Prosecution Insights
Prosecution Insights
Tech Center 2800 • Art Units: 1759 2851 2882
This examiner grants 82% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 19030117 | METHOD OF CONFIGURING EXTREME ULTRAVIOLET (EUV) SOURCE, AND EUV EXPOSURE METHOD USING THE EUV SOURCE | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 19064395 | HOLDING APPARATUS, SUBSTRATE PROCESSING APPARATUS AND ARTICLE MANUFACTURING METHOD | Non-Final OA | CANON KABUSHIKI KAISHA |
| 18488529 | GENERATING METHOD, PATTERN FORMING METHOD, ARTICLE MANUFACTURING METHOD, STORAGE MEDIUM, AND INFORMATION PROCESSING APPARATUS | Non-Final OA | CANON KABUSHIKI KAISHA |
| 17896105 | BUTTRESSED FIELD TARGET DESIGN FOR OPTICAL AND E-BEAM BASED METROLOGY TO ENABLE FIRST LAYER PRINT REGISTRATION MEASUREMENTS FOR FIELD SHAPE MATCHING AND RETICLE STITCHING IN HIGH NA LITHOGRAPHY | Non-Final OA | Intel Corporation |
| 18528903 | EXPOSURE APPARATUS | Final Rejection | NIKON CORPORATION |
| 18638982 | RADIATION SOURCE APPARATUS AND METHOD FOR OPERATING THE SAME | Final Rejection | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 18946633 | STORAGE FOR EXTREME ULTRAVIOLET LIGHT LITHOGRAPHY | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18006259 | METHODS TO IMPROVE PROCESS WINDOW AND RESOLUTION FOR DIGITAL LITHOGRAPHY WITH AUXILIARY FEATURES | Non-Final OA | Applied Materials, Inc. |
| 17942339 | EXPOSURE APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | Non-Final OA | Kioxia Corporation |
| 19082444 | METHOD FOR OPERATING A PROJECTION EXPOSURE SYSTEM | Non-Final OA | Carl Zeiss SMT GmbH |
| 19073220 | MICROELECTROMECHANICAL DEVICE | Non-Final OA | Carl Zeiss SMT GmbH |
| 18901513 | DEVICE AND METHOD FOR ALIGNING TWO COMPONENTS | Non-Final OA | Carl Zeiss SMT GmbH |
| 18899247 | CONTROL DEVICE, OPTICAL SYSTEM, LITHOGRAPHY INSTALLATION AND METHOD | Non-Final OA | Carl Zeiss SMT GmbH |
| 18895292 | DRIVE DEVICE, OPTICAL SYSTEM AND LITHOGRAPHY APPARATUS | Final Rejection | Carl Zeiss SMT GmbH |
| 18638890 | MEASURING DEVICE AND METHOD FOR INSPECTING PHOTOMASKS INTENDED FOR EUV MICROLITHOGRAPHY | Non-Final OA | Carl Zeiss SMT GmbH |
| 18503693 | HEATING ARRANGEMENT AND METHOD FOR HEATING AN OPTICAL ELEMENT | Final Rejection | Carl Zeiss SMT GmbH |
| 18362630 | METHOD FOR PRODUCING A MULTI-PART MIRROR OF A PROJECTION ILLUMINATION SYSTEM FOR MICROLITHOGRAPHY | Final Rejection | Carl Zeiss SMT Gmbh |
| 18552906 | DRAWING APPARATUS AND DRAWING METHOD | Final Rejection | SCREEN Holdings Co., Ltd. |
| 18902197 | IMAGING OVERLAY TARGETS USING MOIRÉ ELEMENTS AND ROTATIONAL SYMMETRY ARRANGEMENTS | Non-Final OA | KLA Corporation |
| 18618280 | SINGLE GRAB PUPIL LANDSCAPE VIA OUTSIDE THE OBJECTIVE LENS BROADBAND ILLUMINATION | Final Rejection | KLA Corporation |
| 19011092 | SUBSTRATE HOLDER FOR USE IN A LITHOGRAPHIC APPARATUS | Non-Final OA | ASML NETHERLANDS B.V |
| 18983297 | ACTUATOR ASSEMBLIES COMPRISING PIEZO ACTUATORS OR ELECTROSTRICTIVE ACTUATORS | Non-Final OA | ASML NETHERLANDS B.V. |
| 18873597 | FOCUS MEASURMENT AND CONTROL IN METROLOGY AND ASSOCIATED WEDGE ARRANGEMENT | Non-Final OA | ASML Netherlands B.V. |
| 18859655 | MIRROR ASSEMBLY FOR MICROMIRROR ARRAY | Non-Final OA | ASML Netherlands B.V. |
| 18842640 | APPARATUS AND METHODS FOR FILTERING MEASUREMENT RADIATION | Final Rejection | ASML Netherlands B.V. |
| 18533662 | OBJECT TABLE, A STAGE APPARATUS AND A LITHOGRAPHIC APPARATUS | Final Rejection | ASML NETHERLANDS B. V. |
| 18515952 | Transport System Having a Magnetically Levitated Transportation Stage | Final Rejection | ASML Netherlands B.V. |
| 18511454 | PROCESS WINDOW BASED ON DEFECT PROBABILITY | Final Rejection | ASML NETHERLANDS B.V. |
| 18265606 | METHOD OF METROLOGY AND ASSOCIATED APPARATUSES | Non-Final OA | ASML Netherlands B.V. |
| 17791641 | LITHOGRAPHIC APPARATUS AND METHOD FOR DRIFT COMPENSATION | Final Rejection | ASML HOLDING N.V. |
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