Prosecution Insights
Prosecution Insights
Tech Center 2800 • Art Units: 2891
This examiner grants 74% of resolved cases
Examiner Halee Paige Cramer works in Art Unit 2891 within Tech Center 2800. She has 62 resolved cases and an allowance rate of 74.2%. The median days to allowance for these cases is 1210 days. The data also shows an interview lift of 6.5%. This 6.5% lift indicates that cases involving an interview reach allowance at a higher rate than the 74.2% overall allowance rate. These figures provide a statistical overview of the prosecution environment for this examiner.
The 62 resolved cases in Tech Center 2800 establish the historical performance for Art Unit 2891. An allowance rate of 74.2% means that a majority of applications reached a successful conclusion. The median of 1210 days to allowance represents the timeframe for the prosecution process. Because the interview lift is 6.5%, practitioners can see a benefit to conducting a formal discussion with the examiner. These data points from 62 resolved cases offer a factual summary of the outcomes for applications assigned to Halee Paige Cramer.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18309347 | IMAGE SENSOR | Non-Final OA | Samsung Electronics Co., Ltd. |
| 17719996 | INTEGRATED CIRCUIT INCLUDING DEVICES WITH VARIOUS PROPERTIES AND METHOD FOR DESIGNING THE SAME | Final Rejection | SAMSUNG ELECTRONICS CO., LTD. |
| 18114189 | DISPLAY DEVICE AND METHOD OF FABRICATING THE SAME | Final Rejection | Samsung Display Co., LTD. |
| 17980202 | Touch Display Apparatus | Final Rejection | LG Display Co., Ltd. |
| 17693150 | FABRICATION OF GATE-ALL-AROUND INTEGRATED CIRCUIT STRUCTURES HAVING ADDITIVE GATE STRUCTURES IN A TUB ARCHITECTURE | Non-Final OA | Intel Corporation |
| 17678928 | SHARED CONTACT DEVICES WITH CONTACTS EXTENDING INTO A CHANNEL LAYER | Final Rejection | Intel Corporation |
| 17809621 | SELF-ALIGNED BACKSIDE CONNECTIONS FOR TRANSISTORS | Final Rejection | International Business Machines Corporation |
| 17541879 | SEMICONDUCTOR STRUCTURES WITH LOW TOP CONTACT RESISTANCE | Non-Final OA | International Business Machines Corporation |
| 17585252 | SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING THEREOF | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 17456609 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSING APPARATUS | Final Rejection | Tokyo Electron Limited |
| 18230579 | ELECTRONIC DEVICE | Non-Final OA | Advanced Semiconductor Engineering, Inc. |
| 17979879 | SILICON WAFER AND EPITAXIAL SILICON WAFER | Non-Final OA | SUMCO CORPORATION |
| 18396161 | LIGHT SENSING ELEMENT AND MANUFACTURING METHOD THEREOF | Non-Final OA | Taiwan-Asia Semiconductor Corporation |
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