Prosecution Insights
Last updated: October 02, 2026

Fujimi Incorporated

Technology area: Chemistry & Materials

25 pending office actions • 4 art units • 15 examiners • 0 of 25 (0%) have an AI response strategy ready • 24 patents granted in the last 365 days

Portfolio Summary

25
Total Pending OAs
12
Non-Final OAs
13
Final Rejections
0
Advisory / Quayle

Response Deadline Pressure

Based on the USPTO statutory response window for each pending office action. 8 of the docket's apps have a known mailing date; the rest are excluded from the tile counts.

6
Overdue
0
Due this week
2
Due this month
0
Due in next 60 days
0
Due later

Deadline Fire Line

Every pending office action with a known statutory deadline, placed on a days-until-due axis. Dots left of Today are overdue; the further right, the more runway. Cases that share a deadline window stack vertically. 8 of the docket's apps have a known mailing date.

-30dToday30d60d90d120d
Overdue (6)Due ≤ 30 days (2)

Case Difficulty Mix

Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.

9
Hard (36%)
16
Medium (64%)
0
Easy (0%)
0
Unknown (0%)

Rejection Statute Mix

BucketCases
§103 only12 (48%)
§102 only1 (4%)
Double-patenting + other3 (12%)
Multi-statute (no §101)9 (36%)

Industry Mix

How the docket's pending cases split across USPTO tech-center bands.

15
Life Sciences
60% of docket
0
Information Tech
0% of docket
0
Communications
0% of docket
0
Semiconductors
0% of docket
1
Mechanical / Eng
4% of docket
9
Business / Other
36% of docket

Time-on-OA Estimate

Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.

250 h
Manual time on pending OAs
50 h
Time saved (low, 20%)
88 h
Time saved (mid, 35%)
2.2 wks
FTE-weeks freed (mid)

Top Examiners on this docket

ExaminerApps on this docketAllow rateInterview lift
ALANKO, ANITA KAREN 3 70.0% -16.5%
AHMED, SHAMIM 3 78.4% +22.2%
CARTER, JONATHAN LANGDON 3 100.0% +0.0%
LU, JIONG-PING 3 83.6% +7.8%
DUCLAIR, STEPHANIE P. 2 72.2% +19.6%
TRAN, BINH X 2 81.7% +12.0%
HARRIS, BRITTANY SHARON 1 48.6% +31.7%
DEO, DUY VU NGUYEN 1 82.4% +7.3%
THOMPSON, CAMIE S 1 73.8% +10.4%
LAOBAK, ANDREW KEELAN 1 75.4% +34.5%

Quick Wins (7)

Cases in front of an examiner with an allow rate of 80%+ where the difficulty is Easy or Medium. The top 7 ordered by deadline are shown.

App #TitleExaminerDue in
17442712 POLISHING COMPOSITION LU, JIONG-PING 80d overdue
18696798 POLISHING COMPOSITION CARTER, JONATHAN LANGDON 15d overdue
18684991 POLISHING COMPOSITION, POLISHING COMPOSITION PRODUCTION METHOD, POLISHING METHOD, AND SEMICONDUCTOR SUBSTRATE PRODUCTION METHOD TRAN, BINH X 3d overdue
18853936 COMPOSITION FOR CHEMICAL-MECHANICAL POLISHING AND METHOD FOR USING COMPOSITION DEO, DUY VU NGUYEN —
18818832 MOLYBDENUM CHEMICAL MECHANICAL POLISHING COMPOUNDS AND METHODS OF USE THEREOF CARTER, JONATHAN LANGDON —
18589690 SILICON OXYNITRIDE REMOVAL ENHANCERS AND METHODS OF USE THEREOF CARTER, JONATHAN LANGDON —
18421013 POLISHING COMPOSITION, POLISHING METHOD, AND METHOD OF MANUFACTURING SEMICONDUCTOR SUBSTRATE LU, JIONG-PING —

Hard Cases (9)

Multi-statute / §101-driven matters, or cases in front of an examiner with an allow rate under 30%. The top 8 ordered by deadline are shown.

