Prosecution Insights
Prosecution Insights
Tech Center 2800 • Art Units: 1737 1759 2682 2813 2851 2882
This examiner grants 82% of resolved cases
Steven H. Whitesell is an examiner in Art Unit 1737, which is part of Tech Center 2800. He has a robust track record with 973 resolved cases. His allowance rate is 82.0 percent, showing that a strong majority of applications result in a patent grant. This 82.0 percent rate indicates a favorable environment for applicants seeking to navigate the examination process successfully.
The data reveals an interview lift of 12.8 percent for this examiner. This positive lift suggests that direct communication is an effective tool for advancing applications and overcoming rejections. Practitioners should utilize the 12.8 percent lift to improve their chances of success, especially in complex cases. The 973 resolved cases provide a reliable statistical foundation for this strategy.
The median time to allowance is 958 days. This 958-day timeframe serves as a useful guide for managing client expectations regarding the duration of the patent lifecycle. By combining the 82.0 percent allowance rate with the 958-day median, attorneys can develop a comprehensive prosecution plan. These figures highlight the procedural tendencies within Tech Center 2800.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 19030117 | METHOD OF CONFIGURING EXTREME ULTRAVIOLET (EUV) SOURCE, AND EUV EXPOSURE METHOD USING THE EUV SOURCE | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 19064395 | HOLDING APPARATUS, SUBSTRATE PROCESSING APPARATUS AND ARTICLE MANUFACTURING METHOD | Non-Final OA | CANON KABUSHIKI KAISHA |
| 18060593 | LITHOGRAPHIC PROCESSES FOR MAKING POLYMER-BASED ELEMENTS | Non-Final OA | Intel Corporation |
| 18528903 | EXPOSURE APPARATUS | Final Rejection | NIKON CORPORATION |
| 18644211 | SUBSTRATE TREATMENT APPARATUS | Non-Final OA | CONTEMPORARY AMPEREX TECHNOLOGY CO., LIMITED |
| 18787928 | RETICLE ENCLOSURE FOR LITHOGRAPHY SYSTEMS | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18638982 | RADIATION SOURCE APPARATUS AND METHOD FOR OPERATING THE SAME | Final Rejection | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 18451866 | SEMICONDUCTOR DEVICE | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. |
| 18946633 | STORAGE FOR EXTREME ULTRAVIOLET LIGHT LITHOGRAPHY | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 19170138 | DEVELOPING APPARATUS, DEVELOPING METHOD, AND COMPUTER PROGRAM | Non-Final OA | Tokyo Electron Limited |
| 18552906 | DRAWING APPARATUS AND DRAWING METHOD | Final Rejection | SCREEN Holdings Co., Ltd. |
| 19082444 | METHOD FOR OPERATING A PROJECTION EXPOSURE SYSTEM | Non-Final OA | Carl Zeiss SMT GmbH |
| 19073220 | MICROELECTROMECHANICAL DEVICE | Non-Final OA | Carl Zeiss SMT GmbH |
| 19018304 | LENS ELEMENT FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS DESIGNED FOR OPERATION IN THE DUV, AND METHOD AND ARRANGEMENT FOR FORMING AN ANTIREFLECTION LAYER | Non-Final OA | Carl Zeiss SMT GmbH |
| 18901513 | DEVICE AND METHOD FOR ALIGNING TWO COMPONENTS | Non-Final OA | Carl Zeiss SMT GmbH |
| 18895292 | DRIVE DEVICE, OPTICAL SYSTEM AND LITHOGRAPHY APPARATUS | Final Rejection | Carl Zeiss SMT GmbH |
| 18638890 | MEASURING DEVICE AND METHOD FOR INSPECTING PHOTOMASKS INTENDED FOR EUV MICROLITHOGRAPHY | Non-Final OA | Carl Zeiss SMT GmbH |
| 18362630 | METHOD FOR PRODUCING A MULTI-PART MIRROR OF A PROJECTION ILLUMINATION SYSTEM FOR MICROLITHOGRAPHY | Final Rejection | Carl Zeiss SMT Gmbh |
| 18842640 | APPARATUS AND METHODS FOR FILTERING MEASUREMENT RADIATION | Non-Final OA | ASML Netherlands B.V. |
| 18294202 | AN OBJECT GRIPPER, A METHOD OF HOLDING AN OBJECT AND A LITHOGRAPHIC APPARATUS | Final Rejection | ASML NETHERLANDS B.V. |
| 18533662 | OBJECT TABLE, A STAGE APPARATUS AND A LITHOGRAPHIC APPARATUS | Final Rejection | ASML NETHERLANDS B. V. |
| 18511454 | PROCESS WINDOW BASED ON DEFECT PROBABILITY | Final Rejection | ASML NETHERLANDS B.V. |
| 18265606 | METHOD OF METROLOGY AND ASSOCIATED APPARATUSES | Non-Final OA | ASML Netherlands B.V. |
| 18025183 | TARGET STRUCTURE AND ASSOCIATED METHODS AND APPARATUS | Final Rejection | ASML NETHERLANDS B.V. |
| 17874582 | COMPUTATIONAL METROLOGY BASED CORRECTION AND CONTROL | Non-Final OA | ASML NETHERLANDS B.V. |
| 17277583 | METROLOGY METHOD AND APPARATUS THEREFOR | Non-Final OA | ASML NETHERLANDS B.V. |
| 17791641 | LITHOGRAPHIC APPARATUS AND METHOD FOR DRIFT COMPENSATION | Final Rejection | ASML HOLDING N.V. |
| 17283056 | METHOD TO CREATE THE IDEAL SOURCE SPECTRA WITH SOURCE AND MASK OPTIMIZATION | Final Rejection | CYMER, LLC |
| 18902197 | IMAGING OVERLAY TARGETS USING MOIRÉ ELEMENTS AND ROTATIONAL SYMMETRY ARRANGEMENTS | Non-Final OA | KLA Corporation |
| 18421454 | OVERLAY METROLOGY TARGET FOR DIE-TO-WAFER OVERLAY METROLOGY | Non-Final OA | KLA Corporation |
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