Technology area: Semiconductors, Circuits & Optics
81 pending office actions • 27 art units • 67 examiners • 0 of 81 (0%) have an AI response strategy ready • 113 patents granted in the last 365 days
KLA Corporation manages a substantial portfolio with 80 pending office actions, primarily within the Semiconductors, Circuits & Optics technology area. These actions are spread across 67 distinct examiners, which suggests a highly diversified prosecution strategy. The company is active in 26 distinct art units, indicating that its technical interests span a wide variety of specialized examination groups.
The busiest examiner, SCHNASE, PAUL DANIEL, handles 3 busiest examiner pending office actions. This is a small portion of the 80 total pending office actions, showing that the workload is not heavily concentrated on any single individual. With 67 distinct examiners involved, the company must manage a high volume of varied examiner interactions across its 26 distinct art units to maintain its patent pipeline. This broad distribution across 67 distinct examiners minimizes the impact of any single examiner's tendencies on the overall portfolio. The 26 distinct art units involved further demonstrate the complexity of the company's current filings in the Semiconductors, Circuits & Optics sector.
Based on the USPTO statutory response window for each pending office action. 27 of the docket's apps have a known mailing date; the rest are excluded from the tile counts.
Every pending office action with a known statutory deadline, placed on a days-until-due axis. Dots left of Today are overdue; the further right, the more runway. Cases that share a deadline window stack vertically. 27 of the docket's apps have a known mailing date.
Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.
| Bucket | Cases |
|---|---|
| §101 only | 1 (1%) |
| §101 + other | 6 (7%) |
| §103 only | 41 (51%) |
| §102 only | 3 (4%) |
| §112 only | 1 (1%) |
| Double-patenting + other | 1 (1%) |
| Multi-statute (no §101) | 28 (35%) |
How the docket's pending cases split across USPTO tech-center bands.
Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.
| Examiner | Apps on this docket | Allow rate | Interview lift |
|---|---|---|---|
| SCHNASE, PAUL DANIEL | 3 | 69.0% | +6.1% |
| STOCK JR, GORDON J | 3 | 81.5% | +17.5% |
| HANSEN, JONATHAN M | 3 | 79.4% | +11.4% |
| FABIAN JR, ROBERTO | 3 | 71.6% | +27.2% |
| TRAN, JUDY DAO | 2 | 78.6% | +19.5% |
| KALISZEWSKI, ALINA ROSE | 2 | 84.4% | +23.8% |
| WHITESELL, STEVEN H | 2 | 81.9% | +12.9% |
| UNDERWOOD, JARREAS C | 2 | 79.2% | +21.7% |
| QUIGLEY, KYLE ROBERT | 2 | 53.3% | +34.2% |
| HANEY, NOAH JAMES | 2 | 79.0% | +31.7% |
