Prosecution Insights
Last updated: October 01, 2026

Examiner: ESIABA, NKECHINYERE OTUOMASIRICH

Tech Center 2800 • Art Units: 2817

This examiner grants 58% of resolved cases

Analysis

Nkechinyere Otuomasirich Esiaba examines cases in Tech Center 2800 and Art Unit 2817, with 19 resolved cases. The allowance rate is 57.9 percent. The median time to allowance is 1288 days. This 1288 days duration provides a benchmark for the expected length of prosecution for applications that reach a grant.

The interview lift is 47.1 percent. This high figure suggests that interviews are very effective at increasing the likelihood of an allowance. For the 19 cases resolved, the 47.1 percent lift indicates that direct discussion is a powerful strategy for overcoming rejections. Practitioners should consider the 57.9 percent allowance rate as a moderate baseline that is significantly improved by oral advocacy. The 47.1 percent lift is a key insight for those navigating the 1288 days median pendency. This profile shows that while prosecution can be lengthy, interviews offer a strong path toward a successful outcome.

Written from this page's own data; every figure is computed from USPTO records and verified before publication.

Performance Statistics

57.9%
Allow Rate
-10.1% vs TC avg
55
Total Applications
+47.1%
Interview Lift
1288
Avg Prosecution Days
Based on 19 resolved cases, 2023–2026

Rejection Statute Breakdown

0%
§101 Eligibility
31.1%
§102 Novelty
58.1%
§103 Obviousness
10.4%
§112 Clarity

Currently Pending Office Actions

App #TitleStatusAssignee
18022402 DISPLAY DEVICE Non-Final OA SAMSUNG DISPLAY CO., LTD.
18532810 SEMICONDUCTOR WAFER AND METHOD FOR PROCESSING A SEMICONDUCTOR WAFER Non-Final OA Robert Bosch GmbH
18703582 SOLID-STATE IMAGING DEVICE Non-Final OA SONY SEMICONDUCTOR SOLUTIONS CORPORATION
18245414 Optoelectronic Device Non-Final OA ams-OSRAM International GmbH
18519786 SEMICONDUCTOR DEVICE Final Rejection Kioxia Corporation
18432870 2-TRANSISTOR MEMORY CELL AND GATE STRUCTURE HAVING MULTIPLE PORTIONS Non-Final OA Micron Technology, Inc.
18411595 Contact Structures in Semiconductor Devices Non-Final OA Taiwan Semiconductor Manufacturing Company, Ltd.
18325006 SEMICONDUCTOR PACKAGE AND MANUFACTURING METHOD THEREOF Final Rejection Taiwan Semiconductor Manufacturing Company, Ltd.
17899890 LIGHT EMITTING DEVICE AND METHOD OF FABRICATING THEREOF Final Rejection AUO Corporation
18389669 SEMICONDUCTOR WAFER DETECTION DEVICE AND DROPLET GUIDE MEMBER Non-Final OA EBARA CORPORATION
18108872 SEMICONDUCTOR ASSEMBLY Non-Final OA LITE-ON TECHNOLOGY CORPORATION
18747608 ETCHING METHOD FOR SEMICONDUCTOR STRUCTURE COMPRISING SUBSTRATE, FIRST STRUCTURE LOCATED ON PART OF TOP SURFACE OF THE SUBSTRATE, SIDEWALLS STRUCTURE AND FIELD EFFECT TRANSISTOR Non-Final OA Silergy Semiconductor Technology (Hangzhou) LTD
18310635 ELECTRONIC PACKAGE AND MANUFACTURING METHOD THEREOF Final Rejection SILICONWARE PRECISION INDUSTRIES CO., LTD.
18403244 DUAL GATE HIGH ELECTRON MOBILITY TRANSISTOR AND METHOD OF MANUFACTURING THE SAME Final Rejection National Yang Ming Chiao Tung University
18644131 MICRO LIGHT EMITTING DIODE PANEL Non-Final OA PlayNitride Display Co., Ltd.
17701678 MICRO LIGHT EMITTING DIODE PANEL AND METHOD OF FABRICATING THE SAME Final Rejection PlayNitride Display Co., Ltd.

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