Prosecution Insights
Prosecution Insights
6 pending office actions • 6 art units • 6 examiners • 0 of 6 (0%) have an AI response strategy ready • 8 patents granted in the last 365 days
Based on the USPTO statutory response window for each pending office action. 5 of the docket's apps have a known mailing date; the rest are excluded from the tile counts.
Every pending office action with a known statutory deadline, placed on a days-until-due axis. Dots left of Today are overdue; the further right, the more runway. Cases that share a deadline window stack vertically. 5 of the docket's apps have a known mailing date.
Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.
| Bucket | Cases |
|---|---|
| §103 only | 5 (83%) |
| §112 only | 1 (17%) |
How the docket's pending cases split across USPTO tech-center bands.
Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.
| Examiner | Apps on this docket | Allow rate | Interview lift |
|---|---|---|---|
| CHEN, KEATH T | 1 | 30.3% | +24.5% |
| TADAYYON ESLAMI, TABASSOM | 1 | 49.1% | +27.4% |
| LEE, NATHANIEL J. | 1 | 63.2% | +22.0% |
| LOGIE, MICHAEL J | 1 | 64.2% | +10.7% |
| MENDOZA, ALEXANDRIA ARELLANO | 1 | 70.0% | +42.9% |
| CHOI, JAMES J | 1 | 66.8% | +46.6% |
Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 6 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 19063918 | LOW-TEMPERATURE VAPORIZER FOR ION IMPLANTER WITH IN-VACUUM CONTROLLED FLOW | CHEN, KEATH T | 132d overdue |
| 18944039 | FIXED POSITION FILAMENT | LEE, NATHANIEL J. | 45d overdue |
| 18991879 | LIQUID METAL ALLOY FEED MATERIALS FOR ION IMPLANTATION | TADAYYON ESLAMI, TABASSOM | 17d overdue |
| 18919483 | APPARATUS AND METHOD FOR TWO-DIMENSIONAL ION BEAM PROFILING | LOGIE, MICHAEL J | 34d |
| 18918276 | DEPOSITION MONITOR FOR SEMICONDUCTOR MANUFACTURING SYSTEM | MENDOZA, ALEXANDRIA ARELLANO | 42d |
| 17348031 | TUNING APPARATUS FOR MINIMUM DIVERGENCE ION BEAM | CHOI, JAMES J | — |
| Art Unit | Apps |
|---|---|
| 1716 | 1 |
| 1718 | 1 |
| 2875 | 1 |
| 2881 | 1 |
| 2877 | 1 |
| 2878 | 1 |
| App # | Title | Examiner | Art Unit | Statutes | Status | Due in | AI | Filed |
|---|---|---|---|---|---|---|---|---|
| 19063918 | LOW-TEMPERATURE VAPORIZER FOR ION IMPLANTER WITH IN-VACUUM CONTROLLED FLOW | CHEN, KEATH T | 1716 | §103 | Final Rejection | 132d overdue | Pending | Feb 26, 2025 |
| 18991879 | LIQUID METAL ALLOY FEED MATERIALS FOR ION IMPLANTATION | TADAYYON ESLAMI, TABASSOM | 1718 | §103 | Non-Final OA | 17d overdue | Pending | Dec 23, 2024 |
| 18944039 | FIXED POSITION FILAMENT | LEE, NATHANIEL J. | 2875 | §103 | Non-Final OA | 45d overdue | Pending | Nov 12, 2024 |
| 18919483 | APPARATUS AND METHOD FOR TWO-DIMENSIONAL ION BEAM PROFILING | LOGIE, MICHAEL J | 2881 | §103 | Non-Final OA | 34d | Pending | Oct 18, 2024 |
| 18918276 | DEPOSITION MONITOR FOR SEMICONDUCTOR MANUFACTURING SYSTEM | MENDOZA, ALEXANDRIA ARELLANO | 2877 | §103 | Non-Final OA | 42d | Pending | Oct 17, 2024 |
| 17348031 | TUNING APPARATUS FOR MINIMUM DIVERGENCE ION BEAM | CHOI, JAMES J | 2878 | §112 | Final Rejection | — | Pending | Jun 15, 2021 |
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