Cases in front of an examiner with an allow rate of 80%+ where the difficulty is Easy or Medium. The top 2 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18421454 | OVERLAY METROLOGY TARGET FOR DIE-TO-WAFER OVERLAY METROLOGY | WHITESELL, STEVEN H | 13d |
| 18372531 | SYSTEM AND METHOD FOR TRACKING REAL-TIME POSITION FOR SCANNING OVERLAY METROLOGY | STOCK JR, GORDON J | — |
Multi-statute / §101-driven matters, or cases in front of an examiner with an allow rate under 30%. The top 8 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18401569 | CALIBRATION FOR IN-PLANE DISTORTION TOOL-TO-TOOL MATCHING | SCHNASE, PAUL DANIEL | 154d overdue |
| 17762030 | CALIBRATED MEASUREMENT OF OVERLAY ERROR USING SMALL TARGETS | SCHNASE, PAUL DANIEL | 97d overdue |
| 17944009 | METHOD AND SYSTEM FOR CLEANING OPTICAL ELEMENTS IN EUV OPTICAL SYSTEMS | COCCHI, MICHAEL EDWARD | 91d overdue |
| 18467371 | ANGLE RESOLVED REFLECTOMETRY FOR THICK FILMS AND HIGH ASPECT RATIO STRUCTURES | STOCK JR, GORDON J | 72d overdue |
| 18375512 | IMAGING THOUSANDS OF ELECTRON BEAMS DURING WORKPIECE INSPECTION | KALISZEWSKI, ALINA ROSE | 70d overdue |
| 18587703 | SIDE-BY-SIDE OFF-CENTER DIE OVERLAY TARGET | LAPAGE, MICHAEL P | 58d overdue |
| 16935432 | Systems and Methods for MOKE Metrology with Consistent MRAM Die Orientation | SCHINDLER, DAVID M | 24d overdue |
| 18128125 | MULTI-MODE OPTICAL INSPECTION | DULANEY, KATHLEEN YUAN | 10d overdue |
Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 8 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18467371 | ANGLE RESOLVED REFLECTOMETRY FOR THICK FILMS AND HIGH ASPECT RATIO STRUCTURES | STOCK JR, GORDON J | 72d overdue |
| 18375512 | IMAGING THOUSANDS OF ELECTRON BEAMS DURING WORKPIECE INSPECTION | KALISZEWSKI, ALINA ROSE | 70d overdue |
| 18755644 | WAVEPLATE COMPENSATOR DESIGN | UNDERWOOD, JARREAS C | 60d overdue |
| 18387015 | Methods And Systems For Measurement Of Semiconductor Structures With Active Tilt Correction | FABIAN JR, ROBERTO | 1d overdue |
| 18421454 | OVERLAY METROLOGY TARGET FOR DIE-TO-WAFER OVERLAY METROLOGY | WHITESELL, STEVEN H | 13d |
| 18136772 | Combined Spectroscopic Reflectometry And Pattern Recognition Based Measurements Of Semiconductor Structures | UNDERWOOD, JARREAS C | 34d |
| 18343390 | EUV In-Situ Linearity Calibration for TDI Image Sensors Using Test Photomasks | FABIAN JR, ROBERTO | 57d |
| 18646553 | Spectroscopic Ellipsometry With Detector Resolved Numerical Aperture For Deep Structure Metrology | FABIAN JR, ROBERTO | 68d |
| Art Unit | Apps |
|---|---|
| 2877 | 23 |
| 2881 | 5 |
| 2884 | 3 |
| 2878 | 2 |
| 2669 | 2 |
| 1759 | 2 |
| 2857 | 2 |
| 2188 | 2 |
| 2674 | 1 |
| 3745 | 1 |
| App # | Title | Examiner | Art Unit | Statutes | Status | Due in | AI | Filed |
|---|---|---|---|---|---|---|---|---|