App #TitleExaminerDue in
17910895 POLISHING COMPOSITION AND POLISHING METHOD PHAM, THOMAS T 16d overdue
18696793 POLISHING COMPOSITION ALANKO, ANITA KAREN 1d overdue
18596278 POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE TRAN, BINH X 12d
19053065 POLISHING COMPOSITION AND POLISHING METHOD DUCLAIR, STEPHANIE P. —
18840736 POLISHING COMPOSITION LU, JIONG-PING —
18810102 POST-CHEMICAL MECHANICAL POLISHING CLEANING COMPOSITION, POST-CHEMICAL MECHANICAL POLISHING AND CLEANING TREATMENT METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AHMED, SHAMIM —
18605224 POLISHING COMPOSITION, POLISHING METHOD AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE ALANKO, ANITA KAREN —
18602204 POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE KUVAYSKAYA, ANASTASIA ALEKSEYEVNA —

Interview Candidates (10)

Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 8 ordered by deadline are shown.

App #TitleExaminerDue in
18848283 POLISHING COMPOSITION AND POLISHING METHOD USING THE SAME AHMED, SHAMIM 16d overdue
18684991 POLISHING COMPOSITION, POLISHING COMPOSITION PRODUCTION METHOD, POLISHING METHOD, AND SEMICONDUCTOR SUBSTRATE PRODUCTION METHOD TRAN, BINH X 3d overdue
18596278 POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE TRAN, BINH X 12d
19176925 SURFACE TREATMENT COMPOSITION, METHOD FOR MANUFACTURING SURFACE TREATMENT COMPOSITION, SURFACE TREATMENT METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE HARRIS, BRITTANY SHARON —
19053065 POLISHING COMPOSITION AND POLISHING METHOD DUCLAIR, STEPHANIE P. —
18851171 POLISHING COMPOSITION DUCLAIR, STEPHANIE P. —
18844351 DISPERSION FOR FORMING CERAMIC SINTERED BODY, GREEN SHEET FOR FORMING CERAMIC SINTERED BODY, PREPREG MATERIAL FORMING CERAMIC SINTERED BODY, AND CERAMIC SINTERED BODY THOMPSON, CAMIE S —
18810102 POST-CHEMICAL MECHANICAL POLISHING CLEANING COMPOSITION, POST-CHEMICAL MECHANICAL POLISHING AND CLEANING TREATMENT METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AHMED, SHAMIM —

