Prosecution Insights
Prosecution Insights
Tech Center 2800 • Art Units: 2800 2815 2817 2892 2897
This examiner grants 88% of resolved cases
Matthew E Warren is an examiner in Tech Center 2800, specifically within Art Unit 2800. The examiner has a volume of 1016 resolved cases, providing a statistical profile. The allowance rate is 87.7%, which indicates the frequency of successful applications. The median days to allowance is 946, suggesting the prosecution timeline. Practitioners in Art Unit 2800 can expect a predictable process based on the 1016 resolved cases.
The interview lift for this examiner is 5.0%. Given that the baseline allowance rate is 87.7%, there is limited room for an interview to increase the probability of success. The 946-day median pendency and 5.0% lift suggest that the examiner is efficient. For applications in Tech Center 2800, these metrics provide a roadmap for prosecution. The 1016 resolved cases support the 87.7% allowance rate as a stable benchmark. Practitioners should consider the 5.0% lift as a tool during the 946-day prosecution period to ensure a grant.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18419856 | SEMICONDUCTOR DEVICES AND DATA STORAGE SYSTEMS INCLUDING THE SAME | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18429971 | DISPLAY DEVICE | Non-Final OA | LG Display Co., Ltd. |
| 18147555 | THREE-DIMENSIONAL FERROELECTRIC FIELD EFFECT TRANSISTOR RANDOM ACCESS MEMORY DEVICES AND FABRICATING METHODS THEREOF | Non-Final OA | Yangtze Memory Technologies Co., Ltd. |
| 18586485 | ISOLATED BACKSIDE CONTACT AND PLACEHOLDER | Non-Final OA | INTERNATIONAL BUSINESS MACHINES CORPORATION |
| 18414932 | MEMS DEVICE WITH MEMBRANE COMPRISING LASER STRUCTURED NANOSTRUCTURES AND METHOD FOR MANUFACTURING SAME | Non-Final OA | Infineon Technologies AG |
| 18429941 | SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME | Non-Final OA | SK hynix Inc. |
| 18326939 | FERROELECTRIC TEMPERATURE SENSOR | Non-Final OA | TEXAS INSTRUMENTS INCORPORATED |
| 18433934 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18363756 | MEMORY STRUCTURE AND METHOD OF FORMING THE SAME | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18606421 | SEMICONDUCTOR DEVICE | Non-Final OA | Socionext Inc. |
| 18430653 | STATIC RANDOM ACCESS MEMORY AND METHOD FOR FORMING THE SAME | Non-Final OA | UNITED MICROELECTRONICS CORP. |
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