Prosecution Insights
Prosecution Insights
Technology area: Semiconductors, Circuits & Optics
13 pending office actions • 2 clients • 12 examiners • 5 art units • 0 of 13 (0%) have an AI response strategy ready • 4 patents granted in the last 365 days
Spano Law Group (KLA) focuses on the Semiconductors, Circuits & Optics technology area with 217 career applications. The firm has achieved a resolved allowance rate pct of 99.46. Its prosecution history includes an avg office actions per allowance of 2.59.
There are 9 pending office actions currently active. The 99.46 resolved allowance rate pct for its 217 career applications indicates the firm's success in securing allowances. An avg office actions per allowance of 2.59 provides a benchmark for the examination process in its primary technology area.
Based on the USPTO statutory response window for each pending office action. 4 of the docket's apps have a known mailing date; the rest are excluded from the tile counts.
Every pending office action with a known statutory deadline, placed on a days-until-due axis. Dots left of Today are overdue; the further right, the more runway. Cases that share a deadline window stack vertically. 4 of the docket's apps have a known mailing date.
Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.
| Bucket | Cases |
|---|---|
| §101 only | 1 (8%) |
| §101 + other | 1 (8%) |
| §103 only | 5 (38%) |
| §102 only | 1 (8%) |
| Multi-statute (no §101) | 5 (38%) |
How the docket's pending cases split across USPTO tech-center bands.
Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.
| Examiner | Apps on this docket | Allow rate | Interview lift |
|---|---|---|---|
| FABIAN JR, ROBERTO | 2 | 71.6% | +27.2% |
| THOMAS, COURTNEY D | 1 | 89.1% | +9.4% |
| TRAN, JUDY DAO | 1 | 78.6% | +19.5% |
| HANSEN, JONATHAN M | 1 | 79.4% | +11.4% |
| MENDOZA, ALEXANDRIA ARELLANO | 1 | 61.5% | +28.3% |
| AYUB, HINA F | 1 | 84.9% | +17.4% |
| QUIGLEY, KYLE ROBERT | 1 | 53.3% | +34.2% |
| LU, ZHIYU | 1 | 48.9% | +14.1% |
| GAVIA, NYLA EMANI ANN | 1 | 78.8% | +16.7% |
| UNDERWOOD, JARREAS C | 1 | 79.2% | +21.7% |
Cases in front of an examiner with an allow rate of 80%+ where the difficulty is Easy or Medium. The top 1 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 19050479 | High Brightness X-Ray Source For Semiconductor Metrology | THOMAS, COURTNEY D | — |
Multi-statute / §101-driven matters, or cases in front of an examiner with an allow rate under 30%. The top 7 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18387015 | Methods And Systems For Measurement Of Semiconductor Structures With Active Tilt Correction | FABIAN JR, ROBERTO | 1d overdue |
| 18229606 | Methods And Systems For Systematic Error Compensation Across A Fleet Of Metrology Systems Based On A Trained Error Evaluation Model | GAVIA, NYLA EMANI ANN | 35d |
| 18977795 | Methods And Systems For Reflectometry Based Measurements Of Deep, Large Pitch Semiconductor Structures | TRAN, JUDY DAO | — |
| 18887461 | Electrical Performance Prediction Based On Structural Measurements Of Partially Fabricated Semiconductor Devices | MENDOZA, ALEXANDRIA ARELLANO | — |
| 18812890 | Angle Of Incidence And Azimuth Angle Resolved Spectroscopic Ellipsometry For Semiconductor Metrology | AYUB, HINA F | — |
| 18743048 | Measurements Of Semiconductor Structures Based On Data Collected At Prior Process Steps | QUIGLEY, KYLE ROBERT | — |
| 17978844 | Methods And Systems For Monitoring Metrology Fleet Productivity | ERDMAN, CHAD G | — |
Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 8 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18387015 | Methods And Systems For Measurement Of Semiconductor Structures With Active Tilt Correction | FABIAN JR, ROBERTO | 1d overdue |
| 18136772 | Combined Spectroscopic Reflectometry And Pattern Recognition Based Measurements Of Semiconductor Structures | UNDERWOOD, JARREAS C | 34d |
