Prosecution Insights
Last updated: August 18, 2026

Examiner: CHA, GRACE YEH-EUN SAET

Tech Center 2800 • Art Units: 2811 2897

This examiner grants 98% of resolved cases

Performance Statistics

97.5%
Allow Rate
+29.5% vs TC avg
68
Total Applications
+3.6%
Interview Lift
1268
Avg Prosecution Days
Based on 40 resolved cases, 2023–2026

Rejection Statute Breakdown

0%
§101 Eligibility
25.8%
§102 Novelty
66.5%
§103 Obviousness
7.7%
§112 Clarity

Currently Pending Office Actions

App #TitleStatusAssignee
18651292 DISPLAY PANEL, DRIVING METHOD AND DISPLAY APPARATUS Non-Final OA BOE Technology Group Co., Ltd.
18029675 Display Substrate, Manufacturing Method Therefor, and Display Device Non-Final OA BOE Technology Group Co., Ltd.
18028944 DRIVE BACKPLANE HAVING AN AUXILIARY REPAIR ELECTRODE AND DISPLAY PANEL Final Rejection BOE Technology Group Co., Ltd.
18004332 DISPLAY PANEL, MANUFACTURING METHOD THEREOF AND DISPLAY DEVICE Final Rejection BOE TECHNOLOGY GROUP CO., LTD.
18517477 DISPLAY DEVICE AND TILING DISPLAY APPARATUS INCLUDING THE DISPLAY DEVICE Final Rejection LG Display Co., Ltd.
18188286 DISPLAY PANEL AND DISPLAY DEVICE Non-Final OA LG Display Co., Ltd.
17854508 ORGANIC LIGHT EMITTING DISPLAY APPARATUS Non-Final OA LG Display Co., Ltd.
17855036 Thin-Film Transistor Array Substrate and Display Device Non-Final OA LG Display Co., Ltd.
18099676 DISPLAY DEVICE IN WHICH FIRST AND SECOND BARS SEPARATED BY SLIT OVERLAP BENDABLE PORTION Non-Final OA Samsung Display Co., Ltd.
17944313 DISPLAY DEVICE INCLUDING LAYERS HAVING PARTICULAR REFRACTIVE INDEXES Non-Final OA Samsung Display Co., LTD.
17902540 DISPLAY PANEL AND METHOD OF MANUFACTURING THE SAME Final Rejection Samsung Display Co., Ltd.
18464508 INTEGRATED CIRCUIT, SYSTEM AND METHOD OF FORMING THE SAME Non-Final OA TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
18520414 SEMICONDUCTOR PACKAGE AND METHOD FOR FORMING THE SAME Non-Final OA Taiwan Semiconductor Manufacturing Co., Ltd.
18534250 ATOMIC LAYER DEPOSITION DEVICE USING MULTIPLE PULSES TO FILL GAP OF SEMICONDUCTOR STRUCTURE WITH HIGH ASPECT RATIO AND ATOMIC LAYER DEPOSITION METHOD USING THE SAME Non-Final OA RESEARCH & BUSINESS FOUNDATION SUNGKYUNKWAN UNIVERSITY
18062029 STACKED TRANSISTORS HAVING BOTTOM CONTACT WITH LARGER SILICIDE Non-Final OA INTERNATIONAL BUSINESS MACHINES CORPORATION
18474158 THERMALLY AWARE STACKING TOPOLOGY Non-Final OA Xilinx, Inc.

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