Listed by the USPTO as IMTIAZ, S M SOHEL
Tech Center 4100 • Art Units: 1787 2812 4100
This examiner grants 91% of resolved cases
IMTIAZ, S M SOHEL is a USPTO patent examiner in Tech Center 4100 and Art Unit 1787. The profile covers 564 resolved cases and shows a 90.8% allowance rate. The median time to allowance is 844 days, and interview lift is 6.9%. The data therefore points to frequent allowance outcomes, with interviews showing a smaller incremental association than the baseline allowance result.
The leading companies are Samsung Electronics Co., Ltd., Samsung Display Co., Ltd., and Intel Corporation. The listed firms are AGORA LAW GROUP, PLLC, Akona IP PC - Intel, and Alliance IP, LLC - Intel. For prosecution teams, the profile suggests that claim presentation and substantive application quality may be more important than relying heavily on interviews to change the result.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18745755 | MEMORY DEVICE AND METHOD OF MANUFACTURING MEMORY DEVICE | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18732958 | VERTICAL CHANNEL TRANSISTORS HAVE ENHANCED SOURCE-TO-DRAIN CURRENT PATHS THEREIN | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18488412 | INTEGRATED CIRCUIT DEVICES INCLUDING A BACKSIDE POWER DISTRIBUTION NETWORK STRUCTURE AND METHODS OF FORMING THE SAME | Final Rejection | Samsung Electronics Co., Ltd. |
| 18661898 | PHOTOELECTRIC CONVERSION DEVICE AND EQUIPMENT | Non-Final OA | CANON KABUSHIKI KAISHA |
| 18921591 | POWER MODULE HAVING A FIRST CIRCUIT CARRIER CONTAINING A CARRIER SUBSTRATE | Non-Final OA | Robert Bosch GmbH |
| 18798654 | LIGHT EMITTING ELEMENT AND DISPLAY DEVICE COMPRISING THE SAME | Non-Final OA | LG Display Co., Ltd. |
| 18791245 | DISPLAY DEVICE | Non-Final OA | Samsung Display Co., LTD. |
| 18740701 | DISPLAY APPARATUS | Non-Final OA | Samsung Display Co., LTD. |
| 18396236 | DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME | Final Rejection | SAMSUNG DISPLAY CO., LTD. |
| 18574299 | LIGHT-EMITTING BASEPLATE AND DISPLAY APPARATUS | Final Rejection | BOE Technology Group Co., Ltd. |
| 18707833 | Electronic Device with Absorption Member | Non-Final OA | Honor Device Co., Ltd. |
| 18680875 | PACKAGE COMPRISING A TRENCH CAPACITOR DEVICE WITH A METALLIZATION PORTION COMPRISING BAR METALLIZATION INTERCONNECTS | Non-Final OA | QUALCOMM Incorporated |
| 18216485 | AND DOUBLE PATTERNING STRATEGY WITH PRINTED ERASABLE DUMMIFICATION | Non-Final OA | Intel Corporation |
| 18341852 | THREE-DIMENSIONAL FLOATING BODY MEMORY | Non-Final OA | Intel Corporation |
| 18148355 | INTEGRATED CIRCUIT DEVICE PACKAGE SUBSTRATES WITH GLASS CORE LAYER HAVING ROUGHENED SURFACES | Final Rejection | Intel Corporation |
| 17958279 | GAIN CELL USING PLANAR AND TRENCH FERROELECTRIC AND ANTI-FERROELECTRIC CAPACITORS FOR EDRAM | Non-Final OA | Intel Corporation |
| 18593582 | SEMICONDUCTOR STORAGE DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR STORAGE DEVICE | Non-Final OA | Kioxia Corporation |
| 18762381 | THIN FILM TRANSISTOR AND DISPLAY DEVICE INCLUDING THE SAME | Non-Final OA | ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE |
| 18050338 | TRANSISTOR WITH DISTRIBUTED THERMAL FEEDBACK | Non-Final OA | TEXAS INSTRUMENTS INCORPORATED |
| 18833963 | SMART IC SUBSTRATE MODULE AND SMART IC SUBSTRATE | Non-Final OA | LG INNOTEK CO., LTD. |
| 18773493 | BACKSIDE TRENCH ISOLATION FOR HIGH VOLTAGE DEVICE INTEGRATION | Non-Final OA | INTERNATIONAL BUSINESS MACHINES CORPORATION |
| 18631010 | DIODE FORMATION WITH BACKSIDE POWER DELIVERY NETWORK | Non-Final OA | INTERNATIONAL BUSINESS MACHINES CORPORATION |
| 18596213 | CHIP-TO-CHIP STACKING BY USE OF NICKEL TIN METALLIZATION STACKS AND DIFFUSION SOLDERING | Final Rejection | Infineon Technologies Austria AG |
| 18442073 | STACK TYPE SEMICONDUCTOR MEMORY DEVICE | Final Rejection | SK hynix Inc. |
| 18613805 | BIASABLE GAS DISTRIBUTION PLATE | Non-Final OA | Applied Materials, Inc. |
| 18637865 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES | Non-Final OA | STMicroelectronics International N.V. |
| 18784089 | Ferroelectric Memory Device and Method of Manufacturing the Same | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy90.8% of resolved applications examined by S M Sohel Imtiaz were allowed (564 resolved cases), compared with 33.0% across Art Unit 1787 over the last five years.
This examiner's interview lift is +6.9 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by S M Sohel Imtiaz took 844 days on average from filing to allowance.
S M Sohel Imtiaz examines applications in Art Unit 1787 in Tech Center 4100.