| 18229606 | Methods And Systems For Systematic Error Compensation Across A Fleet Of Metrology Systems Based On A Trained Error Evaluation Model | GAVIA, NYLA EMANI ANN | 35d |
| 18646553 | Spectroscopic Ellipsometry With Detector Resolved Numerical Aperture For Deep Structure Metrology | FABIAN JR, ROBERTO | 68d |
| 18977795 | Methods And Systems For Reflectometry Based Measurements Of Deep, Large Pitch Semiconductor Structures | TRAN, JUDY DAO | — |
| 18972428 | Measurements Of Complex Semiconductor Structures Based On Component Measurement Signals | HANSEN, JONATHAN M | — |
| 18887461 | Electrical Performance Prediction Based On Structural Measurements Of Partially Fabricated Semiconductor Devices | MENDOZA, ALEXANDRIA ARELLANO | — |
| 18812890 | Angle Of Incidence And Azimuth Angle Resolved Spectroscopic Ellipsometry For Semiconductor Metrology | AYUB, HINA F | — |
| Client (Assignee) | Pending OAs |
|---|---|
| KLA | 12 |
| Hamamatsu Photonics | 1 |
| Art Unit | Apps |
|---|---|
| 2877 | 6 |
| 2665 | 1 |
| 2857 | 1 |
| 2116 | 1 |
| 2899 | 1 |
| App # | Title | Client | Examiner | Art Unit | Statutes | Status | Due in | AI | Filed |
|---|---|---|---|---|---|---|---|---|---|
| 19050479 | High Brightness X-Ray Source For Semiconductor Metrology | Hamamatsu Photonics K.K. | THOMAS, COURTNEY D | §103 | Non-Final OA | — | Pending | Feb 11, 2025 | |
| 18977795 | Methods And Systems For Reflectometry Based Measurements Of Deep, Large Pitch Semiconductor Structures | Kla Corporation | TRAN, JUDY DAO | 2877 | §103§112 | Non-Final OA | — | Pending | Dec 11, 2024 |
| 18972428 | Measurements Of Complex Semiconductor Structures Based On Component Measurement Signals | Kla Corporation | HANSEN, JONATHAN M | 2877 | §102 | Non-Final OA | — | Pending | Dec 06, 2024 |
| 18887461 | Electrical Performance Prediction Based On Structural Measurements Of Partially Fabricated Semiconductor Devices | Kla Corporation | MENDOZA, ALEXANDRIA ARELLANO | §102§103 | Non-Final OA | — | Pending | Sep 17, 2024 | |
| 18812890 | Angle Of Incidence And Azimuth Angle Resolved Spectroscopic Ellipsometry For Semiconductor Metrology | Kla Corporation | AYUB, HINA F | 2877 | §102§103 | Non-Final OA | — | Pending | Aug 22, 2024 |
| 18743048 | Measurements Of Semiconductor Structures Based On Data Collected At Prior Process Steps | Kla Corporation | QUIGLEY, KYLE ROBERT | §101§102§103§112 | Non-Final OA | — | Pending | Jun 13, 2024 | |
| 18646553 | Spectroscopic Ellipsometry With Detector Resolved Numerical Aperture For Deep Structure Metrology | Kla Corporation | FABIAN JR, ROBERTO | 2877 | §103 | Final Rejection | 68d | Pending | Apr 25, 2024 |
| 18416113 | X-Ray Scatterometry Based Measurements Of Memory Array Structures Stacked With Complex Logic Structures | Kla Corporation | LU, ZHIYU | 2665 | §103 | Non-Final OA | — | Pending | Jan 18, 2024 |
| 18387015 | Methods And Systems For Measurement Of Semiconductor Structures With Active Tilt Correction | Kla Corporation | FABIAN JR, ROBERTO | 2877 | §102§103 | Non-Final OA | 1d overdue | Pending | Nov 04, 2023 |
| 18229606 | Methods And Systems For Systematic Error Compensation Across A Fleet Of Metrology Systems Based On A Trained Error Evaluation Model | Kla Corporation | GAVIA, NYLA EMANI ANN | 2857 | §101 | Non-Final OA | 35d | Pending | Aug 02, 2023 |
| 18136772 | Combined Spectroscopic Reflectometry And Pattern Recognition Based Measurements Of Semiconductor Structures | Kla Corporation | UNDERWOOD, JARREAS C | 2877 | §103 | Non-Final OA | 34d | Pending | Apr 19, 2023 |
| 17978844 | Methods And Systems For Monitoring Metrology Fleet Productivity | Kla Corporation | ERDMAN, CHAD G | 2116 | §103§112 | Non-Final OA | — | Pending | Nov 01, 2022 |
| 17590116 | Methods And Systems For Accurate Measurement Of Deep Structures Having Distorted Geometry | Kla Corporation | JEFFERSON, QUOVAUNDA | 2899 | §103 | Final Rejection | — | Pending | Feb 01, 2022 |
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