Prosecution Insights
Last updated: May 29, 2026

Examiner: SEHAR, FAKEHA

Tech Center 2800 • Art Units: 2893

This examiner grants 82% of resolved cases

Performance Statistics

82.3%
Allow Rate
+14.3% vs TC avg
136
Total Applications
+18.8%
Interview Lift
1120
Avg Prosecution Days
Based on 96 resolved cases, 2023–2026

Rejection Statute Breakdown

0%
§101 Eligibility
4.7%
§102 Novelty
72.1%
§103 Obviousness
21.2%
§112 Clarity

Currently Pending Office Actions

App #TitleStatusAssignee
18184901 INTEGRATED CIRCUIT DEVICE INCLUDING INTEGRATED INSULATOR AND METHODS OF FABRICATION THE SAME Final Rejection Samsung Electronics Co., Ltd.
17403723 GALVANIC HIGH VOLTAGE ISOLATION CAPABILITY ENHANCEMENT ON REINFORCED ISOLATION TECHNOLOGIES Non-Final OA Texas Instruments Incorporated
17486674 ELECTROLUMINESCENT ELEMENT, DISPLAY PANEL AND DISPLAY DEVICE Non-Final OA BOE Technology Group Co., Ltd.
18309205 Method for Forming Sidewall in Forksheet Structure and Forksheet Semiconductor Device Final Rejection Huawei Technologies Co., Ltd.
18548704 Semiconductor Device with Electric Field Management Structures Final Rejection Massachusetts Institute of Technology
17698322 MICROELECTRONIC ASSEMBLIES INCLUDING STIFFENERS Non-Final OA Intel Corporation
17129854 METAL INSULATOR METAL (MIM) CAPACITOR WITH PEROVSKITE DIELECTRIC Non-Final OA Intel Corporation
18361226 SEMICONDUCTOR STRUCTURE AND METHOD FOR FORMING THE SAME Non-Final OA Taiwan Semiconductor Manufacturing Company, Ltd.
17835776 SEMICONDUCTOR DEVICE AND METHOD OF FORMING REDISTRIBUTION STRUCTURES OF CONDUCTIVE ELEMENTS Final Rejection Taiwan Semiconductor Manufacturing Company, Ltd.
17663108 PASSIVATION FOR A DEEP TRENCH ISOLATION STRUCTURE IN A PIXEL SENSOR Non-Final OA Taiwan Semiconductor Manufacturing Company, Ltd.
18192186 DEPOSITION METHOD AND PROCESSING APPARATUS Non-Final OA Tokyo Electron Limited
18279809 METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND PLASMA PROCESSING METHOD Non-Final OA Hitachi High-Tech Corporation
18358341 MAGNETIC TUNNEL JUNCTION MEMORY CELL WITH A BUFFER-LAYER AND METHODS FOR FORMING THE SAME Non-Final OA Taiwan Semiconductor Manufacturing Company Limited
17849037 METHODS OF FORMING UNIFORMLY DOPED DEEP IMPLANTED REGIONS IN SILICON CARBIDE AND SILICON CARBIDE LAYERS INCLUDING UNIFORMLY DOPED IMPLANTED REGIONS Final Rejection Wolfspeed, Inc.
18232848 THIN-FILM TRANSISTOR AND MANUFACTURING METHOD THEREOF Non-Final OA SAKAI DISPLAY PRODUCTS CORPORATION
18349041 ELECTRONIC ESD PROTECTION DEVICE Final Rejection STMicroelectronics (Tours) SAS
18256727 A NOVEL TRANSISTOR DEVICE Non-Final OA Search For The Next, LTD
17711660 PROCESS FOR PRODUCING AN OPTOELECTRONIC COMPONENT, OPTOELECTRONIC COMPONENT AND PROTECTIVE LAYER Non-Final OA Pictiva Displays International Limited

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