Technology area: Chemistry & Materials
25 pending office actions • 17 art units • 23 examiners • 0 of 25 (0%) have an AI response strategy ready • 26 patents granted in the last 365 days
Versum Materials US LLC has 26 pending office actions in Chemistry & Materials. The docket spans 23 distinct examiners and 17 distinct art units, combining broad examiner distribution with recurring assignments at both levels. That structure supports portfolio-wide process controls, while the repeated settings may help counsel identify examination themes affecting related technologies.
DEO, DUY VU NGUYEN is the busiest examiner, with 2 pending matters. The limited concentration means that no single examiner-specific approach will cover the portfolio. Counsel should coordinate claim terminology, disclosure positions, and prior-art responses centrally, then tailor each filing to its assigned examiner and art unit.
Based on the USPTO statutory response window for each pending office action. 10 of the docket's apps have a known mailing date; the rest are excluded from the tile counts.
Every pending office action with a known statutory deadline, placed on a days-until-due axis. Dots left of Today are overdue; the further right, the more runway. Cases that share a deadline window stack vertically. 10 of the docket's apps have a known mailing date.
Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.
| Bucket | Cases |
|---|---|
| §101 + other | 1 (4%) |
| §103 only | 11 (44%) |
| §102 only | 2 (8%) |
| §112 only | 1 (4%) |
| Multi-statute (no §101) | 9 (36%) |
| No statute on record | 1 (4%) |
How the docket's pending cases split across USPTO tech-center bands.
Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.
| Examiner | Apps on this docket | Allow rate | Interview lift |
|---|---|---|---|
| DEO, DUY VU NGUYEN | 2 | 82.5% | +7.3% |
| MCCLURE, CHRISTINA D | 2 | 29.9% | +33.1% |
| MILLER, MICHAEL G | 1 | 52.3% | +15.6% |
| WEDDLE, ALEXANDER MARION | 1 | 63.7% | +25.5% |
| WALTERS JR, ROBERT S | 1 | 51.6% | +50.4% |
| DAGENAIS, KRISTEN A | 1 | 64.0% | +19.8% |
| MOORE, MARGARET G | 1 | 68.1% | +15.6% |
| NASSIRI MOTLAGH, ANITA | 1 | 55.9% | +24.3% |
| MOORE, KARLA A | 1 | 43.1% | +13.6% |
| PAIK, SANG YEOP | 1 | 65.5% | +16.3% |
Multi-statute / §101-driven matters, or cases in front of an examiner with an allow rate under 30%. The top 8 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18548846 | SELECTIVE DEPOSITION OF SILICON DIELECTRIC FILM | NGUYEN, SOPHIA T | 104d overdue |
| 17621198 | COMPOSITIONS AND METHODS USING SAME FOR DEPOSITION OF SILICON-CONTAINING FILM | MCCLURE, CHRISTINA D | 4d overdue |
| 18856877 | BORON-CONTAINING PRECURSORS FOR THE ALD DEPOSITION OF BORON NITRIDE FILMS | WALTERS JR, ROBERT S | 33d |
| 18282709 | SHARED DATA INDUCED QUALITY CONTROL SYSTEM FOR MATERIALS | CHIUSANO, ANDREW TSUTOMU | 48d |
| 18842609 | Stable Chemical Mechanical Planarization Polishing Compositions And Methods For High Rate Silicon Oxide Removal | DEO, DUY VU NGUYEN | — |
| 18704551 | Homoleptic Bismuth Precursors For Depositing Bismuth Oxide Containing Thin Films | DAGENAIS, KRISTEN A | — |
| 18582396 | HALIDOSILANE COMPOUNDS AND COMPOSITIONS AND PROCESSES FOR DEPOSITING SILICON-CONTAINING FILMS USING SAME | MOORE, KARLA A | — |
| 18293543 | MULTIPLE ZONE HEATED ENCLOSURE FOR OPTIMIZED SUBLIMATION OF SOLID-PHASE PRECURSORS | PAIK, SANG YEOP | — |
Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 8 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18585563 | ULTRA-HIGH PURITY TUNGSTEN CHLORIDES | NASSIRI MOTLAGH, ANITA | 156d overdue |
| 18703240 | SILANOLS AND SILANEDIOLS | MOORE, MARGARET G | 58d overdue |
| 18865652 | COMPOSITIONS AND METHODS USING SAME FOR CARBON DOPED SILICON CONTAINING FILMS | WEDDLE, ALEXANDER MARION | 31d overdue |
| 17621198 | COMPOSITIONS AND METHODS USING SAME FOR DEPOSITION OF SILICON-CONTAINING FILM | MCCLURE, CHRISTINA D | 4d overdue |
| 18856877 | BORON-CONTAINING PRECURSORS FOR THE ALD DEPOSITION OF BORON NITRIDE FILMS | WALTERS JR, ROBERT S | 33d |
| 19226057 | COMPOSITIONS AND METHODS USING SAME FOR THERMAL DEPOSITION SILICON-CONTAINING FILMS | MILLER, MICHAEL G | — |
| 18704551 | Homoleptic Bismuth Precursors For Depositing Bismuth Oxide Containing Thin Films | DAGENAIS, KRISTEN A | — |
| 18582396 | HALIDOSILANE COMPOUNDS AND COMPOSITIONS AND PROCESSES FOR DEPOSITING SILICON-CONTAINING FILMS USING SAME | MOORE, KARLA A | — |
| Art Unit | Apps |
|---|---|
| 1712 | 3 |
| 1717 | 3 |
| 1713 | 3 |
| 1718 | 3 |
| 1765 | 1 |
| 1734 | 1 |
| 1716 | 1 |
| 3761 | 1 |
| 1736 | 1 |
| 1732 | 1 |
| App # | Title | Examiner | Art Unit | Statutes | Status | Due in | AI | Filed |
|---|---|---|---|---|---|---|---|---|
| 19226057 | COMPOSITIONS AND METHODS USING SAME FOR THERMAL DEPOSITION SILICON-CONTAINING FILMS | MILLER, MICHAEL G | 1712 | §102 | Non-Final OA | — | Pending | Jun 02, 2025 |
| 18865652 | COMPOSITIONS AND METHODS USING SAME FOR CARBON DOPED SILICON CONTAINING FILMS | WEDDLE, ALEXANDER MARION | 1712 | §103 | Final Rejection | 31d overdue | Pending | Nov 13, 2024 |
| 18856877 | BORON-CONTAINING PRECURSORS FOR THE ALD DEPOSITION OF BORON NITRIDE FILMS | WALTERS JR, ROBERT S | 1717 | §102§103 | Final Rejection | 33d | Pending | Oct 14, 2024 |
| 18842609 | Stable Chemical Mechanical Planarization Polishing Compositions And Methods For High Rate Silicon Oxide Removal | DEO, DUY VU NGUYEN | 1713 | §103§112 | Non-Final OA | — | Pending | Aug 29, 2024 |
| 18713260 | Tungsten Chemical Mechanical Polishing Slurries | DEO, DUY VU NGUYEN | 1713 | — | Non-Final OA | — | Pending | May 24, 2024 |
| 18704551 | Homoleptic Bismuth Precursors For Depositing Bismuth Oxide Containing Thin Films | DAGENAIS, KRISTEN A | 1717 | §102§103 | Non-Final OA | — | Pending | Apr 25, 2024 |
| 18703240 | SILANOLS AND SILANEDIOLS | MOORE, MARGARET G | 1765 | §103 | Final Rejection | 58d overdue | Pending | Apr 19, 2024 |
| 18585563 | ULTRA-HIGH PURITY TUNGSTEN CHLORIDES | NASSIRI MOTLAGH, ANITA | 1734 | §103 | Final Rejection | 156d overdue | Pending | Feb 23, 2024 |
| 18582396 | HALIDOSILANE COMPOUNDS AND COMPOSITIONS AND PROCESSES FOR DEPOSITING SILICON-CONTAINING FILMS USING SAME | MOORE, KARLA A | 1716 | §103§112 | Non-Final OA | — | Pending | Feb 20, 2024 |
| 18293543 | MULTIPLE ZONE HEATED ENCLOSURE FOR OPTIMIZED SUBLIMATION OF SOLID-PHASE PRECURSORS | PAIK, SANG YEOP | 3761 | §103§112 | Non-Final OA | — | Pending | Jan 30, 2024 |
| 18565326 | Ultra-Pure Molybdenum Dichloride Dioxide, Packaged Forms Thereof And Methods Of Preparing The Same | NGUYEN, CAM N | 1736 | §102 | Non-Final OA | — | Pending | Nov 29, 2023 |
| 18515031 | COMPOSITIONS AND METHODS FOR DEPOSITING SILICON-CONTAINING FILMS | COHEN, STEFANIE J | 1732 | §103 | Non-Final OA | — | Pending | Nov 20, 2023 |
| 18561833 | New Precursors For Depositing Films With High Elastic Modulus | HERNANDEZ-KENNEY, JOSE | 1717 | §103§112 | Final Rejection | — | Pending | Nov 17, 2023 |
| 18556199 | Compositions For Removing A Photoresist From A Substrate And Uses Thereof | TRAYWICK, ANDREW PRESTON | 1737 | §103§112 | Non-Final OA | — | Pending | Oct 19, 2023 |
| 18282709 | SHARED DATA INDUCED QUALITY CONTROL SYSTEM FOR MATERIALS | CHIUSANO, ANDREW TSUTOMU | 2144 | §101§103 | Final Rejection | 48d | Pending | Sep 18, 2023 |
| 18548846 | SELECTIVE DEPOSITION OF SILICON DIELECTRIC FILM | NGUYEN, SOPHIA T | 2893 | §103§112 | Final Rejection | 104d overdue | Pending | Sep 01, 2023 |
| 18333759 | STABLE ALKENYL OR ALKYNYL-CONTAINING ORGANOSILICON PRECURSOR COMPOSITIONS | PAGANO, ALEXANDER R | 1692 | §102§103 | Non-Final OA | — | Pending | Jun 13, 2023 |
| 18255530 | Chemical Mechanical Planarization (CMP) For Copper And Through-Silicon Via (TSV) | LU, JIONG-PING | 1713 | §103 | Final Rejection | — | Pending | Jun 01, 2023 |
| 18006659 | CYCLOSILOXANES AND FILMS MADE THEREWITH | MURATA, AUSTIN | 1712 | §103 | Non-Final OA | — | Pending | Jan 24, 2023 |
| 17754038 | CHEMICAL MECHANICAL PLANARIZATION POLISHING COMPOSITIONS FOR IMPROVING WITH-IN DIE NON-UNIFORMITIES | KNUDSON, BRAD ALLAN | 2817 | §103 | Final Rejection | 97d overdue | Pending | Mar 22, 2022 |
| 17642185 | MONOALKOXYSILANES AND DENSE ORGANOSILICA FILMS MADE THEREFROM | MCCLURE, CHRISTINA D | 1718 | §103 | Final Rejection | — | Pending | Mar 10, 2022 |
| 17584120 | Methods For Making Silicon Containing Films That Have High Carbon Content | MAYY, MOHAMMAD | 1718 | §103 | Final Rejection | — | Pending | Jan 25, 2022 |
| 17621198 | COMPOSITIONS AND METHODS USING SAME FOR DEPOSITION OF SILICON-CONTAINING FILM | MCCLURE, CHRISTINA D | 1718 | §103 | Final Rejection | 4d overdue | Pending | Dec 20, 2021 |
| 17281898 | METHODS FOR MAKING SILICON AND NITROGEN CONTAINING FILMS | KIM, JAY C | 2815 | §112 | Non-Final OA | 52d overdue | Pending | Mar 31, 2021 |
| 16388225 | Compositions and Methods Using Same for Deposition of Silicon-Containing Films | WILCZEWSKI, MARY A | 2898 | §103 | Non-Final OA | 22d overdue | Pending | Apr 18, 2019 |
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Start Free TrialVersum Materials US LLC has 25 pending office actions as of October 2026, spread across 17 art units and 23 examiners.
Duy Vu Nguyen Deo has the most, with 2 of Versum Materials US LLC's pending office actions.
Mostly Chemistry & Materials (USPTO Tech Center 1700), based on where its pending office actions are examined.
