Prosecution Insights
Prosecution Insights
Tech Center 2800 • Art Units: 2625 2816 2836 2842 2844
This examiner grants 82% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18172530 | ELECTRONIC CIRCUIT AND CALCULATING DEVICE | Non-Final OA | KABUSHIKI KAISHA TOSHIBA |
| 17816602 | FRONT-END CIRCUITRY FOR CELLULAR VEHICLE-TO-EVERYTHING (C-V2X) STATIONARY OBJECT DETECTION | Non-Final OA | QUALCOMM Incorporated |
| 18288832 | PARTICLE BEAM ACCELERATOR AND PARTICLE THERAPY SYSTEM | Non-Final OA | Hitachi High-Tech Corporation |
| 18924210 | METHODS AND APPARATUS FOR CROSS-CONDUCTION DETECTION | Final Rejection | Texas Instruments Incorporated |
| 18899286 | ACTIVE ELECTROMAGNETIC INTERFERENCE FILTER WITH DAMPING NETWORK | Non-Final OA | TEXAS INSTRUMENTS INCORPORATED |
| 17223835 | ACTIVE ELECTROMAGNETIC INTERFERENCE (EMI) FILTER FOR COMMON-MODE EMI REDUCTION | Non-Final OA | Texas Instruments Incorporated |
| 18406435 | START-UP OF STEP-UP POWER CONVERTER WITH SWITCHED-CAPACITOR NETWORK | Final Rejection | pSemi Corporation |
| 19254164 | IMPEDANCE MATCHING CIRCUIT AND METHOD | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 19250906 | Systems and Methods for Phase Locked Loop Realignment With Skew Cancellation | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18660479 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD | Final Rejection | Tokyo Electron Limited |
| 18534224 | PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD | Non-Final OA | Tokyo Electron Limited |
| 18640785 | CIRCUITRY TO CONTROL COMMON CATHODE BI-COLOR LEDS IN STORAGE DEVICES | Non-Final OA | SanDisk Technologies LLC |
| 18309237 | FIELD-EMISSION PHOTOCATHODES FOR HIGH-POWER HIGH-FREQUENCY ELECTRONICS | Non-Final OA | Lawrence Livermore National Security, LLC |
| 18901402 | DIELECTRIC BARRIER DISCHARGE DEVICE CONFIGURATIONS | Non-Final OA | AEROJET ROCKETDYNE, INC. |
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