Listed by the USPTO as RODRIGUEZ VILLANU, SANDRA MILENA
Tech Center 2800 • Art Units: 2689 2898
This examiner grants 88% of resolved cases
RODRIGUEZ VILLANU, SANDRA MILENA handles cases in USPTO Tech Center 2800 and art unit 2689. The profile covers 116 resolved cases, with an 87.9% allowance rate. Interviews are associated with a 12.1% lift in allowance outcomes. The median time to allowance is 1042 days, indicating that the favorable allowance record does not eliminate the need for extended prosecution planning.
The leading companies are Taiwan Semiconductor Manufacturing Company, Ltd., Samsung Electronics Co., Ltd., and Intel Corporation. The principal firms are CANTOR COLBURN LLP, Morgan, Lewis & Bockius LLP (WA)(SEC), and SCHWABE, WILLIAMSON & WYATT, P.C. The high allowance rate provides useful historical context. The smaller interview lift suggests that interviews may be most effective when directed at specific unresolved claim issues.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18463488 | SEMICONDUCTOR DEVICE | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18457504 | SEMICONDUCTOR PACKAGES AND METHOD FOR FABRICATING THE SAME | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18455943 | SEMICONDUCTOR PACKAGE | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18296329 | SEMICONDUCTOR DEVICE WITH DEEP SILICIDE FILM | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18405376 | DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME | Non-Final OA | Samsung Display Co., LTD. |
| 18399614 | DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME | Non-Final OA | Samsung Display Co., LTD. |
| 18189581 | NITRIDE EPITAXIAL STRUCTURE AND SEMICONDUCTOR DEVICE | Non-Final OA | HUAWEI TECHNOLOGIES CO., LTD. |
| 18072559 | INTEGRATED CIRCUIT STRUCTURES WITH SOURCE OR DRAIN CONTACTS HAVING ENHANCED CONTACT AREA | Final Rejection | Intel Corporation |
| 18071901 | OVERLYING FIDUCIAL DESIGN FOR GLASS PLACEMENT ACCURACY IMPROVEMENT | Final Rejection | Intel Corporation |
| 17895112 | SEMICONDUCTOR PACKAGE WITH STIFFENER BASKET PORTION | Final Rejection | Intel Corporation |
| 17821009 | QUASI-MONOLITHIC DIE ARCHITECTURES | Non-Final OA | Intel Corporation |
| 17746887 | MULTIROW GULL-WING PACKAGE FOR MICROELECRONIC DEVICES | Non-Final OA | Texas Instruments Incorporated |
| 18418849 | TUNGSTEN-BASED ADDITIVE FOR THROUGH-SUBSTRATE ETCHING | Non-Final OA | Tokyo Electron Limited |
| 18471441 | DOCUMENT STRUCTURE FORMATION | Final Rejection | Infineon Technologies AG |
| 17967116 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SEMICONDUCTOR DEVICE | Non-Final OA | SK hynix Inc. |
| 18474654 | SEMICONDUCTOR DEVICE | Non-Final OA | ROHM CO., LTD. |
| 18788253 | THIN FILM TRANSISTOR BASED LIGHT SENSOR | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 18789619 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES AND SEMICONDUCTOR DEVICES | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18775598 | SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING THEREOF | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18467979 | INTEGRATED CIRCUIT COOLING SYSTEMS AND METHODS | Final Rejection | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18467412 | METALLIC LID STRUCTURE FOR DISSIPATING HEAT GENERATED BY A THERMAL HOT SPOT REGION OF AN IC STRUCTURE | Final Rejection | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18170030 | IMAGE SENSOR WITH TRANSISTOR HAVING HIGH RELATIVE PERMITTIVITY | Final Rejection | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 17896093 | TRANSISTOR, INTEGRATED CIRCUIT, AND MANUFACTURING METHOD OF TRANSISTOR | Final Rejection | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18738230 | DISPLAY DEVICE | Non-Final OA | Magnolia White Corporation |
| 18164142 | ESD PROTECTION CIRCUIT, ESD PROTECTION METHOD, SEMICONDUCTOR MEMORY AND ESD PROTECTION SYSTEM | Non-Final OA | CHANGXIN MEMORY TECHNOLOGIES, INC. |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy87.9% of resolved applications examined by Sandra Milena Rodriguez Villanu were allowed (116 resolved cases), compared with 68.2% across Art Unit 2689 over the last five years.
This examiner's interview lift is +12.1 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Sandra Milena Rodriguez Villanu took 1,042 days on average from filing to allowance.
Sandra Milena Rodriguez Villanu examines applications in Art Unit 2689 in Tech Center 2800 (Semiconductors, Circuits & Optics).
