5 pending office actions • 4 art units • 5 examiners • 0 of 5 (0%) have an AI response strategy ready • 12 patents granted in the last 365 days
Based on the USPTO statutory response window for each pending office action. 5 of the docket's apps have a known mailing date; the rest are excluded from the tile counts.
Every pending office action with a known statutory deadline, placed on a days-until-due axis. Dots left of Today are overdue; the further right, the more runway. Cases that share a deadline window stack vertically. 5 of the docket's apps have a known mailing date.
Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.
| Bucket | Cases |
|---|---|
| §103 only | 4 (80%) |
| No statute on record | 1 (20%) |
How the docket's pending cases split across USPTO tech-center bands.
Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.
| Examiner | Apps on this docket | Allow rate | Interview lift |
|---|---|---|---|
| BRASFIELD, QUINTON A | 1 | 72.0% | +17.5% |
| KACKAR, RAM N | 1 | 39.4% | +59.0% |
| DUCLAIR, STEPHANIE P. | 1 | 71.5% | +19.8% |
| BRAYTON, JOHN JOSEPH | 1 | 47.9% | +22.2% |
| OTT, PATRICK S | 1 | 66.5% | +20.8% |
Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 5 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18213865 | Control of Trench Profile Angle in SiC Semiconductors | DUCLAIR, STEPHANIE P. | 98d overdue |
| 18387697 | ANTI-STICTION LAYER DEPOSITION | BRASFIELD, QUINTON A | 49d overdue |
| 17976798 | PVD Method and Apparatus | BRAYTON, JOHN JOSEPH | 38d overdue |
| 17461928 | Deposition Method | OTT, PATRICK S | 31d overdue |
| 18375238 | Method and Apparatus for Plasma Etching Dielectric Substrates | KACKAR, RAM N | 30d overdue |
| Art Unit | Apps |
|---|---|
| 1794 | 2 |
| 2814 | 1 |
| 1716 | 1 |
| 1713 | 1 |
| App # | Title | Examiner | Art Unit | Statutes | Status | Due in | AI | Filed |
|---|---|---|---|---|---|---|---|---|
| 18387697 | ANTI-STICTION LAYER DEPOSITION | BRASFIELD, QUINTON A | 2814 | §103 | Non-Final OA | 49d overdue | Pending | Nov 07, 2023 |
| 18375238 | Method and Apparatus for Plasma Etching Dielectric Substrates | KACKAR, RAM N | 1716 | §103 | Non-Final OA | 30d overdue | Pending | Sep 29, 2023 |
| 18213865 | Control of Trench Profile Angle in SiC Semiconductors | DUCLAIR, STEPHANIE P. | 1713 | §103 | Non-Final OA | 98d overdue | Pending | Jun 25, 2023 |
| 17976798 | PVD Method and Apparatus | BRAYTON, JOHN JOSEPH | 1794 | Other | Non-Final OA | 38d overdue | Pending | Oct 29, 2022 |
| 17461928 | Deposition Method | OTT, PATRICK S | 1794 | §103 | Non-Final OA | 31d overdue | Pending | Aug 30, 2021 |
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