Prosecution Insights
Prosecution Insights
5 pending office actions • 2 clients • 4 examiners • 3 art units • 0 of 5 (0%) have an AI response strategy ready • 13 patents granted in the last 365 days
Based on the USPTO statutory response window for each pending office action. 5 of the docket's apps have a known mailing date; the rest are excluded from the tile counts.
Every pending office action with a known statutory deadline, placed on a days-until-due axis. Dots left of Today are overdue; the further right, the more runway. Cases that share a deadline window stack vertically. 5 of the docket's apps have a known mailing date.
Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.
| Bucket | Cases |
|---|---|
| §103 only | 5 (100%) |
How the docket's pending cases split across USPTO tech-center bands.
Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.
| Examiner | Apps on this docket | Allow rate | Interview lift |
|---|---|---|---|
| TANDY, LAURA ELOISE | 2 | 62.0% | +41.0% |
| YEMELYANOV, DMITRIY | 1 | 73.4% | +18.6% |
| FORD, NATHAN K | 1 | 32.6% | +35.6% |
| TSAI, HSIEN C | 1 | 83.9% | +14.4% |
Cases in front of an examiner with an allow rate of 80%+ where the difficulty is Easy or Medium. The top 1 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 17975016 | TEMPERATURE CONTROLLED ELECTRODE TO LIMIT DEPOSITION RATES AND DISTORTION | TSAI, HSIEN C | 42d overdue |
Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 5 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18107819 | System and Method for Reducing Particle Formation in a Process Chamber of an Ion Implanter | TANDY, LAURA ELOISE | 43d overdue |
| 17975016 | TEMPERATURE CONTROLLED ELECTRODE TO LIMIT DEPOSITION RATES AND DISTORTION | TSAI, HSIEN C | 42d overdue |
| 18516347 | System And Methods Using An Inline Surface Engineering Source | YEMELYANOV, DMITRIY | 20d |
| 18239988 | In-Vacuum Rotatable RF Component | FORD, NATHAN K | 29d |
| 18441483 | THERMOELECTRIC CONTROL FOR A CRUCIBLE FOR USE WITH AN ION SOURCE | TANDY, LAURA ELOISE | 75d |
| Client (Assignee) | Pending OAs |
|---|---|
| Applied Materials | 4 |
| Siemens Healthineers | 1 |
| Art Unit | Apps |
|---|---|
| 2881 | 3 |
| 2891 | 1 |
| 1716 | 1 |
| App # | Title | Client | Examiner | Art Unit | Statutes | Status | Due in | AI | Filed |
|---|---|---|---|---|---|---|---|---|---|
| 18441483 | THERMOELECTRIC CONTROL FOR A CRUCIBLE FOR USE WITH AN ION SOURCE | Applied Materials, Inc. | TANDY, LAURA ELOISE | 2881 | §103 | Non-Final OA | 75d | Pending | Feb 14, 2024 |
| 18516347 | System And Methods Using An Inline Surface Engineering Source | Varian Semiconductor Equipment Associates, Inc. | YEMELYANOV, DMITRIY | 2891 | §103 | Non-Final OA | 20d | Pending | Nov 21, 2023 |
| 18239988 | In-Vacuum Rotatable RF Component | Applied Materials, Inc. | FORD, NATHAN K | 1716 | §103 | Non-Final OA | 29d | Pending | Aug 30, 2023 |
| 18107819 | System and Method for Reducing Particle Formation in a Process Chamber of an Ion Implanter | Applied Materials, Inc. | TANDY, LAURA ELOISE | 2881 | §103 | Non-Final OA | 43d overdue | Pending | Feb 09, 2023 |
| 17975016 | TEMPERATURE CONTROLLED ELECTRODE TO LIMIT DEPOSITION RATES AND DISTORTION | Applied Materials, Inc. | TSAI, HSIEN C | 2881 | §103 | Non-Final OA | 42d overdue | Pending | Oct 27, 2022 |
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