Top Art Units

Art UnitApps
1713 13
1761 1
1716 1
3723 1

Pending Office Actions

App #TitleExaminerArt UnitStatutesStatusDue inAIFiled
19176925 SURFACE TREATMENT COMPOSITION, METHOD FOR MANUFACTURING SURFACE TREATMENT COMPOSITION, SURFACE TREATMENT METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE HARRIS, BRITTANY SHARON 1761 §103 Final Rejection — Pending Apr 11, 2025
19053065 POLISHING COMPOSITION AND POLISHING METHOD DUCLAIR, STEPHANIE P. — §103§112 Non-Final OA — Pending Feb 13, 2025
18853936 COMPOSITION FOR CHEMICAL-MECHANICAL POLISHING AND METHOD FOR USING COMPOSITION DEO, DUY VU NGUYEN — §103 Non-Final OA — Pending Oct 03, 2024
18851171 POLISHING COMPOSITION DUCLAIR, STEPHANIE P. 1713 §103 Non-Final OA — Pending Sep 26, 2024
18849771 POLISHING COMPOSITION ALANKO, ANITA KAREN — §102§103§112DP Non-Final OA — Pending Sep 23, 2024
18848283 POLISHING COMPOSITION AND POLISHING METHOD USING THE SAME AHMED, SHAMIM 1713 §103DP Final Rejection 16d overdue Pending Sep 18, 2024
18844351 DISPERSION FOR FORMING CERAMIC SINTERED BODY, GREEN SHEET FOR FORMING CERAMIC SINTERED BODY, PREPREG MATERIAL FORMING CERAMIC SINTERED BODY, AND CERAMIC SINTERED BODY THOMPSON, CAMIE S — §102 Final Rejection — Pending Sep 05, 2024
18818832 MOLYBDENUM CHEMICAL MECHANICAL POLISHING COMPOUNDS AND METHODS OF USE THEREOF CARTER, JONATHAN LANGDON — §103 Non-Final OA — Pending Aug 29, 2024
18840736 POLISHING COMPOSITION LU, JIONG-PING — §102§103 Non-Final OA — Pending Aug 22, 2024
18810102 POST-CHEMICAL MECHANICAL POLISHING CLEANING COMPOSITION, POST-CHEMICAL MECHANICAL POLISHING AND CLEANING TREATMENT METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AHMED, SHAMIM — §102§103 Non-Final OA — Pending Aug 20, 2024
18696793 POLISHING COMPOSITION ALANKO, ANITA KAREN 1713 §102§112Other Final Rejection 1d overdue Pending Mar 28, 2024
18696798 POLISHING COMPOSITION CARTER, JONATHAN LANGDON 1713 §103 Final Rejection 15d overdue Pending Mar 28, 2024
18605224 POLISHING COMPOSITION, POLISHING METHOD AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE ALANKO, ANITA KAREN 1713 §102§103§112 Final Rejection — Pending Mar 14, 2024
18602212 COMPOSITION FOR SURFACE TREATMENT, SURFACE TREATMENT METHOD, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE LAOBAK, ANDREW KEELAN 1713 §103 Final Rejection — Pending Mar 12, 2024
18602204 POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE KUVAYSKAYA, ANASTASIA ALEKSEYEVNA — §102§103 Non-Final OA — Pending Mar 12, 2024
18596278 POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE TRAN, BINH X 1713 §102§103 Final Rejection 12d Pending Mar 05, 2024
18589690 SILICON OXYNITRIDE REMOVAL ENHANCERS AND METHODS OF USE THEREOF CARTER, JONATHAN LANGDON 1713 §103 Final Rejection — Pending Feb 28, 2024
18684991 POLISHING COMPOSITION, POLISHING COMPOSITION PRODUCTION METHOD, POLISHING METHOD, AND SEMICONDUCTOR SUBSTRATE PRODUCTION METHOD TRAN, BINH X 1713 §103§112DP Final Rejection 3d overdue Pending Feb 20, 2024
18429695 SILICA SOL RUMP, RICHARD M — §103§112 Non-Final OA — Pending Feb 01, 2024
18421013 POLISHING COMPOSITION, POLISHING METHOD, AND METHOD OF MANUFACTURING SEMICONDUCTOR SUBSTRATE LU, JIONG-PING 1713 §103 Final Rejection — Pending Jan 24, 2024
18122961 SULFONIC ACID-MODIFIED COLLOIDAL SILICA CULBERT, ROBERTS P 1716 §103 Non-Final OA 21d Pending Mar 17, 2023
17927089 POLISHING METHOD AND POLISHING COMPOSITION SET HAWKINS, JASON KHALIL 3723 §103 Final Rejection — Pending Nov 22, 2022
17910895 POLISHING COMPOSITION AND POLISHING METHOD PHAM, THOMAS T 1713 §102§103 Non-Final OA 16d overdue Pending Sep 12, 2022
17568827 POLISHING COMPOSITION, METHOD FOR MANUFACTURING POLISHING COMPOSITION, AND POLISHING METHOD AHMED, SHAMIM 1713 §103 Final Rejection — Pending Jan 05, 2022
17442712 POLISHING COMPOSITION LU, JIONG-PING 1713 §103 Non-Final OA 80d overdue Pending Sep 24, 2021

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