Prosecution Insights
Prosecution Insights
Tech Center 2800 • Art Units: 2812 2826 2874 2896
This examiner grants 92% of resolved cases
Cheung Lee serves in Tech Center 2800 and Art Unit 2812. The examiner has a high volume of 1165 resolved cases with an allowance rate of 92.2 percent. This is a very high rate for such a large number of resolutions. The 92.2 percent allowance rate indicates a very high probability of success for applications reaching a final resolution.
The interview lift is 4.3 percent. This small lift reflects the fact that the base allowance rate is already very high. Practitioners may find that interviews are less critical here than with other examiners, though they still provide a slight benefit. The 4.3 percent lift is a minor factor in the overall strategy for Art Unit 2812.
The median days to allowance is 663. This is a very fast timeline for patent prosecution. The combination of a 92.2 percent allowance rate and a 663-day median pendency indicates a highly efficient process. With 1165 cases resolved, the data provides a very reliable view of the examiner's performance in Tech Center 2800.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18767390 | SEMICONDUCTOR CHIP, SEMICONDUCTOR PACKAGE, AND SEMICONDUCTOR CHIP MANUFACTURING METHOD | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18774351 | BACKSIDE CONTACTS FOR SEMICONDUCTOR DEVICES | Non-Final OA | Intel Corporation |
| 18204864 | SELF-ALIGNED VIA PATTERNING FOR BACKSIDE INTERCONNECTS | Non-Final OA | Intel Corporation |
| 18759006 | METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND A SEMICONDUCTOR DEVICE | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18753024 | SEMICONDUCTOR DEVICE WITH GATE CUT FEATURE AND METHOD FOR FORMING THE SAME | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18420674 | PHOTONIC DEVICE AND FABRICATING METHOD THEREOF | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18784531 | SEMICONDUCTOR DEVICE WITH S/D BOTTOM ISOLATION AND METHODS OF FORMING THE SAME | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18769875 | FINFETS WITH EPITAXY REGIONS HAVING MIXED WAVY AND NON-WAVY PORTIONS | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18770349 | SEMICONDUCTOR DEVICE WITH FUNNEL SHAPE SPACER AND METHODS OF FORMING THE SAME | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18629037 | MEMORY DEVICE INCLUDING MULTIPLICATE SOURCE LINES AND METHODS OF FORMING THE SAME | Non-Final OA | Taiwan Semiconductor Manufacturing Company Limited |
| 18596501 | VERTICAL HETEROSTRUCTURE SEMICONDUCTOR MEMORY CELL AND METHODS FOR MAKING THE SAME | Non-Final OA | Taiwan Semiconductor Manufacturing Company Limited |
| 18757525 | SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME | Final Rejection | UNITED MICROELECTRONICS CORP. |
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