Prosecution Insights
Last updated: October 02, 2026

Examiner: BAUMAN, SCOTT E

Tech Center 2800 • Art Units: 2815

This examiner grants 47% of resolved cases

Analysis

Scott E. Bauman examines applications in Art Unit 2815 within Tech Center 2800. He has reached a final resolution in 189 cases, providing a solid basis for analyzing his prosecution trends. The allowance rate pct of 47.1 indicates a challenging environment where fewer than half of the applications result in a patent grant. This 47.1 percent rate suggests that applicants must be prepared for rigorous examination and potential rejections. The median days to allowance is 1306, reflecting a very long prosecution timeline for successful cases. This 1306-day median indicates that practitioners should expect an extended period of back and forth before reaching a favorable outcome in Tech Center 2800.

The interview lift pct of 27.1 is a key metric for developing a successful strategy. This substantial lift indicates that engaging in an interview is highly correlated with an increased probability of allowance compared to cases without verbal negotiation. By utilizing an interview, applicants can significantly improve their chances of success beyond the 47.1 percent baseline. Given the 189 resolved cases, this 27.1 percent lift is a reliable indicator that direct communication is an effective tool in Art Unit 2815. Practitioners should consider an interview as a primary tactic to overcome obstacles and potentially expedite the 1306-day median wait time. The data underscores the importance of proactive advocacy in this challenging examination environment.

Written from this page's own data; every figure is computed from USPTO records and verified before publication.

Performance Statistics

47.1%
Allow Rate
-20.9% vs TC avg
231
Total Applications
+27.1%
Interview Lift
1306
Avg Prosecution Days
Based on 189 resolved cases, 2023–2026

Rejection Statute Breakdown

0%
§101 Eligibility
24.4%
§102 Novelty
45.4%
§103 Obviousness
26.5%
§112 Clarity

Currently Pending Office Actions

App #TitleStatusAssignee
18133964 SEMICONDUCTOR DEVICE Final Rejection Samsung Electronics Co., Ltd.
17936552 SEMICONDUCTOR MEMORY DEVICES AND METHODS FOR FABRICATING THE SAME Final Rejection Samsung Electronics Co., Ltd.
17954394 SEMICONDUCTOR MEMORY DEVICE HAVING A MULTI-LAYER TOP ELECTRODE Non-Final OA Samsung Electronics Co., Ltd.
17931880 SEMICONDUCTOR DEVICES Final Rejection Samsung Electronics Co., Ltd.
17831530 SEMICONDUCTOR DEVICE INCLUDING ACTIVE PATTERN WITH INTEGRATED CONDUCTIVE STRUCTURE AND INTERCONNECTION Final Rejection SAMSUNG ELECTRONICS CO.
18230565 DISPLAY APPARATUS Final Rejection SAMSUNG DISPLAY CO., LTD.
17964900 OLED PANEL FOR LIGHTING DEVICE WITH MOISTURE INTRUSION DELAY EFFECT Final Rejection LG Display Co., Ltd.
18609459 PACKAGE SUBSTRATE Non-Final OA QUALCOMM Incorporated
18289646 DISPLAY DEVICE, DISPLAY MODULE, ELECTRONIC DEVICE, AND METHOD FOR MANUFACTURING DISPLAY DEVICE Non-Final OA SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
18350747 SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME Final Rejection SK hynix Inc.
17891026 METHOD OF FORMING A SELECTOR PATTERN BY ION IMPLANTATION INTO AN OXIDIZED SILICON-CONTAINING LAYER Final Rejection SK hynix Inc.
17717959 SEMICONDUCTOR DEVICE INCLUDING DUAL CONTACT PLUG AND METHOD FOR FABRICATING THE SAME Non-Final OA SK hynix Inc.
15913621 ELECTRONIC CIRCUIT WITH GUARD FEATURES FOR RELIABILITY IN HUMID ENVIRONMENTS Final Rejection Texas Instruments Incorporated
18583209 SEMICONDUCTOR DEVICE AND METHODS OF FORMATION Non-Final OA Taiwan Semiconductor Manufacturing Company, Ltd.
17584716 MEMORY DEVICE WITH DUAL CHANNEL TRANSISTOR Non-Final OA TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
17464460 SEMICONDUCTOR MEMORY STRUCTURES HAVING A GREATER SOURCE AREA Final Rejection Taiwan Semiconductor Manufacturing Company, Ltd.
18232719 METHOD OF FORMING BIOLOGICAL FIELD EFFECT TRANSISTORS INTEGRATED WITH HEATERS Non-Final OA Taiwan Semiconductor Manufacturing Co., Ltd.
18364614 METHODS FOR REDUCING SCRATCH DEFECTS IN CHEMICAL MECHANICAL PLANARIZATION Final Rejection Taiwan Semiconductor Manufacturing Co., Ltd.
17107420 METHOD OF FORMING BIOLOGICAL FIELD EFFECT TRANSISTORS INTEGRATED WITH HEATERS Non-Final OA Taiwan Semiconductor manufacturing Co., Ltd.
18043196 MESA AVALANCHE PHOTODIODE WITH SIDEWALL PASSIVATION Non-Final OA NATIONAL RESEARCH COUNCIL OF CANADA
17363015 ONE-TIME PROGRAMMABLE MEMORY DEVICE HAVING GATE STRUCTURES ON SHALLOW TRENCH ISOLATION AND SUBSTRATE Final Rejection UNITED MICROELECTRONICS CORP.
18169761 3D INTEGRATED CHARGE-COUPLED DEVICE MEMORY AND METHOD OF FABRICATING THE SAME Non-Final OA IMEC VZW
18065632 ANTIFUSE DEVICES WITH ADJACENT DUMMY STRUCTURES AND METHODS OF MAKING THEREOF Final Rejection GlobalFoundries Singapore Pte. Ltd.

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