Prosecution Insights
Prosecution Insights
Tech Center 3700 • Art Units: 2813 2815 2821 2893 3729
This examiner grants 87% of resolved cases
Edward Chin serves in Tech Center 3700 and Art Unit 2813, with 697 resolved cases. The examiner has an allowance rate of 87.2%, which is a positive baseline for applicants. The interview lift is 6.8%, indicating a modest benefit from conducting interviews over the 87.2% baseline. This suggests that while interviews are helpful, the high allowance rate is a consistent feature of the examiner's practice in Art Unit 2813.
The median days to allowance is 890, which is the typical duration for the 697 resolved cases in this examiner's history. Practitioners can expect a relatively smooth prosecution, with the 87.2% allowance rate as a strong starting point. The 6.8% interview lift offers an additional tool for success, while the 890-day median provides a reliable timeline for patent grants. These metrics from Tech Center 3700 provide a clear benchmark for planning and managing client expectations.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18807904 | SYSTEM AND METHODS FOR A BACKSIDE PACKAGE ARCHITECTURE | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18629799 | SEMICONDUCTOR DEVICE | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18711075 | IMAGE SENSOR, CAMERA COMPACT MODULE, ELECTRONIC DEVICE AND METHOD FOR MANUFACTURING PACKAGING STRUCTURE OF IMAGE SENSOR | Non-Final OA | BOE TECHNOLOGY GROUP CO., LTD. |
| 18740133 | DISPLAY DEVICE AND METHOD OF MANUFACTURING THE DISPLAY DEVICE | Non-Final OA | Samsung Display Co., LTD. |
| 18388119 | DISPLAY DEVICE | Final Rejection | LG Display Co., Ltd. |
| 18737239 | METHOD FOR MANUFACTURING LIGHT-EMITTING DEVICE | Non-Final OA | NICHIA CORPORATION |
| 18731206 | INTEGRATED CIRCUIT LASER MARKING SYSTEM | Non-Final OA | Texas Instruments Incorporated |
| 16808922 | Dicing A Wafer | Non-Final OA | Texas Instruments Incorporated |
| 17949496 | TWO ACCESS DEVICE, ONE STORAGE NODE CELL FOR VERTICAL THREE-DIMENSIONAL MEMORY | Final Rejection | Micron Technology, Inc. |
| 18707235 | SUBSTRATE TREATMENT SYSTEM AND SUBSTRATE TREATMENT METHOD | Non-Final OA | Tokyo Electron Limited |
| 18649331 | SEMICONDUCTOR DEVICE | Non-Final OA | Rohm Co., Ltd. |
| 18196144 | PACKAGES WITH A SHORTEST DISTANCE BETWEEN PACKAGE CONNECTORS AND A SEATING PLANE OF AT LEAST 6 MILS | Non-Final OA | Microchip Technology Incorporated |
| 18699584 | RECEPTOR SUBSTRATE, METHOD FOR MANUFACTURING RECEPTOR SUBSTRATE, TRANSFER METHOD, METHOD FOR MANUFACTURING LED PANEL, AND STAMPER | Non-Final OA | SHIN-ETSU CHEMICAL CO., LTD. |
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