Prosecution Insights
Prosecution Insights
Technology area: Chemistry & Materials
9 pending office actions • 2 art units • 6 examiners • 0 of 9 (0%) have an AI response strategy ready • 2 patents granted in the last 365 days
Tekscend Photomask Corp. maintains a portfolio with 10 pending office actions in the Chemistry & Materials technology area. These matters are distributed across 6 distinct examiners and 2 distinct art units. This volume of activity suggests an active prosecution pipeline with several applications moving through the patent office simultaneously. The involvement of 6 distinct examiners indicates that the company's workload is spread across a variety of individual perspectives within the USPTO.
FRASER, STEWART A is the busiest examiner for the company, currently managing 3 busiest examiner pending office actions. This represents a portion of the 10 pending office actions, while the remaining actions are shared among the other examiners. The concentration of work in 2 distinct art units indicates that while the portfolio is active, it remains focused on specific technical domains within the Chemistry & Materials sector. Managing the 3 actions under FRASER, STEWART A is a primary focus for the company's current legal strategy.
Based on the USPTO statutory response window for each pending office action. 2 of the docket's apps have a known mailing date; the rest are excluded from the tile counts.
Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.
| Bucket | Cases |
|---|---|
| §103 only | 5 (56%) |
| §102 only | 2 (22%) |
| Double-patenting + other | 1 (11%) |
| Multi-statute (no §101) | 1 (11%) |
How the docket's pending cases split across USPTO tech-center bands.
Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.
| Examiner | Apps on this docket | Allow rate | Interview lift |
|---|---|---|---|
| FRASER, STEWART A | 2 | 85.9% | +14.5% |
| CHACKO DAVIS, DABORAH | 2 | 72.1% | +20.6% |
| VINEIS, FRANK J | 2 | 39.9% | +44.8% |
| EOFF, ANCA | 1 | 80.0% | +10.8% |
| ANGEBRANNDT, MARTIN J | 1 | 55.5% | +34.0% |
| COSGROVE, JAYSON D | 1 | 51.9% | +34.6% |
Cases in front of an examiner with an allow rate of 80%+ where the difficulty is Easy or Medium. The top 2 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18727041 | PHASE SHIFT MASK AND METHOD FOR MANUFACTURING PHASE SHIFT MASK | FRASER, STEWART A | — |
| 18277053 | REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK | FRASER, STEWART A | — |
Multi-statute / §101-driven matters, or cases in front of an examiner with an allow rate under 30%. The top 1 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18031321 | REFLECTIVE MASK AND METHOD FOR PRODUCING REFLECTIVE MASK | EOFF, ANCA | — |
Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 8 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 17772340 | REFLECTIVE MASK AND PRODUCTION METHOD FOR REFLECTIVE MASK | COSGROVE, JAYSON D | 5d |
| 18028159 | REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK | ANGEBRANNDT, MARTIN J | 48d |
| 18727041 | PHASE SHIFT MASK AND METHOD FOR MANUFACTURING PHASE SHIFT MASK | FRASER, STEWART A | — |
| 18281542 | PHASE SHIFT MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR MANUFACTURING PHASE SHIFT MASK | CHACKO DAVIS, DABORAH | — |
| 18277053 | REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK | FRASER, STEWART A | — |
| 18271032 | REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK | CHACKO DAVIS, DABORAH | — |
| 18031321 | REFLECTIVE MASK AND METHOD FOR PRODUCING REFLECTIVE MASK | EOFF, ANCA | — |
| 17920386 | REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK | VINEIS, FRANK J | — |
| Art Unit | Apps |
|---|---|
| 1737 | 7 |
| 1724 | 1 |
| App # | Title | Examiner | Art Unit | Statutes | Status | Due in | AI | Filed |
|---|---|---|---|---|---|---|---|---|
| 18727041 | PHASE SHIFT MASK AND METHOD FOR MANUFACTURING PHASE SHIFT MASK | FRASER, STEWART A | — | §103Other | Non-Final OA | — | Pending | Jul 05, 2024 |
| 18281542 | PHASE SHIFT MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR MANUFACTURING PHASE SHIFT MASK | CHACKO DAVIS, DABORAH | 1737 | §102 | Final Rejection | — | Pending | Sep 11, 2023 |
| 18277053 | REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK | FRASER, STEWART A | 1724 | §103 | Final Rejection | — | Pending | Aug 11, 2023 |
| 18271032 | REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK | CHACKO DAVIS, DABORAH | 1737 | §102 | Final Rejection | — | Pending | Jul 05, 2023 |
| 18031321 | REFLECTIVE MASK AND METHOD FOR PRODUCING REFLECTIVE MASK | EOFF, ANCA | 1737 | §102§112 | Non-Final OA | — | Pending | Apr 11, 2023 |
| 18028159 | REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK | ANGEBRANNDT, MARTIN J | 1737 | §103 | Final Rejection | 48d | Pending | Mar 23, 2023 |
| 17920386 | REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK | VINEIS, FRANK J | 1737 | §103Other | Non-Final OA | — | Pending | Oct 20, 2022 |
| 17778402 | REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK | VINEIS, FRANK J | 1737 | §103DP | Non-Final OA | — | Pending | May 19, 2022 |
| 17772340 | REFLECTIVE MASK AND PRODUCTION METHOD FOR REFLECTIVE MASK | COSGROVE, JAYSON D | 1737 | §103 | Final Rejection | 5d | Pending | Apr 27, 2022 |
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