Prosecution Insights
Last updated: April 19, 2026

Examiner: NUCKOLS, TIFFANY Z

Tech Center 3700 • Art Units: 1712 1716 1792 3762

This examiner grants 44% of resolved cases

Performance Statistics

44.2%
Allow Rate
-25.8% vs TC avg
657
Total Applications
+40.4%
Interview Lift
1610
Avg Prosecution Days
Based on 607 resolved cases, 2023–2026

Rejection Statute Breakdown

0.1%
§101 Eligibility
24.6%
§102 Novelty
59.1%
§103 Obviousness
11.9%
§112 Clarity

Currently Pending Office Actions

App #TitleStatusAssignee
18667082 BACK SIDE DESIGN FOR FLAT SILICON CARBIDE SUSCEPTOR Non-Final OA Applied Materials, Inc.
18140508 GAS EXHAUST FRAMES INCLUDING PATHWAYS HAVING SIZE VARIATIONS, AND RELATED APPARATUS AND METHODS Final Rejection Applied Materials, Inc.
18101523 PRE-HEAT RINGS AND PROCESSING CHAMBERS INCLUDING BLACK QUARTZ, AND RELATED METHODS Non-Final OA Applied Materials, Inc.
17975195 EPI OVERLAPPING DISK AND RING Non-Final OA Applied Materials, Inc.
17971494 PROCESS CHAMBER WITH REFLECTOR Final Rejection Applied Materials, Inc.
17919896 WAFER EDGE TEMPERATURE CORRECTION IN BATCH THERMAL PROCESS CHAMBER Non-Final OA Applied Materials, Inc.
17964684 ELECTROSTATIC CHUCK WITH DETACHABLE SHAFT Non-Final OA Applied Materials, Inc.
17961214 LOAD LOCK CHAMBERS AND RELATED METHODS AND STRUCTURES FOR BATCH COOLING OR HEATING Final Rejection Applied Materials, Inc.
17862138 APPARATUS AND METHODS TO PROMOTE WAFER EDGE TEMPERATURE UNIFORMITY Non-Final OA Applied Materials, Inc.
17374558 APPARATUS DESIGN FOR PHOTORESIST DEPOSITION Non-Final OA Applied Materials, Inc.
17368997 COATED SUBSTRATE SUPPORT ASSEMBLY FOR SUBSTRATE PROCESSING Final Rejection Applied Materials, Inc
17691856 PLASMA PROCESSING APPARATUS AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD Final Rejection Kioxia Corporation
17178458 SUBSTRATE PROCESSING APPARATUS Final Rejection Tokyo Electron Limited
17457605 HIGH PERFORMANCE SUSCEPTOR APPARATUS Final Rejection ASM IP HOLDING B.V.
17392257 SUBSTRATE PROCESSING APPARATUS Non-Final OA ASM IP Holding B.V.
18495891 SUBSTRATE PROCESSING APPARATUS, PLASMA GENERATING APPARATUS, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE Non-Final OA KOKUSAI ELECTRIC CORPORATION
17733653 APPARATUS AND METHOD FOR PROCESSING SUBSTRATE Final Rejection SEMES CO., LTD.
18463647 TOOL FOR PREVENTING OR SUPPRESSING ARCING Non-Final OA Lam Research Corporation
17924618 EVAPORATIVE COOLING OF ELECTROSTATIC CHUCKS Non-Final OA LAM RESEARCH CORPORATION
17920111 FLOATING PCB DESIGN FOR SUBSTRATE SUPPORT ASSEMBLY Non-Final OA LAM RESEARCH CORPORATION
17821107 ATOMIC LAYER ETCHING AND SMOOTHING OF REFRACTORY METALS AND OTHER HIGH SURFACE BINDING ENERGY MATERIALS Final Rejection Lam Research Corporation
18846849 VACUUMING STSTEM, SEMICONDUCTOR PROCESS DEVICE AND VACUUMING METHOD THEREOF Non-Final OA BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
17941923 REACTION CHAMBER Non-Final OA BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
17846867 Radiatively-Cooled Substrate Holder Final Rejection TEL Manufacturing and Engineering of America, Inc.
17838821 SUSCEPTOR AND MANUFACTURING METHOD THEREOF Final Rejection CoorsTek KK
18454374 CHAMBER FOR DEGASSING SUBSTRATES Non-Final OA EVATEC AG
18248069 PEDESTAL HEATER BLOCK HAVING ASYMMETRIC HEATING WIRE STRUCTURE Non-Final OA MECARO CO., LTD.
17801488 ATOMIZING APPARATUS FOR FILM FORMATION, FILM FORMING APPARATUS USING THE SAME, AND SEMICONDUCTOR FILM Non-Final OA KOCHI PREFECTURAL PUBLIC UNIVERSITY CORPORATION

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