Prosecution Insights
Last updated: October 26, 2026

Brian Turner, USPTO Patent Examiner

Listed by the USPTO as TURNER, BRIAN

Tech Center 2800 • Art Units: 2818 2894

This examiner grants 83% of resolved cases

Analysis

TURNER, BRIAN is assigned to USPTO technology center 2800 and art unit 2818. The profile covers 776 resolved cases and shows an 83.4% allowance rate. The interview lift is 4.1%, and median time to allowance is 771 days, supplying a relatively short timing measure within this profile.

Top company entries are Taiwan Semiconductor Manufacturing Company, Ltd., Micron Technology Inc., and Intel Corporation. The listed firms are Dorsey & Whitney LLP - MTI (Nelson), Haynes and Boone, LLP, and FITCH, EVEN, TABIN & FLANNERY, LLP. These relationships help identify the prosecution settings represented in the record.

Written from this page's own data; every figure is computed from USPTO records and verified before publication.

Performance Statistics

83.4%
Allow Rate
+15.4% vs TC avg
835
Total Applications
+4.1%
Interview Lift
771
Avg Prosecution Days
Based on 776 resolved cases, 2023–2026

Rejection Statute Breakdown

1.8%
§101 Eligibility
22.2%
§102 Novelty
61.3%
§103 Obviousness
12.9%
§112 Clarity

Currently Pending Office Actions

App #TitleStatusAssignee
18475290 INTEGRATED CIRCUIT INCLUDING THROUGH-SILICON VIA AND METHOD OF DESIGNING THE INTEGRATED CIRCUIT Non-Final OA Samsung Electronics Co., Ltd.
18165563 SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME Non-Final OA Samsung Electronics Co., Ltd.
18356230 SEMICONDUCTOR APPARATUS AND MANUFACTURING METHOD OF SEMICONDUCTOR APPARATUS Non-Final OA FUJI ELECTRIC CO., LTD.
18903914 DISPLAY DEVICE Non-Final OA LG Display Co., Ltd.
18825620 QUANTUM DOT AND DISPLAY DEVICE INCLUDING THE SAME Non-Final OA Samsung Display Co., LTD.
18324640 HEAT DISSIPATION SOLUTIONS FOR INTEGRATED CIRCUIT PACKAGES Non-Final OA Intel Corporation
17953873 HIGH ASPECT RATIO METAL GATE CUTS Non-Final OA Intel Corporation
17851985 INTEGRATED CIRCUIT STRUCTURES HAVING MEMORY WITH BACKSIDE POWER DELIVERY Non-Final OA Intel Corporation
18281779 POWER CONVERSION DEVICE AND METHOD FOR CONTROLLING POWER CONVERSION DEVICE Non-Final OA Mitsubishi Electric Corporation
18530404 SEMICONDUCTOR DEVICE AND ELECTRONIC DEVICE Non-Final OA SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
18645043 TWO TRANSISTOR CELLS FOR VERTICAL THREE-DIMENSIONAL MEMORY HAVING VERICAL DIGIT LINES Non-Final OA Micron Technology, Inc.
18368449 METHOD FOR SEMICONDUCTOR DIE EDGE PROTECTION AND SEMICONDUCTOR DIE SEPARATION Final Rejection Micron Technology, Inc.
18111424 MODIFIED SEMICONDUCTOR DIE CARRIER AND CARRIER TAPE Non-Final OA Micron Technology, Inc.
17587971 STACKED SEMICONDUCTOR DIE ASSEMBLIES WITH HIGH EFFICIENCY THERMAL PATHS AND MOLDED UNDERFILL Non-Final OA Micron Technology, Inc.
18419632 SEMICONDUCTOR MEMORY AND METHOD OF MANUFACTURING THE SEMICONDUCTOR MEMORY Non-Final OA KIOXIA CORPORATION
17684251 PACKAGED DEVICE CARRIER FOR THERMAL ENHANCEMENT OR SIGNAL REDISTRIBUTION OF PACKAGED SEMICONDUCTOR DEVICES Non-Final OA Texas Instruments Incorporated
17392738 SEMICONDUCTOR PACKAGE WITH RAISED DAM ON CLIP OR LEADFRAME Final Rejection Texas Instruments Incorporated
18132437 WAFER LEVEL CHIP SCALE PACKAGE WITH SIDEWALL PROTECTION Non-Final OA MEDIATEK INC.
18093648 HYDROGEN MANAGEMENT IN PLASMA DEPOSITED FILMS Final Rejection Applied Materials, Inc.
18519805 SEMICONDUCTOR STRUCTURES AND METHODS THEREOF Non-Final OA Taiwan Semiconductor Manufacturing Company, Ltd.
18231320 METHOD FOR FORMING A SEMICONDUCTOR DEVICE AND DEVICES FABRICATED THEREOF Final Rejection TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
17894169 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF Non-Final OA Taiwan Semiconductor Manufacturing Company, Ltd.
18655833 CONNECTION BETWEEN SOURCE/DRAIN AND GATE Non-Final OA Taiwan Semiconductor Manufacturing Co., Ltd.
18632132 NOVEL RESISTIVE RANDOM ACCESS MEMORY DEVICE Non-Final OA Taiwan Semiconductor Manufacturing Co., Ltd.
18526445 SEMICONDUCTOR DEVICES WITH BACKSIDE ROUTING AND METHOD OF FORMING SAME Non-Final OA Taiwan Semiconductor Manufacturing Co., Ltd.
18521931 METAL SOURCE/DRAIN FEATURES Non-Final OA Taiwan Semiconductor Manufacturing Co., Ltd.
18314446 Complementary Field Effect Transistors and Methods of Forming the Same Non-Final OA Taiwan Semiconductor Manufacturing Co., Ltd.
18258846 FILM ADHESIVE AND METHOD FOR MAKING SAME; DICING/DIE BONDING INTEGRATED FILM AND METHOD FOR MAKING SAME; AND SEMICONDUCTOR DEVICE AND METHOD FOR MAKING SAME Final Rejection Resonac Corporation
18258891 FILM-LIKE ADHESIVE AGENT, DICING/DIE-BONDING ALL-IN-ONE FILM, SEMICONDUCTOR DEVICE, AND METHOD FOR MANUFACTURING SAME Non-Final OA Resonac Corporation

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Frequently Asked Questions

What is examiner Brian Turner's allowance rate?

83.4% of resolved applications examined by Brian Turner were allowed (776 resolved cases), compared with 85.2% across Art Unit 2818 over the last five years.

Does an interview help with examiner Brian Turner?

This examiner's interview lift is +4.1 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.

How long does examiner Brian Turner take to allow a patent?

Applications allowed by Brian Turner took 771 days on average from filing to allowance.

Which art unit does examiner Brian Turner work in?

Brian Turner examines applications in Art Unit 2818 in Tech Center 2800 (Semiconductors, Circuits & Optics).

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