Prosecution Insights
Prosecution Insights
Tech Center 2800 • Art Units: 1759 2851 2882
This examiner grants 82% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18644211 | SUBSTRATE TREATMENT APPARATUS | Final Rejection | CONTEMPORARY AMPEREX TECHNOLOGY CO., LIMITED |
| 18791608 | SHUTTER DEVICE, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD | Non-Final OA | CANON KABUSHIKI KAISHA |
| 18825635 | METHODS AND SYSTEMS FOR ELECTRIC FIELD-ASSISTED LITHOGRAPHY | Non-Final OA | ASM IP Holding B.V. |
| 18715317 | GENERATE 3D PHOTORESIST PROFILES USING DIGITAL LITHOGRAPHY | Final Rejection | Applied Materials, Inc. |
| 18555896 | DIGITAL LITHOGRAPHY APPARATUS WITH AUTOFOCUS POSITION CONTROL AND METHODS OF USE THEREOF | Non-Final OA | Applied Materials, Inc. |
| 18552906 | DRAWING APPARATUS AND DRAWING METHOD | Final Rejection | SCREEN Holdings Co., Ltd. |
| 18899247 | CONTROL DEVICE, OPTICAL SYSTEM, LITHOGRAPHY INSTALLATION AND METHOD | Non-Final OA | Carl Zeiss SMT GmbH |
| 18895292 | DRIVE DEVICE, OPTICAL SYSTEM AND LITHOGRAPHY APPARATUS | Non-Final OA | Carl Zeiss SMT GmbH |
| 18507893 | PROJECTION EXPOSURE APPARATUS AND METHOD FOR DESIGNING A COMPONENT OF A PROJECTION EXPOSURE APPARATUS | Final Rejection | Carl Zeiss SMT GmbH |
| 18503693 | HEATING ARRANGEMENT AND METHOD FOR HEATING AN OPTICAL ELEMENT | Final Rejection | Carl Zeiss SMT GmbH |
| 18362630 | METHOD FOR PRODUCING A MULTI-PART MIRROR OF A PROJECTION ILLUMINATION SYSTEM FOR MICROLITHOGRAPHY | Final Rejection | Carl Zeiss SMT Gmbh |
| 18528903 | EXPOSURE APPARATUS | Non-Final OA | NIKON CORPORATION |
| 18884071 | STORAGE AND TRANSFER MODULE AND SUBSTRATE TREATMENT APPARATUS INCLUDING STORAGE AND TRANSFER MODULE | Non-Final OA | SEMES CO., LTD. |
| 18842640 | APPARATUS AND METHODS FOR FILTERING MEASUREMENT RADIATION | Non-Final OA | ASML Netherlands B.V. |
| 18800925 | ACTUATOR UNIT FOR POSITIONING AN OPTICAL ELEMENT | Non-Final OA | ASML Netherlands B.V. |
| 18718009 | METHOD AND APPARATUS FOR CALCULATING REPARATION DOSE FOR A DIE OF A SUBSTRATE EXPOSED BY A LITHOGRAPHIC APPARATUS | Non-Final OA | ASML NETHERLANDS B.V. |
| 18716806 | MACHINE LEARNING MODEL FOR ASYMMETRY-INDUCED OVERLAY ERROR CORRECTION | Non-Final OA | ASML NETHERLANDS B.V. |
| 18294202 | AN OBJECT GRIPPER, A METHOD OF HOLDING AN OBJECT AND A LITHOGRAPHIC APPARATUS | Non-Final OA | ASML NETHERLANDS B.V. |
| 18515952 | Transport System Having a Magnetically Levitated Transportation Stage | Final Rejection | ASML Netherlands B.V. |
| 18511454 | PROCESS WINDOW BASED ON DEFECT PROBABILITY | Non-Final OA | ASML NETHERLANDS B.V. |
| 18279121 | ALIGNMENT METHOD AND ASSOCIATED ALIGNMENT AND LITHOGRAPHIC APPARATUSES | Final Rejection | ASML NETHERLANDS B.V. |
| 18025183 | TARGET STRUCTURE AND ASSOCIATED METHODS AND APPARATUS | Non-Final OA | ASML NETHERLANDS B.V. |
| 17874582 | COMPUTATIONAL METROLOGY BASED CORRECTION AND CONTROL | Final Rejection | ASML NETHERLANDS B.V. |
| 17277583 | METROLOGY METHOD AND APPARATUS THEREFOR | Final Rejection | ASML NETHERLANDS B.V. |
| 18618280 | SINGLE GRAB PUPIL LANDSCAPE VIA OUTSIDE THE OBJECTIVE LENS BROADBAND ILLUMINATION | Final Rejection | KLA Corporation |
| 18421454 | OVERLAY METROLOGY TARGET FOR DIE-TO-WAFER OVERLAY METROLOGY | Final Rejection | KLA Corporation |
| 17948151 | HIGH-RESOLUTION EVALUATION OF OPTICAL METROLOGY TARGETS FOR PROCESS CONTROL | Final Rejection | KLA Corporation |
| 17283056 | METHOD TO CREATE THE IDEAL SOURCE SPECTRA WITH SOURCE AND MASK OPTIMIZATION | Non-Final OA | CYMER, LLC |
| 17114642 | SYSTEMS AND METHODS FOR OPTIMIZATION OF PARAMETERS FOR EXPOSING FLEXOGRAPHIC PHOTOPOLYMER PLATES | Non-Final OA | Esko-Graphics Imaging GmbH |
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