Tech Center 1700 • Art Units: 1713 1718
This examiner grants 62% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 17837364 | MANUFACTURING APPARATUS FOR GROUP-III COMPOUND SEMICONDUCTOR CRYSTAL | Non-Final OA | Panasonic Holdings Corporation |
| 18424470 | SYSTEMS AND METHODS FOR HIGH-THROUGHPUT ANGLED ION PROCESSING | Non-Final OA | Applied Materials, Inc. |
| 18185638 | TECHNIQUES AND APPARATUS FOR UNIDIRECTIONAL HOLE ELONGATION USING ANGLED ION BEAMS | Non-Final OA | APPLIED Materials, Inc. |
| 17959189 | CASSETTE STRUCTURES AND RELATED METHODS FOR BATCH PROCESSING IN EPITAXIAL DEPOSITION OPERATIONS | Final Rejection | Applied Materials, Inc. |
| 17561085 | BASE PLATE FOR HEATER PEDESTAL | Non-Final OA | Applied Materials, Inc. |
| 18113862 | SUBSTRATE PROCESSING APPARATUS | Non-Final OA | Tokyo Electron Limited |
| 18073185 | UPPER ELECTRODE AND PLASMA PROCESSING APPARATUS | Final Rejection | Tokyo Electron Limited |
| 17976513 | SUBSTRATE SUPPORT, PLASMA PROCESSING APPARATUS, AND PLASMA PROCESSING METHOD | Final Rejection | TOKYO ELECTRON LIMITED |
| 17996524 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE TRANSFER METHOD | Final Rejection | Tokyo Electron Limited |
| 17943702 | METHOD OF DETECTING DEVIATION AMOUNT OF SUBSTRATE TRANSPORT POSITION AND SUBSTRATE PROCESSING APPARATUS | Non-Final OA | Tokyo Electron Limited |
| 17903431 | SUBSTRATE SUPPORT ASSEMBLY AND PLASMA PROCESSING APPARATUS | Final Rejection | Tokyo Electron Limited |
| 17896904 | APPARATUS FOR FORMING FILM ON SUBSTRATE AND METHOD FOR FORMING FILM ON SUBSTRATE | Non-Final OA | TOKYO ELECTRON LIMITED |
| 17809384 | PLASMA PROCESSING APPARATUS | Final Rejection | Tokyo Electron Limited |
| 17845354 | SHOWER HEAD AND PLASMA PROCESSING APPARATUS | Non-Final OA | TOKYO ELECTRON LIMITED |
| 17854091 | CHAMBER LINER FOR SEMICONDUCTOR PROCESSING | Final Rejection | Taiwan Semiconductor Manufacturing Company |
| 17907857 | PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD | Final Rejection | Hitachi High-Tech Corporation |
| 17971829 | PLASMA CVD APPARATUS WITH A BEVEL MASK WITH A PLANAR INNER EDGE | Non-Final OA | ASM IP Holding B.V. |
| 17955816 | MODULAR REACTION CHAMBER | Non-Final OA | ASM IP Holding B.V. |
| 17896218 | CVD APPARATUS AND METHOD FOR CLEANING CHAMBER OF CVD APPARATUS | Non-Final OA | ASM IP Holding B.V. |
| 17987456 | SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM | Final Rejection | KOKUSAI ELECTRIC CORPORATION |
| 17951059 | SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM AND INNER TUBE | Final Rejection | KOKUSAI ELECTRIC CORPORATION |
| 17993996 | PROCESS GAS SUPPLYING UNIT AND SUBSTRATE TREATING APPARATUS INCLUDING THE SAME | Non-Final OA | SEMES CO., LTD. |
| 17990715 | APPARATUS FOR TREATING SUBSTRATE | Final Rejection | SEMES CO., LTD. |
| 17979149 | DETECTING UNIT AND SUBSTRATE TREATING APPARATUS INCLUDING THE SAME | Non-Final OA | SEMES CO., LTD. |
| 17939174 | APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE | Non-Final OA | SEMES CO., LTD. |
| 17895266 | APPARATUS FOR TREATING SUBSTRATES AND TEMPERATURE CONTROL METHOD OF HEATING ELEMENTS | Non-Final OA | SEMES CO., LTD. |
| 17879780 | SUBSTRATE TREATING APPARATUS AND SEMICONDUCTOR MANUFACTURING EQUIPMENT INCLUDING THE SAME | Non-Final OA | SEMES CO., LTD. |
| 17834154 | SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD | Final Rejection | SEMES CO., LTD. |
| 17780011 | SYSTEMS AND METHODS FOR USING A TRANSFORMER TO ACHIEVE UNIFORMITY IN PROCESSING A SUBSTRATE | Final Rejection | Lam Research Corporation |
| 18168810 | WAFER PLACEMENT TABLE | Final Rejection | NGK Insulators, Ltd. |
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