Prosecution Insights
Prosecution Insights
Technology areas: Chemistry & Materials • Semiconductors, Circuits & Optics
7 pending office actions • 5 art units • 7 examiners • 0 of 7 (0%) have an AI response strategy ready • 9 patents granted in the last 365 days
Axcelis Technologies Inc. has 7 pending office actions in the Chemistry & Materials technology area. These matters are handled by 7 distinct examiners. The portfolio is distributed across 5 distinct art units, reflecting the technical focuses within the chemistry sector.
Syed M Kaiser is the busiest examiner with 1 pending office action. With multiple distinct examiners involved, the company faces individual examiner preferences and interpretations. The 5 distinct art units indicate that while the technology is centered in chemistry, it spans specialized units at the patent office.
Based on the USPTO statutory response window for each pending office action. 4 of the docket's apps have a known mailing date; the rest are excluded from the tile counts.
Every pending office action with a known statutory deadline, placed on a days-until-due axis. Dots left of Today are overdue; the further right, the more runway. Cases that share a deadline window stack vertically. 4 of the docket's apps have a known mailing date.
Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.
| Bucket | Cases |
|---|---|
| §103 only | 1 (14%) |
| Multi-statute (no §101) | 6 (86%) |
How the docket's pending cases split across USPTO tech-center bands.
Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.
| Examiner | Apps on this docket | Allow rate | Interview lift |
|---|---|---|---|
| KAISER, SYED M | 1 | 86.1% | +6.7% |
| CHEN, KEATH T | 1 | 30.2% | +24.7% |
| TADAYYON ESLAMI, TABASSOM | 1 | 49.5% | +26.5% |
| STOCK JR, GORDON J | 1 | 81.5% | +17.5% |
| BRAYTON, JOHN JOSEPH | 1 | 48.3% | +22.4% |
| LOGIE, MICHAEL J | 1 | 63.4% | +9.3% |
| MENDOZA, ALEXANDRIA ARELLANO | 1 | 61.5% | +28.3% |
Multi-statute / §101-driven matters, or cases in front of an examiner with an allow rate under 30%. The top 6 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18991879 | LIQUID METAL ALLOY FEED MATERIALS FOR ION IMPLANTATION | TADAYYON ESLAMI, TABASSOM | 17d overdue |
| 18919483 | APPARATUS AND METHOD FOR TWO-DIMENSIONAL ION BEAM PROFILING | LOGIE, MICHAEL J | 34d |
| 18918276 | DEPOSITION MONITOR FOR SEMICONDUCTOR MANUFACTURING SYSTEM | MENDOZA, ALEXANDRIA ARELLANO | 42d |
| 19082757 | Apparatus and Method for Angle Control of Radicals, Neutral Atoms, and Molecules | KAISER, SYED M | — |
| 18980276 | WAFER ALIGNMENT, CLEANLINESS, AND SURFACE QUALITY VERIFICATION USING LASER LIGHT SCATTERING | STOCK JR, GORDON J | — |
| 18973450 | HIGH-EFFICIENCY TARGET FOR AN ION SOURCE | BRAYTON, JOHN JOSEPH | — |
Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 5 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 19063918 | LOW-TEMPERATURE VAPORIZER FOR ION IMPLANTER WITH IN-VACUUM CONTROLLED FLOW | CHEN, KEATH T | 132d overdue |
| 18991879 | LIQUID METAL ALLOY FEED MATERIALS FOR ION IMPLANTATION | TADAYYON ESLAMI, TABASSOM | 17d overdue |
| 18918276 | DEPOSITION MONITOR FOR SEMICONDUCTOR MANUFACTURING SYSTEM | MENDOZA, ALEXANDRIA ARELLANO | 42d |
| 18980276 | WAFER ALIGNMENT, CLEANLINESS, AND SURFACE QUALITY VERIFICATION USING LASER LIGHT SCATTERING | STOCK JR, GORDON J | — |
| 18973450 | HIGH-EFFICIENCY TARGET FOR AN ION SOURCE | BRAYTON, JOHN JOSEPH | — |
| Art Unit | Apps |
|---|---|
| 2877 | 2 |
| 1716 | 1 |
| 1718 | 1 |
| 1794 | 1 |
| 2881 | 1 |
| App # | Title | Examiner | Art Unit | Statutes | Status | Due in | AI | Filed |
|---|---|---|---|---|---|---|---|---|
| 19082757 | Apparatus and Method for Angle Control of Radicals, Neutral Atoms, and Molecules | KAISER, SYED M | — | §103§112 | Non-Final OA | — | Pending | Mar 18, 2025 |
| 19063918 | LOW-TEMPERATURE VAPORIZER FOR ION IMPLANTER WITH IN-VACUUM CONTROLLED FLOW | CHEN, KEATH T | 1716 | §103 | Final Rejection | 132d overdue | Pending | Feb 26, 2025 |
| 18991879 | LIQUID METAL ALLOY FEED MATERIALS FOR ION IMPLANTATION | TADAYYON ESLAMI, TABASSOM | 1718 | §103§112 | Non-Final OA | 17d overdue | Pending | Dec 23, 2024 |
| 18980276 | WAFER ALIGNMENT, CLEANLINESS, AND SURFACE QUALITY VERIFICATION USING LASER LIGHT SCATTERING | STOCK JR, GORDON J | 2877 | §102§103 | Non-Final OA | — | Pending | Dec 13, 2024 |
| 18973450 | HIGH-EFFICIENCY TARGET FOR AN ION SOURCE | BRAYTON, JOHN JOSEPH | 1794 | §102§103 | Non-Final OA | — | Pending | Dec 09, 2024 |
| 18919483 | APPARATUS AND METHOD FOR TWO-DIMENSIONAL ION BEAM PROFILING | LOGIE, MICHAEL J | 2881 | §103§112 | Final Rejection | 34d | Pending | Oct 18, 2024 |
| 18918276 | DEPOSITION MONITOR FOR SEMICONDUCTOR MANUFACTURING SYSTEM | MENDOZA, ALEXANDRIA ARELLANO | 2877 | §102§103§112 | Non-Final OA | 42d | Pending | Oct 17, 2024 |
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