Tech Center 2800 • Art Units: 2891 2893
This examiner grants 82% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18223649 | IMAGE SENSOR AND ELECTRONIC DEVICE INCLUDING THE SAME | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 17970008 | SEMICONDUCTOR DEVICE | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18283346 | ULTRAVIOLET LIGHT EMITTING ELEMENT | Non-Final OA | ASAHI KASEI KABUSHIKI KAISHA |
| 18509311 | DISPLAY DEVICE | Non-Final OA | Samsung Display Co., LTD. |
| 18500042 | METHOD OF MANUFACTURING LIGHT EMITTING DIODE | Non-Final OA | Samsung Display Co., LTD. |
| 18467582 | DISPLAY APPARATUS | Final Rejection | Samsung Display Co., Ltd. |
| 17691213 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE | Final Rejection | SEMICONDUCTOR ENERGY LABORATORY CO., LTD. |
| 17994487 | SEPARATE EPITAXY IN MONOLITHIC STACKED AND STEPPED NANOSHEETS | Non-Final OA | INTERNATIONAL BUSINESS MACHINES CORPORATION |
| 18249862 | ELECTRONIC COMPONENT EMBEDDED SUBSTRATE | Final Rejection | TDK Corporation |
| 18486467 | SIP-TYPE ELECTRONIC DEVICE AND METHOD FOR MAKING SUCH A DEVICE | Non-Final OA | COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES |
| 17482094 | MEMORY DEVICES AND METHODS OF MANUFACTURING THEREOF | Final Rejection | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18328502 | CRYSTALLIZATION TEMPERATURE REDUCTION OF HIGH-K DIELECTRIC LAYER | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 17809841 | CONTROL OF SURFACE MORPHOLOGY OF SPALLED (110) III-V SUBSTRATE SURFACES | Final Rejection | Colorado School of Mines |
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