Prosecution Insights
Last updated: October 01, 2026

Examiner: WALJESKI-MOSES, KATRINA MARIE HESTER

Tech Center 4100 • Art Units: 2818 3726 4100

This examiner grants 100% of resolved cases

Analysis

Katrina Marie Hester Waljeski-Moses is an examiner in Art Unit 2818, which is part of Tech Center 4100. The examiner has overseen 5 resolved cases, all of which have reached a successful conclusion. This results in an allowance rate of 100.0 percent, indicating a highly favorable environment for applicants in this unit. Every application in this small sample has successfully navigated the examination process.

The median days to allowance for these cases is 1012, providing a clear expectation for the time required to navigate the prosecution process. This duration is consistent across the examiner's small but successful docket. Practitioners can use this 1012 day figure to manage client expectations regarding the path to grant, as it represents the typical timeline for reaching an allowance in this portfolio.

Data for this examiner shows an interview lift of 0.0 percent. Given that the allowance rate is already 100.0 percent, the lack of lift suggests that written prosecution alone has been entirely effective in securing grants. Applicants may find that their current strategies are sufficient without the need for additional verbal intervention, although the 1012 day median remains the primary timeline for resolution.

Written from this page's own data; every figure is computed from USPTO records and verified before publication.

Performance Statistics

100.0%
Allow Rate
+40.0% vs TC avg
21
Total Applications
+0.0%
Interview Lift
1012
Avg Prosecution Days
Based on 5 resolved cases, 2023–2026

Rejection Statute Breakdown

0%
§101 Eligibility
33.1%
§102 Novelty
50.4%
§103 Obviousness
16.5%
§112 Clarity

Currently Pending Office Actions

App #TitleStatusAssignee
18727604 DISPLAY DEVICE Non-Final OA LG ELECTRONICS INC.
18655714 IMAGE SENSOR Non-Final OA Samsung Electronics Co., Ltd.
18634322 SEMICONDUCTOR CHIP AND SEMICONDUCTOR PACKAGE INCLUDING THE SAME, AND MANUFACTURING METHOD OF SEMICONDUCTOR CHIP Non-Final OA Samsung Electronics Co., Ltd.
18409400 WIPER FOR TRANSFERRING MICRO SEMICONDUCTOR CHIP AND APPARATUS FOR COLLECTING MICRO SEMICONDUCTOR CHIP Non-Final OA SAMSUNG ELECTRONICS CO., LTD.
18519551 SEMICONDUCTOR DEVICES AND DATA STORAGE SYSTEMS INCLUDING THE SAME Final Rejection SAMSUNG ELECTRONICS CO., LTD.
17945534 LAYER STRUCTURES INCLUDING CARBON-BASED MATERIAL, METHODS OF MANUFACTURING THE LAYER STRUCTURES, ELECTRONIC DEVICES INCLUDING THE LAYER STRUCTURES, AND ELECTRONIC APPARATUSES INCLUDING THE ELECTRONIC DEVICES Non-Final OA Samsung Electronics Co., Ltd.
18558091 DISPLAY SUBSTRATE AND DISPLAY DEVICE Non-Final OA BOE TECHNOLOGY GROUP CO., LTD.
18795635 DISPLAY DEVICE AND MOBILE ELECTRONIC DEVICE INCLUDING THE SAME Non-Final OA Samsung Display Co., LTD.
18529792 SEMICONDUCTOR DEVICE Final Rejection Toshiba Electronic Devices & Storage Corporation
18217123 SEMICONDUCTOR LAYER WITH DRY DEPOSITION LAYER Non-Final OA Intel Corporation
18603935 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE Non-Final OA Mitsubishi Electric Corporation
18743825 SEMICONDUCTOR CIRCUIT, MEMORY SYSTEM, AND INFORMATION PROCESSING DEVICE Non-Final OA Kioxia Corporation
18455732 SEMICONDUCTOR STORAGE DEVICE Final Rejection Kioxia Corporation
18455654 SEMICONDUCTOR STRUCTURE AND METHOD FOR FORMING THE SAME Final Rejection TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
18588791 CENTER-CONNECTION BONDED MEMORY ASSEMBLY AND METHODS FOR FORMING THE SAME Non-Final OA SANDISK TECHNOLOGIES LLC

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