Tech Center 2800 • Art Units: 2851 2858
This examiner grants 100% of resolved cases
Rayappu NMN Soundranayagam has a limited history with 2 resolved cases in Art Unit 2851. The examiner's allowance rate is 100.0 percent. For the cases that reach allowance, the median pendency is 1201 days. These figures are based on the 2 resolved cases currently available in Tech Center 2800.
The data shows an interview lift of 0.0 percent. This 0.0 percent lift is based on the small sample of 2 cases where all were allowed. The 1201-day median to allowance provides the only available timing data for this examiner. Practitioners should monitor how these metrics change as more cases are resolved.
The 100.0 percent allowance rate and the 0.0 percent interview lift are the primary data points for Art Unit 2851. While the 1201-day timeline is specific to the current record, it serves as a starting point for prosecution strategy. The limited volume of 2 cases means that future resolutions will impact these statistical averages.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18552213 | PRINTED CIRCUIT BOARD PIN FIELD SIGNAL ROUTING | Non-Final OA | Intel Corporation |
| 18166974 | METHODS AND APPARATUS TO IMPLEMENT LOCALIZED CONTEXT CONFIGURATION FOR ELECTRONIC DESIGN AUTOMATION | Final Rejection | Intel Corporation |
| 18493037 | HIGH-CURRENT TOLERANT IC DESIGN WITH PLACEMENT-AWARE ANTENNA DIODE INSERTION | Non-Final OA | INTERNATIONAL BUSINESS MACHINES CORPORATION |
| 18258497 | ADAPTIVE MODEL TRAINING FOR PROCESS CONTROL OF SEMICONDUCTOR MANUFACTURING EQUIPMENT | Final Rejection | Lam Research Corporation |
| 18414480 | METHOD AND SYSTEM FOR OBTAINING OPTICAL CRITICAL DIMENSION | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. |
| 18476922 | STANDARD CELL SPACING QUALITY CHECKING | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18362842 | PIN ACCESS HYBRID CELL HEIGHT DESIGN AND SYSTEM | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 18313705 | METHOD OF MODELING A MASK BY TAKING INTO ACCOUNT OF MASK PATTERN EDGE INTERACTION | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18375342 | LOW-LATENCY ALIGNED MODULES FOR DATA STREAMS | Non-Final OA | ATI Technologies ULC |
| 18476302 | Custom Layout Recommendation Using Machine Learning | Non-Final OA | Synopsys, Inc. |
| 18121069 | INTEGRATED CIRCUIT LAYOUT EXTRACTION USING PARALLELIZED TILE IMAGE PROCESSING | Final Rejection | Battelle Memorial Institute |
| 18289384 | DETERMINING MASK RULE CHECK VIOLATIONS AND MASK DESIGN | Non-Final OA | ASML NETHERLANDS B.V. |
| 18155768 | DUMMY METAL FILLING METHOD AND APPARATUS, DEVICE AND MEDIUM | Final Rejection | CHANGXIN MEMORY TECHNOLOGIES, INC. |
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