| 19051999 | VISION FOUNDATION MODEL FOR MULTIMODE IMAGING | NAH, JONGBONG | 2674 | §103 | Final Rejection | — | Pending | Feb 12, 2025 |
| 19040176 | CALIBRATED MEASUREMENT OF OVERLAY ERROR USING SMALL TARGETS | SCHNASE, PAUL DANIEL | — | §103 | Non-Final OA | — | Pending | Jan 29, 2025 |
| 19018943 | SYSTEM AND METHOD FOR DETERMINING POST BONDING OVERLAY | STOCK JR, GORDON J | — | §101§112Other | Non-Final OA | — | Pending | Jan 13, 2025 |
| 19012641 | DYNAMIC RANGE EXTENSION OF OPTICAL SYSTEMS WITH MULTIPLE LOW INTENSITY BEAMS | YAZBACK, MAHER | — | §102§103§112 | Non-Final OA | — | Pending | Jan 07, 2025 |
| 18999512 | ULTRA-HIGH SENSITIVITY HYBRID INSPECTION WITH FULL WAFER COVERAGE CAPABILITY WITH STEP AND SETTLE STAGE | LYONS, MICHAEL A | 2877 | §103§112 | Non-Final OA | — | Pending | Dec 23, 2024 |
| 18990783 | DIFFRACTIVE EUV SPECTRAL PURITY FILTERS FOR OPTICAL SYSTEMS | AHMED, JAMIL | 2877 | §103 | Non-Final OA | — | Pending | Dec 20, 2024 |
| 18986066 | MULTI-AZIMUTH ILLUMINATION AND IMAGING INSPECTION SYSTEM AND METHOD | HANSEN, JONATHAN M | — | §102§103 | Non-Final OA | — | Pending | Dec 18, 2024 |
| 18977795 | Methods And Systems For Reflectometry Based Measurements Of Deep, Large Pitch Semiconductor Structures | TRAN, JUDY DAO | 2877 | §103§112 | Non-Final OA | — | Pending | Dec 11, 2024 |
| 18974372 | SYSTEM AND METHOD FOR MITIGATING OVERLAY DISTORTION PATTERNS CAUSED BY A WAFER BONDING TOOL | HARTMAN JR, RONALD D | — | §103 | Non-Final OA | — | Pending | Dec 09, 2024 |
| 18972428 | Measurements Of Complex Semiconductor Structures Based On Component Measurement Signals | HANSEN, JONATHAN M | 2877 | §102 | Non-Final OA | — | Pending | Dec 06, 2024 |
| 18970542 | REDUCED FLUCTUATIONS AND INCREASED BRIGHTNESS UNIFORMITY OF LASER SUSTAINED PLASMA SOURCES | LUU, THANH X | 2878 | §103 | Non-Final OA | — | Pending | Dec 05, 2024 |
| 18959278 | ENCODING DESIGN INFORMATION FOR A SPECIMEN FOR RUNTIME USE IN INSPECTION AND OTHER PROCESSES | ISLAM, PROMOTTO TAJRIAN | 2669 | §102§112 | Non-Final OA | — | Pending | Nov 25, 2024 |
| 18941459 | POSITION FEEDBACK SENSOR USING OUT-OF-BAND WAVELENGTHS | TRAN, JUDY DAO | 2877 | §102§103§112 | Non-Final OA | — | Pending | Nov 08, 2024 |
| 18936993 | TRANSISTOR CHANNEL STRESS AND MOBILITY METROLOGY USING MULTIPASS SPECTROSCOPIC ELLIPSOMETRY AND RAMAN JOINT MEASUREMENT | HUANG, DAVID Z | — | §103 | Non-Final OA | — | Pending | Nov 04, 2024 |
| 18930438 | FIELD CURVATURE CORRECTOR FOR USE IN MULTI-ELECTRON-BEAM OPTICAL SYSTEM | STOFFA, WYATT A | 2881 | §103 | Non-Final OA | — | Pending | Oct 29, 2024 |
| 18925931 | THREE-AXIS TUNED MASS DAMPER FOR TURBO MOLECULAR PUMP | HAGHIGHIAN, BEHNOUSH | 3745 | §103 | Non-Final OA | — | Pending | Oct 24, 2024 |
