Prosecution Insights
Last updated: October 02, 2026

Examiner: MILLER, MICHAEL G

Tech Center 2800 • Art Units: 1692 1712 1787 1792 1795 2817

This examiner grants 52% of resolved cases

Analysis

Michael G. Miller is an examiner in Tech Center 1700 and Art Unit 1692, with 646 resolved cases. His allowance rate is 52.0%, reflecting a moderate level of difficulty for applicants. The median days to allowance is 1460, which is a notably long timeline for the prosecution process and requires careful planning by practitioners.

The data shows an interview lift of 15.8%, suggesting that direct communication is a helpful tactic for improving outcomes. This lift indicates that the chance of allowance improves when an interview is held, relative to the 52.0% baseline. With 646 cases, this trend suggests that Miller is willing to discuss and potentially resolve hurdles through verbal engagement in Art Unit 1692.

The 1460-day median pendency is a significant factor for applicants to manage in Tech Center 1700. While the 52.0% allowance rate is balanced, the 15.8% interview lift provides a clear path for improving the odds of success. Practitioners should consider interviews as a way to potentially move cases forward more effectively in this lengthy prosecution cycle.

Written from this page's own data; every figure is computed from USPTO records and verified before publication.

Performance Statistics

52.0%
Allow Rate
-16.0% vs TC avg
667
Total Applications
+15.8%
Interview Lift
1460
Avg Prosecution Days
Based on 646 resolved cases, 2023–2026

Rejection Statute Breakdown

0.3%
§101 Eligibility
14.6%
§102 Novelty
64.3%
§103 Obviousness
17.9%
§112 Clarity

Currently Pending Office Actions

App #TitleStatusAssignee
19282309 LIDAR REFLECTIVE MATERIAL AND MARKING SYSTEM Non-Final OA Toyota Motor Engineering & Manufacturing North America, Inc.
18931594 MASK ASSEMBLY, APPARATUS AND METHOD OF MANUFACTURING DISPLAY APPARATUS Non-Final OA Samsung Display Co., Ltd.
19194543 SUBSTRATE PROCESSING APPARATUS WITH TEMPERATURE CONTROLLER Non-Final OA ASM IP Holding B.V.
19065143 APPARATUS AND METHOD FOR PROVIDING A PULSE OF A PRECURSOR Non-Final OA ASM IP Holding B.V.
18463034 COMPOSITIONS COMPRISING BORAZINE AND ITS DERIVATIVES, AND RELATED METHODS AND SYSTEMS Final Rejection ASM IP Holding, B.V.
19165590 METHOD FOR CONSTRUCTING FRONT EDGE PROTECTIVE LAYER FOR WIND TURBINE BLADE, AND PROTECTIVE LAYER FOR WIND TURBINE BLADE Non-Final OA MITSUBISHI HEAVY INDUSTRIES, LTD.
19098337 LIQUID-PHASE ALLOY CATALYST, METHOD OF MANUFACTURING SAME AND TWO-DIMENSIONAL CHALCOGENIDE THIN FILM COMPRISING THERMODYNAMICALLY INDUCED GRAIN BOUNDARY IN MONOLAYER CRYSTAL USING SAME Non-Final OA POSTECH RESEARCH AND BUSINESS DEVELOPMENT FOUNDATION
18720153 ATOMIC LAYER DEPOSITION PULSE SEQUENCE ENGINEERING FOR IMPROVED CONFORMALITY FOR LOW TEMPERATURE PRECURSORS Non-Final OA Lam Research Corporation
18716846 LOW TEMPERATURE MOLYBDENUM DEPOSITION ASSISTED BY SILICON-CONTAINING REACTANTS Non-Final OA Lam Research Corporation
18415616 SEMICONDUCTOR STRUCTURE AND METHOD OF FORMING THE SAME Non-Final OA Taiwan Semiconductor Manufacturing Company, Ltd.
19205415 CLEANING METHOD AND FILM-FORMING APPARATUS Non-Final OA Tokyo Electron Limited
19085129 Substrate Processing Apparatus, Gas Supply Assembly, Substrate Processing Method, Method of Manufacturing Semiconductor Device and Non-transitory Computer-Readable Recording Medium Non-Final OA Kokusai Electric Corporation
19226057 COMPOSITIONS AND METHODS USING SAME FOR THERMAL DEPOSITION SILICON-CONTAINING FILMS Non-Final OA VERSUM MATERIALS US, LLC

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