Tech Center 2800 • Art Units: 1692 1712 1787 1792 1795 2817
This examiner grants 52% of resolved cases
Michael G. Miller is an examiner in Tech Center 1700 and Art Unit 1692, with 646 resolved cases. His allowance rate is 52.0%, reflecting a moderate level of difficulty for applicants. The median days to allowance is 1460, which is a notably long timeline for the prosecution process and requires careful planning by practitioners.
The data shows an interview lift of 15.8%, suggesting that direct communication is a helpful tactic for improving outcomes. This lift indicates that the chance of allowance improves when an interview is held, relative to the 52.0% baseline. With 646 cases, this trend suggests that Miller is willing to discuss and potentially resolve hurdles through verbal engagement in Art Unit 1692.
The 1460-day median pendency is a significant factor for applicants to manage in Tech Center 1700. While the 52.0% allowance rate is balanced, the 15.8% interview lift provides a clear path for improving the odds of success. Practitioners should consider interviews as a way to potentially move cases forward more effectively in this lengthy prosecution cycle.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 19282309 | LIDAR REFLECTIVE MATERIAL AND MARKING SYSTEM | Non-Final OA | Toyota Motor Engineering & Manufacturing North America, Inc. |
| 18931594 | MASK ASSEMBLY, APPARATUS AND METHOD OF MANUFACTURING DISPLAY APPARATUS | Non-Final OA | Samsung Display Co., Ltd. |
| 19194543 | SUBSTRATE PROCESSING APPARATUS WITH TEMPERATURE CONTROLLER | Non-Final OA | ASM IP Holding B.V. |
| 19065143 | APPARATUS AND METHOD FOR PROVIDING A PULSE OF A PRECURSOR | Non-Final OA | ASM IP Holding B.V. |
| 18463034 | COMPOSITIONS COMPRISING BORAZINE AND ITS DERIVATIVES, AND RELATED METHODS AND SYSTEMS | Final Rejection | ASM IP Holding, B.V. |
| 19165590 | METHOD FOR CONSTRUCTING FRONT EDGE PROTECTIVE LAYER FOR WIND TURBINE BLADE, AND PROTECTIVE LAYER FOR WIND TURBINE BLADE | Non-Final OA | MITSUBISHI HEAVY INDUSTRIES, LTD. |
| 19098337 | LIQUID-PHASE ALLOY CATALYST, METHOD OF MANUFACTURING SAME AND TWO-DIMENSIONAL CHALCOGENIDE THIN FILM COMPRISING THERMODYNAMICALLY INDUCED GRAIN BOUNDARY IN MONOLAYER CRYSTAL USING SAME | Non-Final OA | POSTECH RESEARCH AND BUSINESS DEVELOPMENT FOUNDATION |
| 18720153 | ATOMIC LAYER DEPOSITION PULSE SEQUENCE ENGINEERING FOR IMPROVED CONFORMALITY FOR LOW TEMPERATURE PRECURSORS | Non-Final OA | Lam Research Corporation |
| 18716846 | LOW TEMPERATURE MOLYBDENUM DEPOSITION ASSISTED BY SILICON-CONTAINING REACTANTS | Non-Final OA | Lam Research Corporation |
| 18415616 | SEMICONDUCTOR STRUCTURE AND METHOD OF FORMING THE SAME | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 19205415 | CLEANING METHOD AND FILM-FORMING APPARATUS | Non-Final OA | Tokyo Electron Limited |
| 19085129 | Substrate Processing Apparatus, Gas Supply Assembly, Substrate Processing Method, Method of Manufacturing Semiconductor Device and Non-transitory Computer-Readable Recording Medium | Non-Final OA | Kokusai Electric Corporation |
| 19226057 | COMPOSITIONS AND METHODS USING SAME FOR THERMAL DEPOSITION SILICON-CONTAINING FILMS | Non-Final OA | VERSUM MATERIALS US, LLC |
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