| 18909820 | ULTRA-HIGH SENSITIVITY HYBRID INSPECTION WITH FULL WAFER COVERAGE CAPABILITY | KALISZEWSKI, ALINA ROSE | — | §102§103§112 | Non-Final OA | — | Pending | Oct 08, 2024 |
| 18907563 | SEGMENTATION-BASED CARE AREA SETUP FOR INSPECTION OF A SPECIMEN USING EDGE DETECTION | SILVA-AVINA, EMMANUEL | — | §103§112 | Non-Final OA | — | Pending | Oct 06, 2024 |
| 18902197 | IMAGING OVERLAY TARGETS USING MOIRÉ ELEMENTS AND ROTATIONAL SYMMETRY ARRANGEMENTS | WHITESELL, STEVEN H | 1759 | §101§103§112 | Non-Final OA | — | Pending | Sep 30, 2024 |
| 18896205 | FEATURE PLACEMENT ERROR (FPE) METROLOGY AND CORRECTION | TRAN, VINCENT HUY | — | §103 | Non-Final OA | — | Pending | Sep 25, 2024 |
| 18887461 | Electrical Performance Prediction Based On Structural Measurements Of Partially Fabricated Semiconductor Devices | MENDOZA, ALEXANDRIA ARELLANO | — | §102§103 | Non-Final OA | — | Pending | Sep 17, 2024 |
| 18827828 | CONCENTRICITY OFFSET MEASUREMENT FOR HYBRID BONDING | LEE, BENEDICT E | — | §103 | Non-Final OA | — | Pending | Sep 08, 2024 |
| 18812890 | Angle Of Incidence And Azimuth Angle Resolved Spectroscopic Ellipsometry For Semiconductor Metrology | AYUB, HINA F | 2877 | §102§103 | Non-Final OA | — | Pending | Aug 22, 2024 |
| 18793162 | HEAT EXCHANGER FOR UVO CLEANING SYSTEM | WEILAND, HANS R. | 3763 | §102§103 | Final Rejection | — | Pending | Aug 02, 2024 |
| 18756416 | ENHANCED MODES FOR SCANNING ACOUSTIC MICROSCOPE INSPECTION IN SEMICONDUCTOR INSPECTION | BUTLER, KEVIN C | — | §102§103 | Non-Final OA | — | Pending | Jun 27, 2024 |
| 18756439 | METROLOGY METHOD OF CALIBRATING AND MONITORING RADIATION IN EUV LITHOGRAPHIC SYSTEMS | MALEVIC, DJURA | 2884 | §103 | Non-Final OA | — | Pending | Jun 27, 2024 |
| 18755644 | WAVEPLATE COMPENSATOR DESIGN | UNDERWOOD, JARREAS C | 2877 | §103 | Final Rejection | 60d overdue | Pending | Jun 26, 2024 |
| 18752650 | GROWTH OF STRONTIUM TETRABORATE CRYSTALS | KUNEMUND, ROBERT M | — | §103 | Final Rejection | — | Pending | Jun 24, 2024 |
| 18743048 | Measurements Of Semiconductor Structures Based On Data Collected At Prior Process Steps | QUIGLEY, KYLE ROBERT | — | §101§102§103§112 | Non-Final OA | — | Pending | Jun 13, 2024 |
| 18738393 | SYSTEMS AND METHODS OF SEM INSPECTION USING SELECTIVE SCAN APPROACH | NGUYEN, KIET TUAN | — | §102 | Non-Final OA | — | Pending | Jun 10, 2024 |
| 18735144 | COMBINING DEEP LEARNING MODEL HIDDEN LAYER OUTPUT WITH SPECIMEN-SPECIFIC INPUT FOR DEFECT CLASSIFICATION OR ANOTHER SEMICONDUCTOR APPLICATION | BOYAR, NOAH WILLIAM | 2669 | §103 | Non-Final OA | — | Pending | Jun 05, 2024 |
| 18677487 | DUAL FREQUENCY COMB IMAGING SPECTROSCOPIC ELLIPSOMETER | HANEY, NOAH JAMES | 2877 | §103§112 | Non-Final OA | — | Pending | May 29, 2024 |
