Prosecution Insights
Prosecution Insights
10 pending office actions • 8 art units • 10 examiners • 0 of 10 (0%) have an AI response strategy ready • 12 patents granted in the last 365 days
Based on the USPTO statutory response window for each pending office action. 1 of the docket's apps have a known mailing date; the rest are excluded from the tile counts.
Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.
| Bucket | Cases |
|---|---|
| §103 only | 5 (50%) |
| §112 only | 1 (10%) |
| Multi-statute (no §101) | 4 (40%) |
How the docket's pending cases split across USPTO tech-center bands.
Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.
| Examiner | Apps on this docket | Allow rate | Interview lift |
|---|---|---|---|
| WALTERS JR, ROBERT S | 1 | 51.5% | +50.5% |
| CARRILLO, BIBI SHARIDAN | 1 | 62.1% | -16.2% |
| LOWE, MICHAEL S | 1 | 66.8% | +19.9% |
| TAYLOR, EARL N | 1 | 88.0% | +6.4% |
| BENNETT, CHARLEE | 1 | 58.2% | +35.7% |
| ALANKO, ANITA KAREN | 1 | 69.7% | -17.3% |
| SWEELY, KURT D | 1 | 52.9% | +35.0% |
| DUCLAIR, STEPHANIE P. | 1 | 71.8% | +19.9% |
| KIELIN, ERIK J | 1 | 67.2% | +4.5% |
| SHAMSUZZAMAN, MOHAMMED | 1 | 81.0% | +55.2% |
Cases in front of an examiner with an allow rate of 80%+ where the difficulty is Easy or Medium. The top 1 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 17098404 | Method, Substrate and Apparatus | SHAMSUZZAMAN, MOHAMMED | — |
Multi-statute / §101-driven matters, or cases in front of an examiner with an allow rate under 30%. The top 4 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18752592 | METHOD OF CLEANING A PLASMA PROCESSING DEVICE | CARRILLO, BIBI SHARIDAN | — |
| 18607494 | PECVD Method and Apparatus | TAYLOR, EARL N | — |
| 18396397 | SUPPORT | BENNETT, CHARLEE | — |
| 17315342 | TEMPORARY PASSIVATION LAYER ON A SUBSTRATE | KIELIN, ERIK J | — |
Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 6 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18213865 | Control of Trench Profile Angle in SiC Semiconductors | DUCLAIR, STEPHANIE P. | 98d overdue |
| 19233467 | A METHOD OF PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION | WALTERS JR, ROBERT S | — |
| 18607498 | Substrate Processing System | LOWE, MICHAEL S | — |
| 18396397 | SUPPORT | BENNETT, CHARLEE | — |
| 18374626 | Apparatus and Method for Reducing Substrate Thickness and Surface Roughness | SWEELY, KURT D | — |
| 17098404 | Method, Substrate and Apparatus | SHAMSUZZAMAN, MOHAMMED | — |
| Art Unit | Apps |
|---|---|
| 1718 | 2 |
| 1713 | 2 |
| 1715 | 1 |
| 1711 | 1 |
| 3652 | 1 |
| 4100 | 1 |
| 2814 | 1 |
| 2897 | 1 |
| App # | Title | Examiner | Art Unit | Statutes | Status | Due in | AI | Filed |
|---|---|---|---|---|---|---|---|---|
| 19233467 | A METHOD OF PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION | WALTERS JR, ROBERT S | 1715 | §103 | Non-Final OA | — | Pending | Jun 10, 2025 |
| 18752592 | METHOD OF CLEANING A PLASMA PROCESSING DEVICE | CARRILLO, BIBI SHARIDAN | 1711 | §102§103§112 | Non-Final OA | — | Pending | Jun 24, 2024 |
| 18607498 | Substrate Processing System | LOWE, MICHAEL S | 3652 | §103 | Non-Final OA | — | Pending | Mar 17, 2024 |
| 18607494 | PECVD Method and Apparatus | TAYLOR, EARL N | 4100 | §102§103§112 | Non-Final OA | — | Pending | Mar 17, 2024 |
| 18396397 | SUPPORT | BENNETT, CHARLEE | 1718 | §103§112 | Final Rejection | — | Pending | Dec 26, 2023 |
| 18393632 | Plasma Etching Method and Apparatus | ALANKO, ANITA KAREN | 1713 | §112 | Non-Final OA | — | Pending | Dec 21, 2023 |
| 18374626 | Apparatus and Method for Reducing Substrate Thickness and Surface Roughness | SWEELY, KURT D | 1718 | §103 | Final Rejection | — | Pending | Sep 28, 2023 |
| 18213865 | Control of Trench Profile Angle in SiC Semiconductors | DUCLAIR, STEPHANIE P. | 1713 | §103 | Final Rejection | 98d overdue | Pending | Jun 25, 2023 |
| 17315342 | TEMPORARY PASSIVATION LAYER ON A SUBSTRATE | KIELIN, ERIK J | 2814 | §103§112 | Non-Final OA | — | Pending | May 09, 2021 |
| 17098404 | Method, Substrate and Apparatus | SHAMSUZZAMAN, MOHAMMED | 2897 | §103Other | Final Rejection | — | Pending | Nov 15, 2020 |
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