allowed (884 resolved cases), compared with 72.2% across Art Unit 2811 over the last five years.
This examiner's interview lift is +33.3 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Tony Tran took 1,018 days on average from filing to allowance.
Tony Tran examines applications in Art Unit 2811 in Tech Center 2800 (Semiconductors, Circuits & Optics).
