Prosecution Insights
Last updated: August 18, 2026

Examiner: DELCOTTO, GREGORY R

Tech Center 2800 • Art Units: 1711 1761 1796 2899

This examiner grants 54% of resolved cases

Performance Statistics

53.9%
Allow Rate
-14.1% vs TC avg
1,291
Total Applications
+75.8%
Interview Lift
1056
Avg Prosecution Days
Based on 1227 resolved cases, 2023–2026

Rejection Statute Breakdown

0.9%
§101 Eligibility
12.7%
§102 Novelty
52.4%
§103 Obviousness
15.4%
§112 Clarity

Currently Pending Office Actions

App #TitleStatusAssignee
18585900 CLEANING COMPOSITION AND METHOD OF CLEANING MASK BY USING THE SAME Non-Final OA Samsung Electronics Co., Ltd.
18437555 CHEMICAL COMPOSITION FOR REMOVING BUG SPLATTER FROM VEHICLE WINDSHIELDS Final Rejection Illinois Tool Works Inc.
18103140 WELLBORE CLEANING COMPOSITIONS AND METHODS OF MAKING AND USING SAME Non-Final OA Halliburton Energy Services, Inc.
18891223 COMPOSITION Non-Final OA The Procter & Gamble Company
18891302 LIQUID HAND DISHWASHING CLEANING COMPOSITION Non-Final OA The Procter & Gamble Company
18618156 CLEANSING BALM Non-Final OA The Procter & Gamble Company
18407492 LIQUID HAND DISHWASHING DETERGENT COMPOSITION Final Rejection The Procter & Gamble Company
18407493 LIQUID HAND DISHWASHING DETERGENT COMPOSITION Final Rejection The Procter & Gamble Company
17961148 SULFATE FREE CLEAR PERSONAL CLEANSING COMPOSITION COMPRISING LOW INORGANIC SALT AND HYDROXAMIC ACID OR HYDROXAMIC ACID DERIVATIVES Final Rejection The Procter & Gamble Company
17861287 LIQUID HAND DISHWASHING CLEANING COMPOSITION Final Rejection The Procter & Gamble Company
18647489 TREATMENT SOLUTION FOR SEMICONDUCTOR SUBSTRATES Non-Final OA FUJIFILM Corporation
18609739 COMPOSITION AND METHOD FOR TREATING OBJECT TO BE TREATED Final Rejection FUJIFILM Corporation
18533556 CLEANING COMPOSITION, CLEANING METHOD OF SEMICONDUCTOR SUBSTRATE, AND MANUFACTURING METHOD OF SEMICONDUCTOR ELEMENT Final Rejection FUJIFILM Corporation
18357360 COMPOSITION AND SUBSTRATE WASHING METHOD Non-Final OA FUJIFILM Corporation
18356507 CLEANING LIQUID FOR SEMICONDUCTOR SUBSTRATE Non-Final OA FUJIFILM Corporation
17678466 CLEANING SOLUTION AND CLEANING METHOD Final Rejection FUJIFILM Corporation
17466211 CLEANING LIQUID Non-Final OA FUJIFILM Corporation
18433969 AQUEOUS CLEANING LIQUID Final Rejection TOKYO OHKA KOGYO CO., LTD.
18085249 Cleaning Compositions Final Rejection Colgate-Palmolive Company
18854020 METHOD FOR MANUFACTURING A DETERGENT PORTION UNIT Non-Final OA HENKEL AG & CO. KGAA
18828506 DETERGENT COMPOSITIONS WITH SUSTAINABLE POLYMERS AND MAILLARD REACTION INHIBITING ENZYMES Non-Final OA HENKEL AG & CO. KGAA
18741203 Washing or Cleaning Agent Product Form Non-Final OA Henkel AG & Co. KGaA
18568177 COMPOSITIONS CONTAINING COLOUR-NEUTRAL DEGRADABLE MICROCAPSULES Non-Final OA HENKEL AG & CO. KGAA
18508550 POWDERED DETERGENT COMPOSITION Final Rejection Henkel AG & Co. KGaA
18246531 COMPOSITION FOR CLEANING SEMICONDUCTOR SUBSTRATE, AND CLEANING METHOD Final Rejection MITSUBISHI GAS CHEMICAL COMPANY, INC.
17754568 SYSTEMS AND METHODS FOR TREATING A METAL SUBSTRATE Final Rejection PPG Industries Ohio, Inc.
16958795 Laundry Additive for Removing Stains Final Rejection Zobele Holding S.P.A.

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