Prosecution Insights
Prosecution Insights
Tech Center 4100 • Art Units: 2822 2896 2898 4100
This examiner grants 74% of resolved cases
Tuan A Hoang has 519 resolved cases in Tech Center 2800 and Art Unit 2822. The allowance rate is 74.4%. This 74.4% rate suggests a positive outlook for applicants seeking patent protection. The 519 resolved cases provide a substantial data set for identifying clear trends in his prosecution history in Tech Center 2800.
The interview lift of 11.3% indicates that interviews can be a helpful tool for applicants. This 11.3% lift suggests that direct communication can help resolve technical issues or misunderstandings. For the 519 cases resolved, the 11.3% lift serves as a strategic incentive for practitioners to engage the examiner. It complements the 74.4% allowance rate by offering a clear path to improve outcomes in Art Unit 2822.
The median days to allowance is 988. This 988-day duration provides a clear timeline expectation for the prosecution process. Applicants should factor this 988-day metric into their planning. The combination of a 74.4% allowance rate and an 11.3% interview lift suggests a collaborative environment where active engagement leads to successful outcomes for the 519 cases handled.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18312984 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18609372 | SEMICONDUCTOR PACKAGE, METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND LEAD FRAME | Non-Final OA | NXP USA, INC. |
| 18594509 | DISPLAY PANEL AND ELECTRONIC DEVICE COMPRISING THE SAME | Non-Final OA | Samsung Display Co., Ltd. |
| 18664587 | DISPLAY DEVICE AND ELECTRONIC DEVICE | Non-Final OA | SEMICONDUCTOR ENERGY LABORATORY CO., LTD. |
| 18490304 | SOLID-STATE IMAGING ELEMENT, PRODUCTION METHOD THEREOF, AND ELECTRONIC DEVICE | Non-Final OA | SONY GROUP CORPORATION |
| 18306678 | FLOATING GATE BIOSENSOR | Non-Final OA | International Business Machines Corporation |
| 17720122 | MEMORY DEVICE ISOLATION STRUCTURE AND METHOD | Non-Final OA | Micron Technology, Inc. |
| 18339615 | LEADFRAME WITH PAD ANCHORING MEMBERS AND METHOD OF FORMING THE SAME | Non-Final OA | STMicroelectronics, Inc. |
| 18776816 | SEMICONDUCTOR STRUCTURE WITH COMPOSITE OXIDE LAYER | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18776282 | METHOD OF MANUFACTURING SEMICONDUCTOR STRUCTURE | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. |
| 18769957 | ACTIVE REGION CUT PROCESS | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18447750 | SEMICONDUCTOR DEVICE HAVING NANOSHEETS | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 18305514 | SEMICONDUCTOR DEVICE STRUCTURE WITH EXPANSION FILM AND METHOD FOR FORMING THE SAME | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18301524 | GUARD RING STRUCTURE AND METHOD FORMING SAME | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18099405 | SEMICONDUCTOR DEVICE STRUCTURE AND METHODS OF FORMING THE SAME | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 18232181 | Profile Control Of Gate Structures In Semiconductor Devices | Final Rejection | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18350429 | SEMICONDUCTOR DEVICES WITH IMPROVED GATE CONTROL | Final Rejection | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18694053 | EPITAXIAL WAFER AND PRODUCTION METHOD THEREFOR | Non-Final OA | SHIN-ETSU HANDOTAI CO., LTD. |
| 18209488 | MANUFACTURING METHOD OF SEMICONDUCTOR STRUCTURE | Final Rejection | UNITED MICROELECTRONICS CORP. |
| 18420016 | MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE | Final Rejection | MIRISE Technologies Corporation |
| 18596068 | NEURON CIRCUITS FOR A SPIKING NEURAL NETWORK BASED ON A VOLTAGE-CONTROLLED MAGNETIC-TUNNEL-JUNCTION LAYER STACK | Non-Final OA | GlobalFoundries Singapore Pte. Ltd. |
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