Tech Center 2800 • Art Units: 1737 2825 2851
This examiner grants 88% of resolved cases
Leigh M. Garbowski is an examiner in Tech Center 2800 and Art Unit 1737. Garbowski has handled 756 resolved cases, with an allowance rate of 88.0 percent. This 88.0 percent allowance rate indicates a very high probability of success for applications assigned to this docket. The 756 resolved cases provide a strong statistical basis for these performance metrics.
The data shows an interview lift of 10.4 percent. This 10.4 percent lift suggests that conducting an interview with the examiner is associated with a higher likelihood of allowance compared to cases without an interview. Even with an 88.0 percent allowance rate, the 10.4 percent lift indicates that direct communication remains a useful tool for resolving issues. Practitioners in Art Unit 1737 should consider the value of an interview in the context of this examiner's overall efficiency.
The median time to allowance is 807 days. This 807 day period is the typical duration from filing to patent issuance. This 807 day median suggests a relatively efficient prosecution cycle. Applicants can use this metric to forecast their pendency and plan their intellectual property strategy accordingly.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18564797 | GENERATING LEARNED REPRESENTATIONS OF DIGITAL CIRCUIT DESIGNS | Non-Final OA | Google LLC |
| 18120857 | Systems And Methods For Generating Redacted Circuit Designs For Integrated Circuits | Non-Final OA | Intel Corporation |
| 18350512 | DESIGN-FOR-TEST CIRCUITS AND METHODS OF OPERATING THE SAME | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18526337 | METHOD FOR OPTIMIZING FLOOR PLAN FOR AN INTEGRATED CIRCUIT | Non-Final OA | TSMC NANJING COMPANY LIMITED |
| 18170335 | PHYSICAL LAYOUT SYNTHESIS FOR STANDARD CELLS USING SLICE LAYOUTS | Non-Final OA | Applied Materials, Inc. |
| 18381052 | EFFICIENT METHOD FOR THE LATCH TIMING ANALYSIS OF ELECTRONIC DESIGNS | Non-Final OA | XILINX, INC. |
| 18387905 | METHOD AND APPARATUS FOR PARTICLE BEAM-INDUCED PROCESSING OF A DEFECT OF A MICROLITHOGRAPHIC PHOTOMASK | Non-Final OA | Carl Zeiss SMT GmbH |
| 18355754 | CHIP PLACEMENT METHOD AND APPARATUS, AND STORAGE MEDIUM | Non-Final OA | The University of Hong Kong |
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