Prosecution Insights
Last updated: May 29, 2026

Examiner: BOULGHASSOUL, YOUNES

Tech Center 2800 • Art Units: 2814

This examiner grants 88% of resolved cases

Performance Statistics

88.3%
Allow Rate
+20.3% vs TC avg
542
Total Applications
+7.3%
Interview Lift
795
Avg Prosecution Days
Based on 511 resolved cases, 2023–2026

Rejection Statute Breakdown

0.2%
§101 Eligibility
17.4%
§102 Novelty
61.8%
§103 Obviousness
16.6%
§112 Clarity

Currently Pending Office Actions

App #TitleStatusAssignee
18380854 SEMICONDUCTOR PACKAGE Non-Final OA Samsung Electronics Co., Ltd.
18380848 SEMICONDUCTOR DEVICES Non-Final OA Samsung Electronics Co., Ltd.
18462851 SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME Final Rejection Samsung Electronics Co., Ltd.
18231284 VERTICAL MEMORY DEVICE Final Rejection SAMSUNG ELECTRONICS CO., LTD.
18117891 SEMICONDUCTOR DEVICE Non-Final OA Samsung Electronics Co., Ltd.
18396224 SEMICONDUCTOR DEVICE Non-Final OA FUJI ELECTRIC CO., LTD.
18343127 STRUCTURE AND METHOD FOR MAXIMIZING AIR GAP IN BACK END OF THE LINE INTERCONNECT THROUGH VIA LANDING MODIFICATION Final Rejection INTERNATIONAL BUSINESS MACHINES CORPORATION
16940117 SOURCE/DRAIN CONTACTS FOR NON-PLANAR TRANSISTORS Non-Final OA Intel Corporation
18327628 OPTIMIZED FIN HEIGHT FOR FINFET TRANSISTOR AND METHOD OF FABRICATING THEREOF Non-Final OA Taiwan Semiconductor Manufacturing Company, Ltd.
18457975 SEMICONDUCTOR GAP FILL AND PLANARIZATION Non-Final OA Taiwan Semiconductor Manufacturing Co., Ltd.
18149265 Via Structures Final Rejection Taiwan Semiconductor Manufacturing Co. Ltd.
17818230 EPITAXIAL FEATURES OF SEMICONDUCTOR DEVICES Non-Final OA Taiwan Semiconductor Manufacturing Co., Ltd.
18391666 OPTICAL MODULES AND NEAR-EYE DISPLAY Non-Final OA Industrial Technology Research Institute
17876608 DISPLAY PANEL AND DISPLAY DEVICE Non-Final OA TCL China Star Optoelectronics Technology Co., Ltd.
18464287 MEMORY DEVICE AND MANUFACTURING METHOD THEREOF Non-Final OA NANYA TECHNOLOGY CORPORATION
18355029 SELF-ALIGNED LINE-AND-VIA STRUCTURE AND METHOD OF MAKING THE SAME Non-Final OA SANDISK TECHNOLOGIES LLC
18357797 FIN FIELD-EFFECT TRANSISTOR AND METHOD OF FORMING THE SAME Non-Final OA Taiwan Semiconductor Manufacturing Company Limited
18520979 IN-SITU DEPOSITION OF OXIDE PASSIVATION LAYER ON III-NITRIDE BASED HEMT Non-Final OA University of South Carolina

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