| 18671172 | Back-Illuminated Sensor With Boron Layer Deposited Using Plasma Atomic Layer Deposition | AMER, MOUNIR S | — | §102Other | Non-Final OA | — | Pending | May 22, 2024 |
| 18668112 | ELECTRON BEAM METROLOGY HAVING A SOURCE ENERGY SPREAD WITH FILTERED TAILS | SMITH, DAVID E | — | §103 | Non-Final OA | — | Pending | May 17, 2024 |
| 18652438 | DYNAMIC FREEFORM OPTICS FOR LITHOGRAPHY ILLUMINATION BEAM SHAPING | KIM, PETER B | 2882 | §103§112 | Non-Final OA | — | Pending | May 01, 2024 |
| 18646553 | Spectroscopic Ellipsometry With Detector Resolved Numerical Aperture For Deep Structure Metrology | FABIAN JR, ROBERTO | 2877 | §103 | Final Rejection | 68d | Pending | Apr 25, 2024 |
| 18630417 | FOCUS POSITION MEASUREMENT WHILE SCANNING | HANEY, NOAH JAMES | — | §102§103 | Non-Final OA | — | Pending | Apr 09, 2024 |
| 18624444 | PARALLEL SCANNING OVERLAY METROLOGY WITH OPTICAL META-SURFACES | PEREZ-GUZMAN, CARLOS GABRIEL | 2877 | §103 | Non-Final OA | 22d | Pending | Apr 02, 2024 |
| 18613874 | SPECTRA DELTA METROLOGY | DAVIS, CYNTHIA L | — | §101§103 | Non-Final OA | — | Pending | Mar 22, 2024 |
| 18611299 | FLUORESCENCE MODE FOR WORKPIECE INSPECTION | COOK, JONATHON | 2877 | §103 | Final Rejection | 44d overdue | Pending | Mar 20, 2024 |
| 18603002 | DEEP LEARNING MODEL DIAGNOSTICS TOOLS USING STACKED IMAGES | DHOOGE, DEVIN J | 2677 | §103 | Non-Final OA | — | Pending | Mar 12, 2024 |
| 18597581 | METHOD AND SYSTEM FOR AUTOMATIC RETRAINING OF MACHINE LEARNING MODELS FOR METROLOGY METRIC ESTIMATION | MOORE, URIAH VENDELL | — | §103§112 | Non-Final OA | — | Pending | Mar 06, 2024 |
| 18594707 | SYSTEM AND METHOD TO REDUCE MEASUREMENT ERROR IN INTERFEROMETRY-BASED METROLOGY | HANSEN, JONATHAN M | 2877 | §103 | Final Rejection | — | Pending | Mar 04, 2024 |
| 18594991 | METHOD AND SYSTEM FOR BONDING HIGH FLUENCE OPTICS TO OPTOMECHANICAL ASSEMBLIES | STONER, KILEY SHAWN | 1735 | §103 | Final Rejection | 16d overdue | Pending | Mar 04, 2024 |
| 18587703 | SIDE-BY-SIDE OFF-CENTER DIE OVERLAY TARGET | LAPAGE, MICHAEL P | 2877 | §102§103 | Final Rejection | 58d overdue | Pending | Feb 26, 2024 |
| 18438165 | VUV LASER-SUSTAINED PLASMA LIGHT SOURCE WITH LONG-PASS FILTERING | EINHORN, MICA JILLIAN | 2881 | §102§103§112DP | Non-Final OA | — | Pending | Feb 09, 2024 |
| 18438122 | METROLOGY WITH PARALLEL SUBSYSTEMS AND MUELLER SIGNALS TRAINING | BYCER, ERIC J | 4100 | §103 | Non-Final OA | — | Pending | Feb 09, 2024 |
| 18434139 | SUBSTRATE POSITION MONITORING DEVICES | CZEKAJ, DAVID J | 2487 | §102§103 | Non-Final OA | — | Pending | Feb 06, 2024 |
| 18421454 | OVERLAY METROLOGY TARGET FOR DIE-TO-WAFER OVERLAY METROLOGY | WHITESELL, STEVEN H | 1759 | §103 | Non-Final OA | 13d | Pending | Jan 24, 2024 |
| 18416113 | X-Ray Scatterometry Based Measurements Of Memory Array Structures Stacked With Complex Logic Structures | LU, ZHIYU | 2665 | §103 | Non-Final OA | — | Pending | Jan 18, 2024 |
