Prosecution Insights
Prosecution Insights
10 pending office actions • 1 client • 10 examiners • 6 art units • 0 of 10 (0%) have an AI response strategy ready • 5 patents granted in the last 365 days
Based on the USPTO statutory response window for each pending office action. 4 of the docket's apps have a known mailing date; the rest are excluded from the tile counts.
Every pending office action with a known statutory deadline, placed on a days-until-due axis. Dots left of Today are overdue; the further right, the more runway. Cases that share a deadline window stack vertically. 4 of the docket's apps have a known mailing date.
Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.
| Bucket | Cases |
|---|---|
| §101 only | 1 (10%) |
| §103 only | 5 (50%) |
| §102 only | 1 (10%) |
| Multi-statute (no §101) | 3 (30%) |
How the docket's pending cases split across USPTO tech-center bands.
Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.
| Examiner | Apps on this docket | Allow rate | Interview lift |
|---|---|---|---|
| TRAN, JUDY DAO | 1 | 76.3% | +23.7% |
| HANSEN, JONATHAN M | 1 | 79.5% | +11.8% |
| AYUB, HINA F | 1 | 84.9% | +17.4% |
| FABIAN JR, ROBERTO | 1 | 70.9% | +25.7% |
| LU, ZHIYU | 1 | 49.2% | +14.0% |
| DESAI, NAISHADH N | 1 | 82.0% | +8.7% |
| GAVIA, NYLA EMANI ANN | 1 | 80.5% | +13.9% |
| UNDERWOOD, JARREAS C | 1 | 79.0% | +21.9% |
| ERDMAN, CHAD G | 1 | 80.1% | +18.1% |
| JEFFERSON, QUOVAUNDA | 1 | 79.2% | +8.6% |
Cases in front of an examiner with an allow rate of 80%+ where the difficulty is Easy or Medium. The top 1 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18375920 | Magnetically Opposed, Iron Core Linear Motor Based Motion Stages For Semiconductor Wafer Positioning | DESAI, NAISHADH N | 21d |
Multi-statute / §101-driven matters, or cases in front of an examiner with an allow rate under 30%. The top 4 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18229606 | Methods And Systems For Systematic Error Compensation Across A Fleet Of Metrology Systems Based On A Trained Error Evaluation Model | GAVIA, NYLA EMANI ANN | 35d |
| 18977795 | Methods And Systems For Reflectometry Based Measurements Of Deep, Large Pitch Semiconductor Structures | TRAN, JUDY DAO | — |
| 18812890 | Angle Of Incidence And Azimuth Angle Resolved Spectroscopic Ellipsometry For Semiconductor Metrology | AYUB, HINA F | — |
| 17978844 | Methods And Systems For Monitoring Metrology Fleet Productivity | ERDMAN, CHAD G | — |
Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 8 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18136772 | Combined Spectroscopic Reflectometry And Pattern Recognition Based Measurements Of Semiconductor Structures | UNDERWOOD, JARREAS C | 34d |
| 18229606 | Methods And Systems For Systematic Error Compensation Across A Fleet Of Metrology Systems Based On A Trained Error Evaluation Model | GAVIA, NYLA EMANI ANN | 35d |
| 18646553 | Spectroscopic Ellipsometry With Detector Resolved Numerical Aperture For Deep Structure Metrology | FABIAN JR, ROBERTO | 68d |
| 18977795 | Methods And Systems For Reflectometry Based Measurements Of Deep, Large Pitch Semiconductor Structures | TRAN, JUDY DAO | — |
| 18972428 | Measurements Of Complex Semiconductor Structures Based On Component Measurement Signals | HANSEN, JONATHAN M | — |
| 18812890 | Angle Of Incidence And Azimuth Angle Resolved Spectroscopic Ellipsometry For Semiconductor Metrology | AYUB, HINA F | — |
| 18416113 | X-Ray Scatterometry Based Measurements Of Memory Array Structures Stacked With Complex Logic Structures | LU, ZHIYU | — |
| 17978844 | Methods And Systems For Monitoring Metrology Fleet Productivity | ERDMAN, CHAD G | — |
| Client (Assignee) | Pending OAs |
|---|---|
| KLA | 10 |
| Art Unit | Apps |
|---|---|
| 2877 | 5 |
| 2665 | 1 |
| 2834 | 1 |
| 2857 | 1 |
| 2116 | 1 |
| 2899 | 1 |
| App # | Title | Client | Examiner | Art Unit | Statutes | Status | Due in | AI | Filed |
|---|---|---|---|---|---|---|---|---|---|
| 18977795 | Methods And Systems For Reflectometry Based Measurements Of Deep, Large Pitch Semiconductor Structures | Kla Corporation | TRAN, JUDY DAO | 2877 | §103§112 | Non-Final OA | — | Pending | Dec 11, 2024 |
| 18972428 | Measurements Of Complex Semiconductor Structures Based On Component Measurement Signals | Kla Corporation | HANSEN, JONATHAN M | 2877 | §102 | Non-Final OA | — | Pending | Dec 06, 2024 |
| 18812890 | Angle Of Incidence And Azimuth Angle Resolved Spectroscopic Ellipsometry For Semiconductor Metrology | Kla Corporation | AYUB, HINA F | 2877 | §102§103 | Non-Final OA | — | Pending | Aug 22, 2024 |
| 18646553 | Spectroscopic Ellipsometry With Detector Resolved Numerical Aperture For Deep Structure Metrology | Kla Corporation | FABIAN JR, ROBERTO | 2877 | §103 | Final Rejection | 68d | Pending | Apr 25, 2024 |
| 18416113 | X-Ray Scatterometry Based Measurements Of Memory Array Structures Stacked With Complex Logic Structures | Kla Corporation | LU, ZHIYU | 2665 | §103 | Non-Final OA | — | Pending | Jan 18, 2024 |
| 18375920 | Magnetically Opposed, Iron Core Linear Motor Based Motion Stages For Semiconductor Wafer Positioning | Kla Corporation | DESAI, NAISHADH N | 2834 | §103 | Non-Final OA | 21d | Pending | Oct 02, 2023 |
| 18229606 | Methods And Systems For Systematic Error Compensation Across A Fleet Of Metrology Systems Based On A Trained Error Evaluation Model | Kla Corporation | GAVIA, NYLA EMANI ANN | 2857 | §101 | Non-Final OA | 35d | Pending | Aug 02, 2023 |
| 18136772 | Combined Spectroscopic Reflectometry And Pattern Recognition Based Measurements Of Semiconductor Structures | Kla Corporation | UNDERWOOD, JARREAS C | 2877 | §103 | Non-Final OA | 34d | Pending | Apr 19, 2023 |
| 17978844 | Methods And Systems For Monitoring Metrology Fleet Productivity | Kla Corporation | ERDMAN, CHAD G | 2116 | §103§112 | Non-Final OA | — | Pending | Nov 01, 2022 |
| 17590116 | Methods And Systems For Accurate Measurement Of Deep Structures Having Distorted Geometry | Kla Corporation | JEFFERSON, QUOVAUNDA | 2899 | §103 | Final Rejection | — | Pending | Feb 01, 2022 |
IP Author helps law firms respond to office actions faster with AI-generated responses, examiner analytics, and prosecution intelligence.
Start Free Trial