Prosecution Insights
Prosecution Insights
Tech Center 1700 • Art Units: 1722 1724 1737 1795 1796
This examiner grants 80% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18286612 | METHOD FOR FORMING A RESIST PATTERN | Non-Final OA | NISSAN CHEMICAL CORPORATION |
| 18285141 | COMPOSITION FOR FORMING SILICON-CONTAINING UNDERLAYER FILM FOR INDUCED SELF-ORGANIZATION | Non-Final OA | NISSAN CHEMICAL CORPORATION |
| 18420038 | ORGANOMETALLIC COMPOUND, RESIST COMPOSITION INCLUDING THE SAME AND PATTERN FORMATION METHOD USING THE RESIST COMPOSITION | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18527056 | PHOTORESIST COMPOSITION INCLUDING PHOTOSENSITIVE POLYMER AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18493192 | RESIST COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18439390 | METHOD FOR INSPECTING RESIST COMPOSITION, METHOD FOR PRODUCING RESIST COMPOSITION, AND RESIST COMPOSITION | Non-Final OA | FUJIFILM Corporation |
| 18392245 | FLEXOGRAPHIC PRINTING PLATE PRECURSOR AND MANUFACTURING METHOD OF FLEXOGRAPHIC PRINTING PLATE | Non-Final OA | FUJIFILM Corporation |
| 18458609 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | Non-Final OA | FUJIFILM Corporation |
| 18356701 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, COMPOUND, AND RESIN | Final Rejection | FUJIFILM Corporation |
| 18339622 | LAMINATE OF NEGATIVE TONE LITHOGRAPHIC PRINTING PLATE PRECURSOR AND METHOD OF PREPARING NEGATIVE TONE LITHOGRAPHIC PRINTING PLATE | Final Rejection | FUJIFILM Corporation |
| 18157899 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | Final Rejection | FUJIFILM Corporation |
| 18213025 | NEGATIVE ELECTRODE COMPOSITION, NEGATIVE ELECTRODE FOR LITHIUM SECONDARY BATTERY INCLUDING SAME, LITHIUM SECONDARY BATTERY INCLUDING NEGATIVE ELECTRODE, AND METHOD OF MANUFACTURING NEGATIVE ELECTRODE | Non-Final OA | LG Energy Solution, LTD. |
| 18030854 | CELL MOUNTING JIG FOR PREVENTING DAMAGE TO APPEARANCE OF BATTERY CELL, CELL ALIGNMENT DEVICE AND CELL MOUNTING METHOD | Non-Final OA | LG ENERGY SOLUTION, LTD. |
| 18003717 | ELECTROLYTE FOR LITHIUM BATTERY, AND LITHIUM BATTERY COMPRISING SAME | Final Rejection | Samsung SDI Co., Ltd. |
| 18248964 | Metal Air Battery | Non-Final OA | NTT, Inc. |
| 18054661 | LAYERED ELECTRODE | Non-Final OA | Rivian IP Holdings, LLC |
| 19070239 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | Non-Final OA | Shin-Etsu Chemical Co., Ltd. |
| 19035087 | RESIST COMPOSITION AND PATTERNING PROCESS | Non-Final OA | Shin-Etsu Chemical Co., Ltd. |
| 18597253 | ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND RESIST PATTERN FORMING PROCESS | Non-Final OA | Shin-Etsu Chemical Co., Ltd. |
| 18539887 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | Non-Final OA | Shin-Etsu Chemical Co., Ltd. |
| 18447164 | Composition For Forming Adhesive Film, Patterning Process, And Method For Forming Adhesive Film | Final Rejection | SHIN-ETSU CHEMICAL CO., LTD. |
| 17970061 | MATERIAL FOR FORMING FILLING FILM FOR INHIBITING SEMICONDUCTOR SUBSTRATE PATTERN COLLAPSE, AND METHOD FOR TREATING SEMICONDUCTOR SUBSTRATE | Non-Final OA | SHIN-ETSU CHEMICAL CO., LTD. |
| 18385563 | ADDITIVES FOR METALLIC PHOTORESIST | Non-Final OA | Taiwan Semiconductor Manufacturing Company Ltd |
| 18204805 | METHOD TO OPTIMIZE POST DEPOSITION BAKING CONDITION OF PHOTO RESISTIVE MATERIALS | Final Rejection | Applied Materials, Inc. |
| 18565554 | METHOD FOR USING COMPOSITION COMPRISING ORGANIC ACID COMPOUND, LITHOGRAPHY COMPOSITION COMPRISING ORGANIC ACID COMPOUND, AND METHOD FOR MANUFACTURING RESIST PATTERN | Non-Final OA | Merck Patent GmbH |
| 18269074 | NEGATIVE TYPE PHOTOSENSITIVE COMPOSITION | Non-Final OA | Merck Patent GmbH |
| 18684046 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, ACID-GENERATING AGENT, ACID DIFFUSION CONTROL AGENT, AND HIGH-MOLECULAR-WEIGHT COMPOUND | Non-Final OA | TOKYO OHKA KOGYO CO., LTD. |
| 18566338 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, METHOD FOR PRODUCING COMPOUNDS, INTERMEDIATE, AND COMPOUNDS | Non-Final OA | TOKYO OHKA KOGYO CO., LTD. |
| 18687722 | COMPOSITION FOR SPIN-ON CARBON FILM FORMATION, METHOD FOR PRODUCING COMPOSITION FOR SPIN-ON CARBON FILM FORMATION, UNDERLAYER FILM FOR LITHOGRAPHY, RESIST PATTERN FORMATION METHOD, AND CIRCUIT PATTERN FORMATION METHOD | Non-Final OA | Mitsubishi Gas Chemical Company, Inc. |
| 18352031 | COMPOSITE COVER FOR A BATTERY PACK OR A BATTERY MODULE FOR REDUCING THERMAL PROPAGATION RUNAWAY AND MITIGATING ARCING | Non-Final OA | GM Global Technology Operations LLC |
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