Prosecution Insights
Prosecution Insights
Tech Center 2800 • Art Units: 2822 2896 2898
This examiner grants 74% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18143187 | SEMICONDUCTOR DEVICE | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18176430 | Reducing Defects In a Polysilicon Overlaid Fin Structure | Non-Final OA | Texas Instruments Incorporated |
| 18306678 | FLOATING GATE BIOSENSOR | Non-Final OA | International Business Machines Corporation |
| 17850778 | INTEGRATED CIRCUIT STRUCTURE WITH BACKSIDE POWER STAPLE | Non-Final OA | Intel Corporation |
| 17720122 | MEMORY DEVICE ISOLATION STRUCTURE AND METHOD | Non-Final OA | Micron Technology, Inc. |
| 18360656 | PACKAGE WITH FAN-OUT STRUCTURES | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 18352640 | ETCH PROFILE CONTROL OF VIA OPENING | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 18316146 | P-DIPOLE MATERIAL FOR STACKED TRANSISTORS | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18195351 | SEMICONDUCTOR DEVICE STRUCTURE AND METHODS OF FORMING THE SAME | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 18190444 | INTEGRATED CIRCUIT STRUCTURE AND METHOD FOR FABRICATING THE SAME | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 18188234 | INTEGRATED CIRCUIT STRUCTURE AND MANUFACTURING METHOD THEREOF | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 18182144 | Source/Drain Contacts And Methods For Forming The Same | Final Rejection | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18167423 | SEMICONDUCTOR STRUCTURE AND METHOD FOR FORMING THE SAME | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 18099405 | SEMICONDUCTOR DEVICE STRUCTURE AND METHODS OF FORMING THE SAME | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 18362266 | CONTROLLED DOPING IN A GATE DIELECTRIC LAYER | Final Rejection | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18350429 | SEMICONDUCTOR DEVICES WITH IMPROVED GATE CONTROL | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18188314 | Crystallization of High-K Dielectric Layer | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18628350 | SYSTEMS AND METHODS FOR SUPPORTING AND CONVEYING A SUBSTRATE | Non-Final OA | Kateeva, Inc. |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy