Prosecution Insights
Prosecution Insights
9 pending office actions • 1 client • 8 examiners • 5 art units • 0 of 9 (0%) have an AI response strategy ready • 10 patents granted in the last 365 days
Based on the USPTO statutory response window for each pending office action. 9 of the docket's apps have a known mailing date; the rest are excluded from the tile counts.
Every pending office action with a known statutory deadline, placed on a days-until-due axis. Dots left of Today are overdue; the further right, the more runway. Cases that share a deadline window stack vertically. 9 of the docket's apps have a known mailing date.
Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.
| Bucket | Cases |
|---|---|
| §101 only | 1 (11%) |
| §103 only | 5 (56%) |
| §102 only | 3 (33%) |
How the docket's pending cases split across USPTO tech-center bands.
Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.
| Examiner | Apps on this docket | Allow rate | Interview lift |
|---|---|---|---|
| FABIAN JR, ROBERTO | 2 | 71.5% | +26.2% |
| KIM, PETER B | 1 | 82.8% | +9.1% |
| DESAI, NAISHADH N | 1 | 81.8% | +8.9% |
| GAVIA, NYLA EMANI ANN | 1 | 80.8% | +11.8% |
| HENSON, MISCHITA L | 1 | 75.8% | +15.1% |
| UNDERWOOD, JARREAS C | 1 | 78.9% | +22.9% |
| DINH, PAUL | 1 | 89.4% | +4.1% |
| YAZBACK, MAHER | 1 | 74.5% | +24.3% |
Cases in front of an examiner with an allow rate of 80%+ where the difficulty is Easy or Medium. The top 3 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 17993565 | Methods And Systems For Data Driven Parameterization And Measurement Of Semiconductor Structures | DINH, PAUL | 58d overdue |
| 18743118 | Multiple Pass Optical Measurements Of Semiconductor Structures | KIM, PETER B | 8d overdue |
| 18375920 | Magnetically Opposed, Iron Core Linear Motor Based Motion Stages For Semiconductor Wafer Positioning | DESAI, NAISHADH N | 21d |
Multi-statute / §101-driven matters, or cases in front of an examiner with an allow rate under 30%. The top 1 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18229606 | Methods And Systems For Systematic Error Compensation Across A Fleet Of Metrology Systems Based On A Trained Error Evaluation Model | GAVIA, NYLA EMANI ANN | 35d |
Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 6 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 17956643 | Spectroscopic Reflectometry And Ellipsometry Measurements With Electroreflectance Modulation | YAZBACK, MAHER | 42d overdue |
| 18136747 | Full Wafer Measurement Based On A Trained Full Wafer Measurement Model | HENSON, MISCHITA L | 35d overdue |
| 18387015 | Methods And Systems For Measurement Of Semiconductor Structures With Active Tilt Correction | FABIAN JR, ROBERTO | 1d overdue |
| 18136772 | Combined Spectroscopic Reflectometry And Pattern Recognition Based Measurements Of Semiconductor Structures | UNDERWOOD, JARREAS C | 34d |
| 18229606 | Methods And Systems For Systematic Error Compensation Across A Fleet Of Metrology Systems Based On A Trained Error Evaluation Model | GAVIA, NYLA EMANI ANN | 35d |
| 18646553 | Spectroscopic Ellipsometry With Detector Resolved Numerical Aperture For Deep Structure Metrology | FABIAN JR, ROBERTO | 68d |
| Client (Assignee) | Pending OAs |
|---|---|
| KLA | 9 |
| Art Unit | Apps |
|---|---|
| 2877 | 4 |
| 2857 | 2 |
| 2882 | 1 |
| 2834 | 1 |
| 2851 | 1 |
| App # | Title | Client | Examiner | Art Unit | Statutes | Status | Due in | AI | Filed |
|---|---|---|---|---|---|---|---|---|---|
| 18743118 | Multiple Pass Optical Measurements Of Semiconductor Structures | Kla Corporation | KIM, PETER B | 2882 | §103 | Non-Final OA | 8d overdue | Pending | Jun 14, 2024 |
| 18646553 | Spectroscopic Ellipsometry With Detector Resolved Numerical Aperture For Deep Structure Metrology | Kla Corporation | FABIAN JR, ROBERTO | 2877 | §103 | Final Rejection | 68d | Pending | Apr 25, 2024 |
| 18387015 | Methods And Systems For Measurement Of Semiconductor Structures With Active Tilt Correction | Kla Corporation | FABIAN JR, ROBERTO | 2877 | §102 | Non-Final OA | 1d overdue | Pending | Nov 04, 2023 |
| 18375920 | Magnetically Opposed, Iron Core Linear Motor Based Motion Stages For Semiconductor Wafer Positioning | Kla Corporation | DESAI, NAISHADH N | 2834 | §103 | Non-Final OA | 21d | Pending | Oct 02, 2023 |
| 18229606 | Methods And Systems For Systematic Error Compensation Across A Fleet Of Metrology Systems Based On A Trained Error Evaluation Model | Kla Corporation | GAVIA, NYLA EMANI ANN | 2857 | §101 | Non-Final OA | 35d | Pending | Aug 02, 2023 |
| 18136747 | Full Wafer Measurement Based On A Trained Full Wafer Measurement Model | Kla Corporation | HENSON, MISCHITA L | 2857 | §102 | Non-Final OA | 35d overdue | Pending | Apr 19, 2023 |
| 18136772 | Combined Spectroscopic Reflectometry And Pattern Recognition Based Measurements Of Semiconductor Structures | Kla Corporation | UNDERWOOD, JARREAS C | 2877 | §103 | Non-Final OA | 34d | Pending | Apr 19, 2023 |
| 17993565 | Methods And Systems For Data Driven Parameterization And Measurement Of Semiconductor Structures | Kla Corporation | DINH, PAUL | 2851 | §102 | Non-Final OA | 58d overdue | Pending | Nov 23, 2022 |
| 17956643 | Spectroscopic Reflectometry And Ellipsometry Measurements With Electroreflectance Modulation | Kla Corporation | YAZBACK, MAHER | 2877 | §103 | Non-Final OA | 42d overdue | Pending | Sep 29, 2022 |
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