Prosecution Insights
Last updated: October 02, 2026

Examiner: CHAN, TSZFUNG JACKIE

Tech Center 2800 • Art Units: 2832 2837

This examiner grants 76% of resolved cases

Analysis

Tszfung Jackie Chan is an examiner in Tech Center 2800 and Art Unit 2832. The examiner has 888 resolved cases. This volume of resolutions provides a basis for analyzing the examiner's prosecution patterns. The data offers a view of how applications are examined within this specific technical unit and the examiner's consistency in decision-making.

The allowance rate is 75.6 percent. This percentage shows the frequency of grants for applications that reach a final resolution with this examiner. The median days to allowance is 1133. This figure indicates the time from filing to the grant of a patent. Practitioners can use this duration to estimate the timeline for their own applications in this art unit and plan their intellectual property strategy accordingly.

The interview lift is 18.9 percent. This metric indicates that an interview is associated with an increase in the probability of an allowance. The positive lift suggests that verbal communication is an effective method for resolving rejections with this examiner. Applicants might prioritize scheduling an interview to address the examiner's concerns and potentially accelerate the path to a patent grant.

Written from this page's own data; every figure is computed from USPTO records and verified before publication.

Performance Statistics

75.6%
Allow Rate
+7.6% vs TC avg
925
Total Applications
+18.9%
Interview Lift
1133
Avg Prosecution Days
Based on 888 resolved cases, 2023–2026

Rejection Statute Breakdown

0%
§101 Eligibility
15.0%
§102 Novelty
56.3%
§103 Obviousness
25.4%
§112 Clarity

Currently Pending Office Actions

App #TitleStatusAssignee
18304152 INDUCTIVE DEVICES AND ASSOCIATED METHODS FOR IMPROVED OVERCURRENT PERFORMANCE Non-Final OA ABB Schweiz AG
18251110 INDUCTIVE COMPONENT HAVING JOINED CORE PARTS Non-Final OA Robert Bosch GmbH
17482804 IN-BUILT MAGNETIC INDUCTOR SCHEMES FOR GLASS CORE SUBSTRATES Non-Final OA Intel Corporation
18316737 COIL DEVICE Non-Final OA Mitsubishi Electric Corporation
18333356 ELECTRONIC COMPONENT, COIL COMPONENT, AND METHOD FOR MANUFACTURING ELECTRONIC COMPONENT Non-Final OA Murata Manufacturing Co., Ltd.
18035614 EMBEDDED MAGNETIC COMPONENT DEVICE INCLUDING VENTED CHANNEL AND MULTILAYER WINDINGS Non-Final OA Murata Manufacturing Co., Ltd.
18296237 INDUCTOR COMPONENT Non-Final OA Murata Manufacturing Co., Ltd.
18305705 PLANAR TRANSFORMER Non-Final OA DELTA ELECTRONICS, INC.
17994943 MAGNETIC COMPONENT FOR GALVANICALLY ISOLATED LCL-T RESONANT CONVERTER Final Rejection Delta Electronics, Inc.
17908114 MAGNETIC PART USING WINDING COIL AND PATTERN COIL Non-Final OA LG INNOTEK CO., LTD.
18310763 ACTIVELY COOLED INDUCTOR Non-Final OA FORD GLOBAL TECHNOLOGIES, LLC
18299830 POWER MODULE WITH FLAT COPPER WINDING Non-Final OA TEXAS INSTRUMENTS INCORPORATED
17991179 COIL COMPONENT Non-Final OA SAMSUNG ELECTRO-MECHANICS CO., LTD.
18743760 MULTILAYER COIL COMPONENT Non-Final OA TDK Corporation
18334702 COIL DEVICE Non-Final OA TDK CORPORATION
18319541 COIL DEVICE AND METHOD FOR MANUFACTURING THE SAME Non-Final OA TDK CORPORATION
18319548 COIL DEVICE Non-Final OA TDK CORPORATION
18304066 COIL COMPONENT AND METHOD OF MANUFACTURING THE SAME Non-Final OA TDK CORPORATION
17970182 ELECTRONIC COMPONENT Final Rejection TDK CORPORATION
17583681 MULTILAYER ELECTRONIC COMPONENT Non-Final OA TDK CORPORATION
18182272 Inductor Inlay for a Component Carrier and a Method of Manufacturing the Same Final Rejection AT&S Austria Technologie & Systemtechnik AG

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