| 18404530 | IMAGE SENSORS WITH A TUNABLE FLOATING DIFFUSION STRUCTURE | TRICE III, WILLIAM CLARENCE | 2893 | §102§103 | Final Rejection | — | Pending | Jan 04, 2024 |
| 18401569 | CALIBRATION FOR IN-PLANE DISTORTION TOOL-TO-TOOL MATCHING | SCHNASE, PAUL DANIEL | 2877 | §101§102§103 | Final Rejection | 154d overdue | Pending | Dec 31, 2023 |
| 18387015 | Methods And Systems For Measurement Of Semiconductor Structures With Active Tilt Correction | FABIAN JR, ROBERTO | 2877 | §102§103 | Non-Final OA | 1d overdue | Pending | Nov 04, 2023 |
| 18383612 | MASSIVE MEASUREMENT SAMPLING USING MULTIPLE CHUCKS AND OPTICAL COLUMNS | SULLIVAN, CALEEN O | — | §103 | Non-Final OA | — | Pending | Oct 25, 2023 |
| 18375512 | IMAGING THOUSANDS OF ELECTRON BEAMS DURING WORKPIECE INSPECTION | KALISZEWSKI, ALINA ROSE | 2881 | §103§112 | Final Rejection | 70d overdue | Pending | Sep 30, 2023 |
| 18372531 | SYSTEM AND METHOD FOR TRACKING REAL-TIME POSITION FOR SCANNING OVERLAY METROLOGY | STOCK JR, GORDON J | 2877 | §103 | Non-Final OA | — | Pending | Sep 25, 2023 |
| 18368242 | FRICTIONLESS DESIGN OF HIGH-PRESSURE RECIRCULATION THERMO-PUMP | BRANDT, DAVID NELSON | 3783 | §112 | Non-Final OA | — | Pending | Sep 14, 2023 |
| 18467371 | ANGLE RESOLVED REFLECTOMETRY FOR THICK FILMS AND HIGH ASPECT RATIO STRUCTURES | STOCK JR, GORDON J | 2877 | §102§103 | Non-Final OA | 72d overdue | Pending | Sep 14, 2023 |
| 18234773 | MULTI-PITCH GRID OVERLAY TARGET FOR SCANNING OVERLAY METROLOGY | XING, CHRISTINA ILONA | 2877 | §103 | Non-Final OA | 10d overdue | Pending | Aug 16, 2023 |
| 18229606 | Methods And Systems For Systematic Error Compensation Across A Fleet Of Metrology Systems Based On A Trained Error Evaluation Model | GAVIA, NYLA EMANI ANN | 2857 | §101 | Non-Final OA | 35d | Pending | Aug 02, 2023 |
| 18228643 | PUPIL FILTER WITH SPATIALLY-VARYING TRANSMISSION | ARTMAN, THOMAS R | 2884 | §103 | Non-Final OA | 34d | Pending | Jul 31, 2023 |
| 18358841 | PHOTOLUMINESCENCE FOR SEMICONDUCTOR YIELD RELATED APPLICATIONS | TANINGCO, MARCUS H | 2884 | §103 | Non-Final OA | — | Pending | Jul 25, 2023 |
| 18343390 | EUV In-Situ Linearity Calibration for TDI Image Sensors Using Test Photomasks | FABIAN JR, ROBERTO | 2877 | §102§103 | Final Rejection | 57d | Pending | Jun 28, 2023 |
| 18195115 | SYSTEM AND METHOD FOR IMPROVING MEASUREMENT PERFORMANCE OF CHARACTERIZATION SYSTEMS | TSAI, JAMES T | 2147 | §103 | Non-Final OA | — | Pending | May 09, 2023 |
| 18136772 | Combined Spectroscopic Reflectometry And Pattern Recognition Based Measurements Of Semiconductor Structures | UNDERWOOD, JARREAS C | 2877 | §103 | Non-Final OA | 34d | Pending | Apr 19, 2023 |
