Tech Center 1700 • Art Units: 1722 1795 1796
This examiner grants 80% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18329976 | ORGANOMETALLIC COMPOUND, RESIST COMPOSITION INCLUDING THE SAME AND PATTERN FORMING METHOD USING THE SAME | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18106254 | RESIST COMPOUND AND METHOD OF FORMING PATTERN USING THE SAME | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18051639 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18353679 | ELECTRODE ASSEMBLY, BATTERY CELL, BATTERY, AND ELECTRICAL APPARATUS | Non-Final OA | CONTEMPORARY AMPEREX TECHNOLOGY CO., LIMITED |
| 18023922 | SEPARATOR FOR ELECTROCHEMICAL DEVICE AND METHOD FOR MANUFACTURING THE SAME | Non-Final OA | LG ENERGY SOLUTION, LTD. |
| 18356701 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, COMPOUND, AND RESIN | Non-Final OA | FUJIFILM Corporation |
| 18339622 | LAMINATE OF NEGATIVE TONE LITHOGRAPHIC PRINTING PLATE PRECURSOR AND METHOD OF PREPARING NEGATIVE TONE LITHOGRAPHIC PRINTING PLATE | Non-Final OA | FUJIFILM Corporation |
| 18157899 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | Final Rejection | FUJIFILM Corporation |
| 17970439 | GRAY-TONE RESISTS AND PROCESSES | Non-Final OA | Meta Platforms Technologies, LLC |
| 18013579 | LITHIUM BATTERY AND MANUFACTURING METHOD THEREFOR | Non-Final OA | SAMSUNG SDI CO., LTD. |
| 18003717 | ELECTROLYTE FOR LITHIUM BATTERY, AND LITHIUM BATTERY COMPRISING SAME | Final Rejection | Samsung SDI Co., Ltd. |
| 18269074 | NEGATIVE TYPE PHOTOSENSITIVE COMPOSITION | Non-Final OA | Merck Patent GmbH |
| 18447164 | Composition For Forming Adhesive Film, Patterning Process, And Method For Forming Adhesive Film | Non-Final OA | SHIN-ETSU CHEMICAL CO., LTD. |
| 17970061 | MATERIAL FOR FORMING FILLING FILM FOR INHIBITING SEMICONDUCTOR SUBSTRATE PATTERN COLLAPSE, AND METHOD FOR TREATING SEMICONDUCTOR SUBSTRATE | Non-Final OA | SHIN-ETSU CHEMICAL CO., LTD. |
| 18262276 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, PRINTED WIRING BOARD, AND METHOD FOR MANUFACTURING PRINTED WIRING BOARD | Non-Final OA | Resonac Corporation |
| 18248964 | Metal Air Battery | Final Rejection | NTT, Inc. |
| 17983345 | ALUMINUM BATTERY SEPARATOR | Non-Final OA | APh ePower Co., Ltd. |
| 18190650 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | Non-Final OA | SUMITOMO CHEMICAL COMPANY, LIMITED |
| 16465113 | NEGATIVE PHOTOSENSITIVE COMPOSITION, ARTICLE CURED THEREFROM, AND METHOD FOR CURING SAID COMPOSITION | Non-Final OA | ADEKA CORPORATION |
| 18100096 | A REVERSIBLE F-ION INTERCALATION HOST FOR USE IN ROOM TEMPERATURE F-ION BATTERIES | Final Rejection | UNIVERSITY OF SOUTHERN CALIFORNIA |
| 18107286 | Bismaleimide Compound, Composition Containing Same, Polybenzoxazole, And Semiconductor Device | Final Rejection | Nippon Kayaku Kabushiki Kaisha |
| 18107285 | Bismaleimide Compound, Composition Containing Same, Polybenzoxazole, And Semiconductor Device | Final Rejection | Nippon Kayaku Kabushiki Kaisha |
| 18352106 | NITRILE ADDITIVES FOR ELECTROLYTES OF BATTERIES INCLUDING LITHIUM- AND MANGANESE-RICH POSITIVE ELECTRODES | Non-Final OA | GM GLOBAL TECHNOLOGY OPERATIONS LLC |
| 18277366 | RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, CIRCUIT PATTERN FORMATION METHOD AND METHOD FOR PURIFYING RESIN | Non-Final OA | Mitsubishi Gas Chemical Company, Inc. |
| 18018983 | ELECTRODE PLATE AND PREPARATION METHOD THEREFOR, AND BATTERY | Non-Final OA | EVE ENERGY CO., LTD. |
| 18589298 | COATED SEPARATORS, LITHIUM BATTERIES, AND RELATED METHODS | Non-Final OA | Celgard, LLC |
| 18032585 | CYLINDRICAL BATTERY | Final Rejection | SANYO Electric Co., Ltd. |
| 18240399 | CASCADING STACK ELECTROCHEMICAL FUEL CELL | Non-Final OA | Infinity Fuel Cell and Hydrogen, Inc. |
| 18276776 | Photopolymerizable Composition | Non-Final OA | Xetos AG |
| 18359148 | POLYFUNCTIONALIZED MACROMOLECULAR PHOTOINITIATOR CONTAINING ALPHA-AMINOKETONE, AND PREPARATION AND APPLICATION THEREOF | Non-Final OA | INNER MONGOLIA YANGFAN NEW MATERIAL CO., LTD. |
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