| 18128125 | MULTI-MODE OPTICAL INSPECTION | DULANEY, KATHLEEN YUAN | 2666 | §103§112 | Final Rejection | 10d overdue | Pending | Mar 29, 2023 |
| 18116187 | INTERFACE-BASED THIN FILM METROLOGY USING SECOND HARMONIC GENERATION | GARBER, ERIN R | 2878 | §103 | Final Rejection | 140d overdue | Pending | Mar 01, 2023 |
| 17982472 | PLASMA HYPERMODEL INTEGRATED WITH FEATURE-SCALE PROFILE MODEL FOR ACCELERATED ETCH PROCESS DEVELOPMENT | KIM, EUNHEE | 2188 | §103 | Final Rejection | 37d overdue | Pending | Nov 07, 2022 |
| 17978844 | Methods And Systems For Monitoring Metrology Fleet Productivity | ERDMAN, CHAD G | 2116 | §103§112 | Non-Final OA | — | Pending | Nov 01, 2022 |
| 17944009 | METHOD AND SYSTEM FOR CLEANING OPTICAL ELEMENTS IN EUV OPTICAL SYSTEMS | COCCHI, MICHAEL EDWARD | 2188 | §101§103 | Final Rejection | 91d overdue | Pending | Sep 13, 2022 |
| 17887078 | SYSTEM AND METHOD FOR FEATURE SIGNAL ENHANCEMENT USING A SELECTIVELY BONDED PHOTOLUMINESCENT MATERIAL | PHILLIPS, RUFUS L | 2877 | §103§112 | Non-Final OA | 4d overdue | Pending | Aug 12, 2022 |
| 17713017 | METHOD AND SYSTEM FOR MIXED MODE WAFER INSPECTION | BALI, VIKKRAM | 2663 | §103 | Non-Final OA | 19d | Pending | Apr 04, 2022 |
| 17762030 | CALIBRATED MEASUREMENT OF OVERLAY ERROR USING SMALL TARGETS | SCHNASE, PAUL DANIEL | 2877 | §102§112 | Final Rejection | 97d overdue | Pending | Mar 18, 2022 |
| 17696636 | SYSTEM AND METHOD FOR ION-ASSISTED DEPOSITION OF OPTICAL COATINGS | OTT, PATRICK S | 1794 | §103 | Final Rejection | 44d overdue | Pending | Mar 16, 2022 |
| 17591569 | COMBINING FOCUSED ION BEAM MILLING AND SCANNING ELECTRON MICROSCOPE IMAGING | GOURLIE, LAURA ELOISE | 2881 | §103 | Final Rejection | 85d overdue | Pending | Feb 02, 2022 |
| 17590116 | Methods And Systems For Accurate Measurement Of Deep Structures Having Distorted Geometry | JEFFERSON, QUOVAUNDA | 2899 | §103 | Final Rejection | — | Pending | Feb 01, 2022 |
| 17576528 | STRONTIUM TETRABORATE AS OPTICAL GLASS MATERIAL | CHOWDHURY, TARIFUR RASHID | 2877 | §103 | Final Rejection | — | Pending | Jan 14, 2022 |
| 17446161 | SYSTEMS AND METHODS FOR ROTATIONAL CALIBRATION OF METROLOGY TOOLS | QUIGLEY, KYLE ROBERT | 2857 | §103 | Final Rejection | — | Pending | Aug 26, 2021 |
| 17099476 | MULTI-COLUMN SCANNING ELECTRON MICROSCOPY SYSTEM | LOGIE, MICHAEL J | 2881 | §103 | Non-Final OA | — | Pending | Nov 16, 2020 |
| 16935432 | Systems and Methods for MOKE Metrology with Consistent MRAM Die Orientation | SCHINDLER, DAVID M | 2858 | §102§103§112 | Non-Final OA | 24d overdue | Pending | Jul 22, 2020 |
| 17554454 | Machine Learning in Metrology Measurements | STANDKE, ADAM C | 2129 | §103 | Non-Final OA | 141d overdue | Pending | Dec 17, 2021 |
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